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Dive into the research topics where Milan Tichy is active.

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Featured researches published by Milan Tichy.


Plasma Physics and Controlled Fusion | 2002

Measurements with an emissive probe in the CASTOR tokamak

R. Schrittwieser; Jir Ad mek; P. Balan; M. Hron; C. Ionita; K. Jakubka; L Kryska; E. Martines; Jan St ckel; Milan Tichy; Guido Van Oost

An emissive probe has been used in the edge region of the CASTOR tokamak in order to test the possibility of direct measurements of the plasma potential. The difference between the floating potential of a cold probe and that of an emissive probe has been found to be approximately 1.3 times the electron temperature, which is less than predicted by the probe theory. Several possible reasons to explain this discrepancy are offered, such as secondary electron emission, uncertainties in the ion temperature, different collecting areas for electrons and ions, etc. The possible impact of a space charge formed by the emitted electrons is also discussed.


Journal of Physics D | 2010

Effect of nitrogen doping on TiOxNy thin film formation at reactive high-power pulsed magnetron sputtering

Vitezslav Stranak; M. Quaas; Robert Bogdanowicz; Hartmut Steffen; Harm Wulff; Zdenek Hubicka; Milan Tichy; Rainer Hippler

The paper is focused on a study of formation of TiOxNy thin films prepared by pulsed magnetron sputtering of metallic Ti target. Oxygen and nitrogen were delivered into the discharge in the form of reactive gases O2 and N2. The films were deposited by high-power impulse magnetron sputtering working with discharge repetition frequency f = 250 Hz at low (p = 0.75 Pa) and high (p = 10 Pa) pressure. The substrates were on floating potential and thermally stabilized at room temperature during the deposition process. Post-deposition thermal annealing was not employed. The chemical composition from x-ray photoelectron spectroscopy diagnostic reveals formation of TiOxNy structure at low flow rate of oxygen in the discharge gas mixture. This result is confirmed by XRD investigation of N elements incorporation into the Ti–O lattice. Decrease in band-gap to values Eg ~ 1.6 eV in TiOxNy thin film is attributed to formed Ti–N bonds. The discharge properties were investigated by time-resolved optical emission spectroscopy. Time evolution of particular spectral lines (Ar+, Ti+, Ti) is presented together with peak discharge current.


Journal of Applied Physics | 2010

Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti–Cu thin films

Vitezslav Stranak; M. Čada; Zdenek Hubicka; Milan Tichy; Rainer Hippler

Time-resolved comparative study of dual magnetron sputtering (dual-MS) and dual high power impulse magnetron sputtering (dual-HiPIMS) systems arranged with closed magnetic field is presented. The dual-MS system was operated with a repetition frequency 4.65 kHz (duty cycle ≈50%). The frequency during dual-HiPIMS is lower as well as its duty cycle (f=100 Hz, duty 1%). Different metallic targets (Ti, Cu) and different cathode voltages were applied to get required stoichiometry of Ti–Cu thin films. The plasma parameters of the interspace between magnetrons in the substrate position were investigated by time-resolved optical emission spectroscopy, Langmuir probe technique, and measurement of ion fluxes to the substrate. It is shown that plasma density as well as ion flux is higher about two orders of magnitude in dual-HiPIMS system. This fact is partially caused by low diffusion of ionized sputtered particles (Ti+,Cu+) which creates a preionized medium.


Journal of Applied Physics | 2012

Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma

Vitezslav Stranak; Ann-Pierra Herrendorf; Steffen Drache; M. Čada; Zdenek Hubicka; Robert Bogdanowicz; Milan Tichy; Rainer Hippler

This paper reports on an investigation of the hybrid pulsed sputtering source based on the combination of electron cyclotron wave resonance (ECWR) inductively coupled plasma and high power impulse magnetron sputtering (HiPIMS) of a Ti target. The plasma source, operated in an Ar atmosphere at a very low pressure of 0.03 Pa, provides plasma where the major fraction of sputtered particles is ionized. It was found that ECWR assistance increases the electron temperature during the HiPIMS pulse. The discharge current and electron density can achieve their stable maximum 10 μs after the onset of the HiPIMS pulse. Further, a high concentration of double charged Ti++ with energies of up to 160 eV was detected. All of these facts were verified experimentally by time-resolved emission spectroscopy, retarding field analyzer measurement, Langmuir probe, and energy-resolved mass spectrometry.


