Michael Grisham

Extended phase matching of high harmonics driven by mid-infrared light.

We demonstrate that phase-matched frequency upconversion of ultrafast laser light can be extended to shorter wavelengths by using longer driving laser wavelengths. Experimentally, we show that the phase-matching cutoff for harmonic generation in argon increases from 45 to 100 eV when the driving laser wavelength is increased from 0.8 to 1.3 microm. Phase matching is also obtained at higher pressures using a longer-wavelength driving laser, mitigating the unfavorable scaling of the single-atom response. Theoretical calculations suggest that phase-matched high harmonic frequency upconversion driven by mid-infrared pulses could be extended to extremely high photon energies.

Nanopatterning with interferometric lithography using a compact /spl lambda/=46.9-nm laser

We report the imprinting of nanometer-scale gratings by interferometric lithography at /spl lambda/=46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyds mirror interferometer. This first demonstration of nanopatterning using an extreme ultraviolet (EUV) laser illustrates the potential of compact EUV lasers in nanotechnology applications.

Characterization of focused beam of desktop 10-Hz capillary-discharge 46.9-nm laser

The desktop capillary-discharge Ne-like Ar laser (CDL) providing 10-μJ nanosecond pulses of coherent 46.9-nm radiation with a repetition rate up to 12 Hz was developed and built at the Colorado State University in Fort Collins and then installed in Prague. The beam of the laser was focused by a spherical mirror covered with Si/Sc multilayer coating onto the surface of poly(methyl methacrylate) - PMMA. Interaction parameters vary by changing the distance between sample surface and beam focus. The samples were exposed to various numbers of shots. Analysis of damaged PMMA by atomic force (AFM) and Nomarski (DIC - differential interference contrast) microscopes allows not only to determine the key characteristics of the focused beam (e.g. Rayleighs parameter, focal spot diameter, tight focus position, etc.) but also to investigate mechanisms of the radiation-induced erosion processes.

Interferometric lithography at 46.9 nm

We present the first results of nano-patterning in poly-methyl methacrylate (PMMA) photo-resist using a 46.9 nm tabletop extreme ultraviolet (EUV) laser. As a proof of principle, we recorded a Fresnel diffraction pattern of a copper mesh with 19 μm square holes. Results of ongoing interference experiments will also be presented.

Damage to dry plasmid DNA induced by nanosecond XUV-laser pulses

Ionizing radiation induces a variety of DNA damages including single-strand breaks (SSBs), double-strand breaks (DSBs), abasic sites, modified sugar and bases. Most theoretical and experimental studies have been focused on DNA strand scissions, in particular production of DNA double-strand breaks. DSBs have been proven to be a key damage at a molecular level responsible for the formation of chromosomal aberrations, leading often to cell death. The complexity of lesions produced in DNA by ionizing radiations is thought to depend on the amount of energy deposited at the site of each lesion. We have studied the nature of DNA damage induced directly by the pulsed 46.9 nm radiation provided by a capillary-discharge Ne-like Ar laser (CDL). Different surface doses were delivered with a repetition rate of a few Hz and an average pulse energy ~ 1 μJ. A simple model DNA molecule, i.e., dried closed-circular plasmid DNA (pBR322), was irradiated. The agarose gel electrophoresis method was used for determination of both SSB and DSB yields. Results are compared with a previous study of plasmid DNA irradiated with a single sub-nanosecond 1-keV X-ray pulse produced by a large-scale, double-stream gas puff target, illuminated by sub-kJ, near-infrared (NIR) focused laser pulses at the PALS facility (Prague Asterix Laser System).

Enhanced high harmonic generation in Xe, Kr and Ar using a capillary discharge

We demonstrate a significant extension of the harmonic cutoff in xenon, krypton and argon ions using a capillary discharge, up to 160 eV, 170 eV and 275 eV respectively.

