Masaru Tanabe

Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method

Method of checking unevenness of light-transmitting substance, apparatus therefor, and method of sorting transparent substrates

Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method

Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks

Method of inspecting ununiformity of transparent material, apparatus therefor, and method of selecting transparent substrate

Mask blank substrate set and mask blank set

Production method for mask blank-use translucent substrate, production method for mask blank, production method for exposing mask, production method for semiconductor device and production method for liquid crystal display unit, and method of correcting defect in exposing mask

INSPECTION METHOD FOR TRANSPARENT ARTICLE

MASK BLANK SUBSTRATE, MASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME

METHOD FOR MANUFACTURING TRANSPARENT SUBSTRATE FOR MASK BLANK, METHOD FOR MANUFACTURING MASK BLANK, AND METHOD FOR MANUFACTURING EXPOSURE MASK