Journal of Applied Physics | 2014

Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges

Vitezslav Stranak; Zdenek Hubicka; M. Čada; Steffen Drache; Milan Tichy; Rainer Hippler

The metal ionized flux fraction and production of double charged metal ions Me2+ of different materials (Al, Cu, Fe, Ti) by High Power Impulse Magnetron Sputtering (HiPIMS) operated with and without a pre-ionization assistance is compared in the paper. The Electron Cyclotron Wave Resonance (ECWR) discharge was employed as the pre-ionization agent providing a seed of charge in the idle time of HiPIMS pulses. A modified grid-free biased quartz crystal microbalance was used to estimate the metal ionized flux fraction ξ. The energy-resolved mass spectrometry served as a complementary method to distinguish particular ion contributions to the total ionized flux onto the substrate. The ratio between densities of doubly Me2+ and singly Me+ charged metal ions was determined. It is shown that ECWR assistance enhances Me2+ production with respect of absorbed rf-power. The ECWR discharge also increases the metal ionized flux fraction of about 30% especially in the region of lower pressures. Further, the suppression o...


Journal of Applied Physics | 2014

Study of mass and cluster flux in a pulsed gas system with enhanced nanoparticle aggregation

Steffen Drache; Vitezslav Stranak; Zdenek Hubicka; Florian Berg; Milan Tichy; Christiane A. Helm; Rainer Hippler

The paper is focused on investigation of enhanced metal (Cu) cluster growth in a source of Haberlands type using pulsed gas aggregation. The aggregation Ar gas was delivered into the cluster source in a pulse regime, which results in the formation of well pronounced aggregation pressure peaks. The pressure peaks were varied by varying the different pulse gas frequency at the same mean pressure kept for all experiments. Hence, we were able to study the effect of enhanced aggregation pressure on cluster formation. Time-resolved measurements of cluster mass distribution were performed to estimate the mass and particle flux. The paper demonstrates that pulse gas aggregation influences growth of Cu nanoparticles, i.e., cluster mass/size, mass flux, and particle flux emitted from the cluster source. It was found that cluster mass related quantities are strongly influenced by pulsed gas frequency; the highest value of mass flux appears at the most pronounced pressure peaks. On the other hand, the particle flux depends only slightly on the gas pulse frequency. The explanation based on cooling and thermalization of sputtered particles is discussed in the paper.


IEEE Transactions on Plasma Science | 2015

Development of a High-Frequency Emissive Probe System for Plasma Potential Measurements in a Hall Thruster

S Stephane Mazouffre; Aude Petin; P. Kudrna; Milan Tichy

A heated emissive probe is a smart diagnostic tool for acquisition of the plasma potential in the discharge and in the plume of a Hall thruster. However, measurements of high-frequency oscillations of the potential require a specific electrical circuit with a low RC time constant. We developed and tested an emissive probe system with a cutoff frequency of 1 MHz. Details about the low-pass filter design as well as first experimental outcomes obtained in the plume of a 200 W permanent magnet Hall thruster are given in this paper.


Surface & Coatings Technology | 2012

Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering

Vitezslav Stranak; Steffen Drache; Robert Bogdanowicz; Harm Wulff; Ann-Pierra Herrendorf; Zdenek Hubicka; M. Čada; Milan Tichy; Rainer Hippler


Surface & Coatings Technology | 2013

Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering

Vitezslav Stranak; Ann-Pierra Herrendorf; Harm Wulff; Steffen Drache; M. Čada; Zdenek Hubicka; Milan Tichy; Rainer Hippler


European Physical Journal D | 2011

Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges

Vitezslav Stranak; Harm Wulff; Robert Bogdanowicz; Steffen Drache; Z. Hubička; M. Čada; Milan Tichy; Rainer Hippler

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M. Čada

Academy of Sciences of the Czech Republic

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Rainer Hippler

University of Greifswald

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Steffen Drache

University of Greifswald

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P. Kudrna

Charles University in Prague

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Harm Wulff

University of Greifswald

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Robert Bogdanowicz

Gdańsk University of Technology

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S Stephane Mazouffre

Centre national de la recherche scientifique

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