Mingchu Tang

Continuous-wave InAs/GaAs quantum-dot laser diodes monolithically grown on Si substrate with low threshold current densities

We report the first room-temperature continuous-wave operation of III-V quantum-dot laser diodes monolithically grown on a Si substrate. Long-wavelength InAs/GaAs quantum-dot structures were fabricated on Ge-on-Si substrates. Room-temperature lasing at a wavelength of 1.28 μm has been achieved with threshold current densities of 163 A/cm(2) and 64.3 A/cm(2) under continuous-wave and pulsed conditions for ridge-waveguide lasers with as cleaved facets, respectively. The value of 64.3 A/cm(2) represents the lowest room-temperature threshold current density for any kind of laser on Si to date.

1.3-μm InAs/GaAs quantum-dot lasers monolithically grown on Si substrates using InAlAs/GaAs dislocation filter layers

We report on the operation of electrically pumped 1.3μm InAs QD laser directly grown on a Si substrate using InAlAs/GaAs dislocation filter layers with a threshold current density of 194A/cm2 and output power of ~80mW.

InAs/GaAs Quantum-Dot Lasers Monolithically Grown on Si, Ge, and Ge-on-Si Substrates

The realization of semiconductor lasers on Si substrates will enable the fabrication of complex optoelectronic circuits. This will permit the creation of the long-dreamed chip-to-chip and system-to-system optical interconnects. This paper reports recent developments in our work on InAs/GaAs quantum-dot (QD) lasers monolithically grown on Si, Ge, and Ge-on-Si (Ge/Si) substrates. A thin AlAs nucleation layer (NL) was first investigated for the growth of InAs/GaAs QDs on Si substrates. The AlAs NL enables more defects to be confined in the interface between the GaAs epitaxial layer and Si substrate, and hence leads to higher photoluminescence intensity for InAs/GaAs QDs. Room-temperature lasing at 1.29 μm with a threshold current density of 650 A/cm2 was demonstrated with the use of an AlAs NL. The growth of InAs/GaAs QDs on Ge and Ge/Si substrates was further studied. A low threshold current density of ~200 A/cm2 for 1-mm long QD lasers has been demonstrated for QD lasers grown on Ge substrates by using Ga prelayer technique. This growth technique has also been explored for Ge/Si substrates. Room-temperature lasing at 1.28 μm with threshold current density of ~164 A/cm2 and lasing operation up to 84°C has been demonstrated for a 3-mm long device.

Wafer-Scale Fabrication of Self-Catalyzed 1.7 eV GaAsP Core–Shell Nanowire Photocathode on Silicon Substrates

We present the wafer-scale fabrication of self-catalyzed p-n homojunction 1.7 eV GaAsP core-shell nanowire photocathodes grown on silicon substrates by molecular beam epitaxy with the incorporation of Pt nanoparticles as hydrogen evolution cocatalysts. Under AM 1.5G illumination, the GaAsP nanowire photocathode yielded a photocurrent density of 4.5 mA/cm(2) at 0 V versus a reversible hydrogen electrode and a solar-to-hydrogen conversion efficiency of 0.5%, which are much higher than the values previously reported for wafer-scale III-V nanowire photocathodes. In addition, GaAsP has been found to be more resistant to photocorrosion than InGaP. These results open up a new approach to develop efficient tandem photoelectrochemical devices via fabricating GaAsP nanowires on a silicon platform.

InAs/GaAsSb quantum dot solar cells

The hybrid structure of GaAs/GaAsSb quantum well (QW)/InAs quantum dots solar cells (QDSCs) is analyzed using power-dependent and temperature-dependent photoluminescence. We demonstrate that placing the GaAsSb QW beneath the QDs forms type-II characteristics that initiate at 12% Sb composition. Current density-voltage measurements demonstrate a decrease in power efficiency with increasing Sb composition. This could be attributed to increased valence band potential in the GaAsSb QW that subsequently limits hole transportation in the QD region. To reduce the confinement energy barrier, a 2 nm GaAs wall is inserted between GaAsSb QW and InAs QDs, leading to a 23% improvement in power efficiency for QDSCs.