Short-wavelength ablation of solids: pulse duration and wavelength effects

For conventional wavelength (UV-Vis-IR) lasers delivering radiation energy to the surface of materials, ablation thresholds, ablation (etch) rates, and the quality of ablated structures often differ dramatically between short (typically nanosecond) and ultrashort (typically femtosecond) pulses. Various short-wavelength (l < 100 nm) lasers emitting pulses with durations ranging from ~ 10 fs to ~ 1 ns have recently been put into a routine operation. This makes it possible to investigate how the ablation characteristics depend on the pulse duration in the XUV spectral region. 1.2-ns pulses of 46.9-nm radiation delivered from a capillary-discharge Ne-like Ar laser (Colorado State University, Fort Collins), focused by a spherical Sc/Si multilayer-coated mirror were used for an ablation of organic polymers and silicon. Various materials were irradiated with ellipsoidal-mirror-focused XUV radiation (λ = 86 nm, τ = 30-100 fs) generated by the free-electron laser (FEL) operated at the TESLA Test Facility (TTF1 FEL) in Hamburg. The beam of the Ne-like Zn XUV laser (λ = 21.2 nm, τ < 100 ps) driven by the Prague Asterix Laser System (PALS) was also successfully focused by a spherical Si/Mo multilayer-coated mirror to ablate various materials. Based on the results of the experiments, the etch rates for three different pulse durations are compared using the XUV-ABLATOR code to compensate for the wavelength difference. Comparing the values of etch rates calculated for short pulses with those measured for ultrashort pulses, we can study the influence of pulse duration on XUV ablation efficiency. Ablation efficiencies measured with short pulses at various wavelengths (i.e. 86/46.9/21.2 nm from the above-mentioned lasers and ~ 1 nm from the double stream gas-puff Xe plasma source driven by PALS) show that the wavelength influences the etch rate mainly through the different attenuation lengths.

Dose-Rate Effects in Breaking DNA Strands by Short Pulses of Extreme Ultraviolet Radiation

In this study, we examined dose-rate effects on strand break formation in plasmid DNA induced by pulsed extreme ultraviolet (XUV) radiation. Dose delivered to the target molecule was controlled by attenuating the incident photon flux using aluminum filters as well as by changing the DNA/buffer-salt ratio in the irradiated sample. Irradiated samples were examined using agarose gel electrophoresis. Yields of single- and double-strand breaks (SSBs and DSBs) were determined as a function of the incident photon fluence. In addition, electrophoresis also revealed DNA cross-linking. Damaged DNA was inspected by means of atomic force microscopy (AFM). Both SSB and DSB yields decreased with dose rate increase. Quantum yields of SSBs at the highest photon fluence were comparable to yields of DSBs found after synchrotron irradiation. The average SSB/DSB ratio decreased only slightly at elevated dose rates. In conclusion, complex and/or clustered damages other than cross-links do not appear to be induced under the radiation conditions applied in this study.

Is there any dose-rate effect in breaking DNA strands by short pulses of extreme ultraviolet and soft x-ray radiation? (Conference Presentation)

Possible dose-rate effects in a plasmid DNA exposed to pulsed extreme ultraviolet (XUV) and soft x-ray (SXR) water window radiation from two different table-top plasma-based sources was studied. Dose delivered to the target molecule was controlled by attenuating the incident photon flux with aluminum thin foils as well as varying the DNA/buffer-salt ratio in the irradiated sample. Irradiated samples were analyzed using the agarose gel electrophoresis. Some additional bands were identified in gel electrophoretograms as results of a DNA cross-linking. They were inspected by atomic force microscopy (AFM). Yields of single- and double-strand breaks (Gy-1 Da-1) were determined as a function of incident dose rate. Both yields decreased with a dose rate increasing. The ratio of single- and double-strand breaks exhibited only a slight increase at elevated dose rates. In conclusion, complex and/or clustered damages do not seem to be initiated under these irradiation conditions.

Ionization of Xenon to the Nickel-Like Stage and Beyond in Micro-Capillary Plasma Columns Heated by Ultrafast Current Pulses

Homogeneous plasma columns with ionization levels typical of MA discharges were created by rapidly heating gas-filled 520 µm diameter channels with ns rise-time current pulses of unusually low amplitude, 40 kA. These conditions allow the generation of high aspect ratio (eg. > 300:1) plasma columns with very high degrees of ionization (e.g. Ni-like Xenon) of interest for soft x-ray lasers below λ = 10 nm. Spectra and simulations of plasmas generated in 520 µm diameter alumina capillaries driven by 35–40 kA current pulses with 4 ns rise time were obtained for discharges in Xenon and Neon discharges. The first shows the presence of lines corresponding to ionization stages up to Fe-like Xe. The latter show that Al impurities from the walls are ionized to the H-like and He-like stages. He-like Al spectra containing the resonance line significantly broaden by opacity, the intercombination line, and Li-like satellites are analyzed. For Xenon discharges, the spectral lines from the Ni-like transitions the 3d94d (3/2, 3/2)J = 0 to the 3d94p(5/2, 3/2)J = 1 and to 3d94p(3/2, 1/2)J = 1 are observed.