Merav Muallem

Strong Light-Matter Coupling and Hybridization of Molecular Vibrations in a Low-Loss Infrared Microcavity

Hybridized polaritons are generated by simultaneously coupling two vibrational modes of two different organic materials to the resonance of a low-loss infrared optical microcavity. A thin film of poly methyl methacrylate with solvent molecules of dimethylformamide trapped inside provided two spectrally narrow, closely spaced carbonyl stretches with absorption peaks at 1731 and 1678 cm(-1). Situating this film in a microcavity based on Ge/ZnS distributed Bragg reflector mirrors produced three distinct polariton branches in the dispersion relation due to hybridization of the vibrational resonances. Two anticrossings were observed with Rabi splittings of 9.6 and 5.2 meV, between the upper-to-middle and middle-to-lower polariton branches, respectively. This system marks the first demonstration of polariton hybridization between a solid and solvent molecules and can open new paths toward chemical reaction modification and energy transfer studies in the mid-infrared spectral range.

Room temperature fabrication of dielectric Bragg reflectors composed of a CaF2/ZnS multilayered coating.

We describe the design, fabrication, and characterization of mechanically stable, reproducible, and highly reflecting distributed Bragg reflectors (DBR) composed of thermally evaporated thin films of calcium fluoride (CaF2) and zinc sulfide (ZnS). CaF2 and ZnS were chosen as the low and high refractive index components of the multilayer DBR structures, with n = 1.43 and n = 2.38 respectively, because neither material requires substrate heating during the deposition process in order to produce optical quality thin films. DBRs consisting of seven pairs of CaF2 and ZnS layers, were fabricated with thicknesses of 96 and 58 nm, respectively, as characterized by high-resolution scanning electron microscopy (HR-SEM), and exhibited a center wavelength of λc = 550 nm and peak reflectance exceeding 99%. The layers showed good adhesion to each other and to the glass substrate, resulting in mechanically stable DBR coatings. Complete optical microcavities consisting of two such DBR coatings and a CaF2 spacer layer between them could be fabricated in a single deposition run. Optically, these structures exhibited a resonator quality factor of Q > 160. When a CaF2/ZnS DBR was grown, without heating the substrate during deposition, on top of a thin film containing the fluorescent dye Rhodamine 6G, the fluorescence intensity showed no degradation compared to an uncoated film, in contrast to a MgF2/ZnS DBR coating grown with substrate heating which showed a 92% reduction in signal. The ability to fabricate optical quality CaF2/ZnS DBRs without substrate heating, as introduced here, can therefore enable formation of low-loss high-reflectivity coatings on top of more delicate heat-sensitive materials such as organics and other nanostructured emitters, and hence facilitate the development of nanoemitter-based microcavity device applications.

A simplified method for generating periodic nanostructures by interference lithography without the use of an anti-reflection coating

Interference lithography has proven to be a useful technique for generating periodic sub-diffraction limited nanostructures. Interference lithography can be implemented by exposing a photoresist polymer to laser light using a two-beam arrangement or more simply a one beam configuration based on a Lloyds Mirror Interferometer. For typical photoresist layers, an anti-reflection coating must be deposited on the substrate to prevent adverse reflections from cancelling the holographic pattern of the interfering beams. For silicon substrates, such coatings are typically multilayered and complex in composition. By thinning the photoresist layer to a thickness well below the quarter wavelength of the exposing beam, we demonstrate that interference gratings can be generated without an anti-reflection coating on the substrate. We used ammonium dichromate doped polyvinyl alcohol as the positive photoresist because it provides excellent pinhole free layers down to thicknesses of 40 nm, and can be cross-linked by a l...