Self-Catalyzed Ternary Core–Shell GaAsP Nanowire Arrays Grown on Patterned Si Substrates by Molecular Beam Epitaxy

The growth of self-catalyzed ternary core-shell GaAsP nanowire (NW) arrays on SiO2 patterned Si(111) substrates has been demonstrated by using solid-source molecular beam epitaxy. A high-temperature deoxidization step up to ∼ 900 °C prior to NW growth was used to remove the native oxide and/or SiO2 residue from the patterned holes. To initiate the growth of GaAsP NW arrays, the Ga predeposition used for assisting the formation of Ga droplets in the patterned holes, was shown to be another essential step. The effects of the patterned-hole size on the NW morphology were also studied and explained using a simple growth model. A lattice-matched radial GaAsP core-shell NW structure has subsequently been developed with room-temperature photoluminescence emission around 740 nm. These results open up new perspectives for integrating position-controlled III-V NW photonic and electronic structures on a Si platform.

Antimony mediated growth of high-density InAs quantum dots for photovoltaic cells

We report enhanced solar cell performance using high-density InAs quantum dots. The high-density quantum dot was grown by antimony mediated molecular beam epitaxy. In-plane quantum dot density over 1 × 1011 cm−2 was achieved by applying a few monolayers of antimony on the GaAs surface prior to quantum dot growth. The formation of defective large clusters was reduced by optimization of the growth temperature and InAs coverage. Comparing with a standard quantum dot solar cell without the incorporation of antimony, the high-density quantum dot solar cell demonstrates a distinct improvement in short-circuit current from 7.4 mA/cm2 to 8.3 mA/cm2.

Electrically pumped continuous-wave 1.3 mu m InAs/GaAs quantum dot lasers monolithically grown on on-axis Si (001) substrates

We report on the first electrically pumped continuous-wave (cw) InAs/GaAs quantum dot (QD) lasers monolithically grown on on-axis Si (001) substrates without any intermediate buffer layers. A 400 nm antiphase boundary (APB) free epitaxial GaAs film with a small root-mean-square (RMS) surface roughness of 0.86 nm was first deposited on a 300 mm standard industry-compatible on-axis Si (001) substrate by metal-organic chemical vapor deposition (MOCVD). The QD laser structure was then grown on this APB-free GaAs/Si (001) virtual substrate by molecular beam epitaxy (MBE). Room-temperature cw lasing at ~1.3 µm has been achieved with a threshold current density of 425 A/cm2 and single facet output power of 43 mW. Under pulsed operation, lasing operation up to 102 °C has been realized, with a threshold current density of 250 A/cm2 and single facet output power exceeding 130 mW at room temperature.

Dislocation filters in GaAs on Si

Cross section transmission electron microscopy has been used to analyse dislocation filter layers (DFLs) in five similar structures of GaAs on Si that had different amounts of strain in the DFLs or different annealing regimes. By counting threading dislocation (TD) numbers through the structure we are able to measure relative changes, even though the absolute density is not known. The DFLs remove more than 90% of TDs in all samples. We find that the TD density in material without DFLs decays as the inverse of the square root of the layer thickness, and that DFLs at the top of the structure are considerably more efficient than those at the bottom. This indicates that the interaction radius, the distance that TDs must approach to meet and annihilate, is dependent upon the TD density.

InAs/GaAs quantum-dot superluminescent diodes monolithically grown on a Ge substrate

We report the first InAs/GaAs quantum-dot (QD) superluminescent diode (SLD) monolithically grown on a Ge substrate by molecular beam epitaxy. The QD SLD exhibits a 3 dB emission bandwidth of ~60 nm centered at 1252 nm with output power of 27 mW at room temperature. The 3 dB bandwidth is very stable over the temperature range from 20 °C to 100 °C, which highlights the potential for integration with high performance ICs.