Is this you? Create Your Porfile
Avatar

Masuda Takeyoshi

Sumitomo Electric Industries

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Explore More

Hotspot

Dive into the research topics where Masuda Takeyoshi is active.

Explore More

Publication

Featured researches published by Masuda Takeyoshi.

Archive | 2007

Method of surface reconstruction for silicon carbide substrate

Masuda Takeyoshi

Archive | 2015

Silicon carbide semiconductor substrate, method for manufacturing the same, and method for manufacturing silicon carbide semiconductor device

Horii Taku; Masuda Takeyoshi

Archive | 2014

MANUFACTURING METHODS OF SILICON CARBIDE SUBSTRATE AND SEMICONDUCTOR DEVICE, AND SILICON CARBIDE SUBSTRATE AND SEMICONDUCTOR DEVICE

Ito Satomi; Masuda Takeyoshi; Wada Keiji; Saito Itaru; Harada Makoto

Archive | 2014

SILICON CARBIDE DIODE, SILICON CARBIDE TRANSISTOR, AND METHOD OF MANUFACTURING SILICON CARBIDE SEMICONDUCTOR DEVICE

Wada Keiji; Masuda Takeyoshi

Archive | 2012

Silicon carbide insulated gate semiconductor element and method for producing same

Masuda Takeyoshi; Wada Keiji; Honaga Misako

Archive | 2011

SILICON CARBIDE SUBSTRATE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SILICON CARBIDE SUBSTRATE, AND SEMICONDUCTOR DEVICE

Sasaki Makoto; Harada Makoto; Masuda Takeyoshi; Wada Keiji; Inoe Hiroki; Nishiguchi Taro; Okita Kyoko; Namikawa Yasuo; Horii Taku

Archive | 2011

SUBSTRATE AND METHOD OF MANUFACTURING SUBSTRATE

Masuda Takeyoshi

Archive | 2017

SILICON CARBIDE SEMICONDUCTOR SUBSTRATE AND MANUFACTURING METHOD OF THE SAME, AND SILICON CARBIDE SEMICONDUCTOR DEVICE MANUFACTURING METHOD

Horii Taku; Kubota Ryosuke; Masuda Takeyoshi

Archive | 2015

Halbleiterbauelement mit großer Bandlücke und Verfahren zum Herstellen desselben

Wada Keiji; Masuda Takeyoshi; Hiyoshi Toru

Archive | 2014

Silicon carbide semiconductor substrate, method for manufacturing silicon carbide semiconductor substrate, and method for manufacturing silicon carbide semiconductor device where depression supression layer is formed on backside surface of base substrate opposite to main surface on which epitaxial layer is formed

Horii Taku; Masuda Takeyoshi

Explore More

Collaboration

Dive into the Masuda Takeyoshi's collaboration.

Top Co-Authors
Avatar

Wada Keiji

Sumitomo Electric Industries

View shared research outputs
Top Co-Authors
Avatar

Horii Taku

Sumitomo Electric Industries

View shared research outputs
Top Co-Authors
Avatar

Harada Makoto

Sumitomo Electric Industries

View shared research outputs
Top Co-Authors
Avatar

Honaga Misako

Sumitomo Electric Industries

View shared research outputs
Top Co-Authors
Avatar

Sasaki Makoto

Meijo University

View shared research outputs
Top Co-Authors
Avatar

Hiyoshi Toru

Sumitomo Electric Industries

View shared research outputs
Top Co-Authors
Avatar

Kubota Ryosuke

Sumitomo Electric Industries

View shared research outputs
Top Co-Authors
Avatar

Namikawa Yasuo

Sumitomo Electric Industries

View shared research outputs
Top Co-Authors
Avatar

Nishiguchi Taro

Sumitomo Electric Industries

View shared research outputs
Top Co-Authors
Avatar

Okita Kyoko

Sumitomo Electric Industries

View shared research outputs
Explore More
Researchain Logo
Decentralizing Knowledge