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Dive into the research topics where Michael P. Nesnidal is active.

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Featured researches published by Michael P. Nesnidal.


Applied Physics Letters | 1998

0.45 W diffraction-limited beam and single-frequency operation from antiguided phase-locked laser array with distributed feedback grating

Michael P. Nesnidal; Thomas Earles; Luke J. Mawst; D. Botez; Jens Buus

A second-order diffraction grating placed below the active region of a phase-locked resonant antiguided array selects the in-phase array mode in addition to its role as a single-longitudinal-mode selector. This type of array-mode discrimination relies on the fact that the resonant in-phase array mode has significantly better field overlap with the grating region than nonresonant array modes. Furthermore, it eliminates the need for a conventional array-mode discriminator: interelement loss; which can cause self-pulsations. Diffraction-limited beam and single-frequency operation is obtained to at least 0.45 W peak pulsed power from 20 element, InGaAs/InGaP/GaAs structures (λ=0.97 μm) of 120-μm-wide aperture. Distributed-feedback operation is confirmed over the 20–40 °C temperature range. The results are in good agreement with theory.


Nano Letters | 2013

InAs nanowires grown by metal-organic vapor-phase epitaxy (MOVPE) employing PS/PMMA diblock copolymer nanopatterning.

Yinggang Huang; Tae Wan Kim; Shisheng Xiong; Luke J. Mawst; T. F. Kuech; Paul F. Nealey; Yushuai Dai; Zihao Wang; Wei Guo; David V. Forbes; Seth M. Hubbard; Michael P. Nesnidal

Dense arrays of indium arsenide (InAs) nanowire materials have been grown by selective-area metal-organic vapor-phase epitaxy (SA-MOVPE) using polystyrene-b-poly(methyl methacrylate) (PS/PMMA) diblock copolymer (DBC) nanopatterning technique, which is a catalyst-free approach. Nanoscale openings were defined in a thin (~10 nm) SiNx layer deposited on a (111)B-oriented GaAs substrate using the DBC process and CF4 reactive ion etching (RIE), which served as a hard mask for the nanowire growth. InAs nanowires with diameters down to ~ 20 nm and micrometer-scale lengths were achieved with a density of ~ 5 × 10(10) cm(2). The nanowire structures were characterized by scanning electron microscopy and transmission electron microscopy, which indicate twin defects in a primary zincblende crystal structure and the absence of threading dislocation within the imaged regions.


Advanced Semiconductor Lasers and Their Applications (1999), paper 16 | 1999

Large spatial mode, single frequency semiconductor lasers using two dimensionalgratings

Srinath Kalluri; Timothy A. Vang; Robert Lodenkamper; Michael P. Nesnidal; Michael G. Wickham; Doyle Nichols; David V. Forbes; Johanna Lacey; Larry Lembo; John C. Brock

We demonstrate single mode operation of laser diode cavities up to 200|iim wide using 2-D Bragg gratings for simultaneous longitudinal and lateral mode control.


Archive | 2002

Semiconductor-air gap grating fabrication using a sacrificial layer process

Michael P. Nesnidal; David V. Forbes


Archive | 2003

Process for fabricating a semiconductor diffraction grating using a sacrificial layer

Michael P. Nesnidal; David V. Forbes


Archive | 2002

High index-step grating fabrication using a regrowth-over-dielectric process

Michael P. Nesnidal; David V. Forbes


Archive | 2003

Fabrication of high index-contrast gratings using a regrowth-over-dielectric process

David V. Forbes; Michael P. Nesnidal


Archive | 2003

Fabrication process of a semiconductor diffraction grating

Michael P. Nesnidal; David V. Forbes


Archive | 2003

Herstellungsverfahren eines Halbleiterbeugungsgitters Manufacturing method of a semiconductor diffraction grating

David V. Forbes; Michael P. Nesnidal


Archive | 2003

Herstellung von Gittern mit hohem Indexkontrast durch Rekristallisation auf einem Dielektrikum

David V. Forbes; Michael P. Nesnidal

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Luke J. Mawst

University of Wisconsin-Madison

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D. Botez

University of Wisconsin-Madison

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