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Featured researches published by Mohd Alim Khan.


Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena | 2010

Effect of high substrate bias and hydrogen and nitrogen incorporation on density of states and field-emission threshold in tetrahedral amorphous carbon films

O.S. Panwar; Mohd Alim Khan; B. S. Satyanarayana; R. Bhattacharyya; B. R. Mehta; Sunil Kumar; Ishpal

This article reports the influence of substrate bias during growth and of hydrogen and nitrogen incorporation on density of states [N (EF)] and field-emission threshold (Eturn-on) in tetrahedral amorphous carbon (ta-C) films, deposited using an S-bend filtered cathodic vacuum arc process. The variation in negative substrate bias from −20 to −200 V was found to initially lead to a small decrease in N (EF) and Eturn-on, and a small increase in the emission current density (J) at 12.5 V/μm in the case of as-grown ta-C films; beyond −200 V substrate bias there is a reversal in the trend. The values of N (EF)=1.3×1017 cm−3 eV−1, Eturn-on=8.3 V/μm, and J=6.19 mA/cm2 were observed at −200 V substrate bias. However at −300 V the properties were not very different from those at −200 V substrate bias and so with a view to use the higher energy, hydrogen and nitrogen incorporation studies were carried out in this condition. It was observed that there was further enhancement in properties with hydrogen and nitrogen i...


Japanese Journal of Applied Physics | 2009

Characterization of Boron- and Phosphorous-Incorporated Tetrahedral Amorphous Carbon Films Deposited by the Filtered Cathodic Vacuum Arc Process

O.S. Panwar; Mohd Alim Khan; Mahesh Kumar; S. M. Shivaprasad; Bukinakere Subbakrihniah Satyanarayana; Prakash Narain Dixit; R. Bhattacharyya

This paper reports the X-ray photoelectron spectroscopy (XPS), X-ray-induced Auger electron spectroscopy (XAES), and Raman studies of boron- and phosphorous-incorporated tetrahedral amorphous carbon (ta-C) films deposited by the filtered cathodic vacuum arc process. A systematic study of the influence of varying boron (B) and phosphorous (P) content on the properties of the as-grown ta-C films deposited at high negative substrate bias (-300 V) is reported by analyzing the C 1s, B 1s, and P 1s core levels using photoelectron spectroscopy. The sp3 and sp2 contents in the films were determined by measuring the width of the X-ray-induced Auger peaks. B incorporation in ta-C films up to 2.0 at. % increases the sp2 content and decreases the sp3 content by 3.6%, whereas P incorporation up to 2.0 at. % results in an increase of sp2 content and decrease of sp3 content by ~ 30%. The valence band spectra show changes in the Fermi level as B and P are incorporated into the ta-C films. The characteristic Raman spectra confirm the high sp3 content in the deposited films. Thus, the study demonstrates, in the case of high negative substrate bias films, that a pronounced decrease in sp3 fraction or the diamond-like nature of the ta-C films occurs upon P incorporation in comparison to that upon B incorporation.


Thin Solid Films | 2008

Effect of high substrate bias and hydrogen and nitrogen incorporation on filtered cathodic vacuum arc deposited tetrahedral amorphous carbon films

O.S. Panwar; Mohd Alim Khan; Mahesh Kumar; S. M. Shivaprasad; Bonthu Satyanarayana; P.N. Dixit; R. Bhattacharyya; M.Y. Khan


Applied Surface Science | 2004

XPS and XAES studies of as grown and nitrogen incorporated tetrahedral amorphous carbon films deposited by pulsed unfiltered cathodic vacuum arc process

O.S. Panwar; Y. Aparna; S. M. Shivaprasad; Mohd Alim Khan; B.S. Satyanarayana; R. Bhattacharyya


Surface & Coatings Technology | 2010

Effect of high substrate bias and hydrogen and nitrogen incorporation on spectroscopic ellipsometric and atomic force microscopic studies of tetrahedral amorphous carbon films

O.S. Panwar; Mohd Alim Khan; Satyendra Kumar; A. Basu; B. R. Mehta; Sushil Kumar; Ishpal


Applied Surface Science | 2010

Properties of boron and phosphorous incorporated tetrahedral amorphous carbon films grown using filtered cathodic vacuum arc process

O.S. Panwar; Mohd Alim Khan; Bonthu Satyanarayana; Sushil Kumar; Ishpal


Thin Solid Films | 2005

Characterization of as grown and nitrogen incorporated tetrahedral amorphous carbon films deposited by pulsed unfiltered cathodic vacuum arc process

O.S. Panwar; B. Deb; B.S. Satyanarayana; Mohd Alim Khan; R. Bhattacharyya; A.K. Pal


Indian Journal of Pure & Applied Physics | 2008

Effect of hydrogen and nitrogen incorporation on the properties of tetrahedral amorphous carbon films grown using S bend filtered cathodic vacuum arc process

O. S. Panwara; Mohd Alim Khan; G. Bhagavanarayana; P. N. Dixit; Sushil Kumar; C. M. S. Rauthan


Diamond and Related Materials | 2004

Space charge limited conduction and electron paramagnetic resonance studies of as grown and nitrogen incorporated tetrahedral amorphous carbon films deposited by pulsed unfiltered cathodic vacuum arc process

O.S. Panwar; S.K. Gupta; Mohd Alim Khan; B.S. Satyanarayana; R. Bhattacharyya


Indian Journal of Pure & Applied Physics | 2008

Plasma diagnostic studies of S bend filtered cathodic vacuum arc system for the deposition of tetrahedral amorphous carbon films

O. S. Panwar; Mohd Alim Khan; P. N. Dixit; Bonthu Satyanarayana; R. Bhattacharyya; Sushil Kumar; C. M. S. Rauthan

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O.S. Panwar

National Physical Laboratory

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R. Bhattacharyya

National Physical Laboratory

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Bonthu Satyanarayana

Manipal Institute of Technology

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Ishpal

National Physical Laboratory

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S. M. Shivaprasad

Jawaharlal Nehru Centre for Advanced Scientific Research

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Sushil Kumar

National Physical Laboratory

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B.S. Satyanarayana

National Archives and Records Administration

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B. R. Mehta

Indian Institute of Technology Delhi

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C. M. S. Rauthan

Council of Scientific and Industrial Research

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Mahesh Kumar

National Physical Laboratory

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