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Featured researches published by Maximilian Stadler.


Archive | 1992

MAGAZINE FOR HOLDING DISK-TYPE WORKPIECES IN PARTICULAR SEMICONDUCTOR WAFERS DURING WET-CHEMICAL SURFACE TREATMENT IN LIQUID BATHS

Maximilian Stadler; Schwab Gunter; Peter Romeder


Archive | 2004

Process for the wet-chemical surface treatment of a semiconductor wafer

Günter Schwab; Helmut Franke; Helmut Paltzer; Manfred Schöfberger; Maximilian Stadler


Archive | 2007

Method for producing a polished semiconductor

Maximilian Stadler; Günter Schwab; Diego Feijoo; Karlheinz Langsdorf


Archive | 2006

Process for treating a semiconductor wafer with a gaseous medium, and semiconductor wafer treated by this process

Maximilian Stadler; Guenter Schwab; Christoph Dipl.-Phys. Dr. Frey; Peter Dipl.-Phys. Dr. Stallhofer


Archive | 2000

Process for the wet chemical treatment of a semiconductor wafer

Günter Schwab; Maximilian Stadler


Archive | 1995

Process for treating semiconductor material with an acid-containing fluid

Maximilian Stadler; Günter Schwab; Peter Romeder; Gabriele Trifellner


Archive | 2007

Polished semiconductor wafer and process for producing it

Thomas Dr. Dipl.-Phys. Teuschler; Guenter Schwab; Maximilian Stadler


Archive | 2000

Production of a semiconductor wafer comprises rounding the edges of the wafer, mechanically treating the wafer, wet chemically treating the wafer to remove damaged crystal regions and polishing the wafer

Guenter Schwab; Maximilian Stadler


Archive | 2003

Process and device for the wet-chemical treatment of silicon

Maximilian Stadler; Günter Schwab; Helmut Franke


Archive | 1999

Process for wet-chemical treatment of semiconductor wafer after mechanical treatment in lapping machine comprises subjecting to ultrasound in an alkaline cleaning solution before etching and rinsing steps

Guenter Schwab; Karlheinz Langsdorf; Maximilian Stadler; Edeltraut Steiger

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