Moustafa El Kurdi

Band structure and optical gain of tensile-strained germanium based on a 30 band k·p formalism

We have investigated the band structure of tensile-strained germanium using a 30 band k⋅p formalism. This multiband formalism allows to simultaneously describe the valence and conduction bands, including the L, Δ, and Γ valleys. We calculate the energy band variation as a function of strain and obtain that the crossover from indirect to direct band gap occurs for a tensile in-plane strain of 1.9%. The effective masses of density of states are deduced from the calculated conduction and valence band density of states. Significant deviations are observed as compared to the effective masses of density of states values of unstrained bulk germanium. We finally calculate the optical gain that can be achieved with tensile-strained bulk germanium. An optical gain larger than 3000 cm−1 is predicted for a carrier density of 1×1018 cm−3 and a 3% in-plane biaxial strain. This optical gain is larger than the one of GaAs calculated with the same formalism and is much larger than the experimental free-carrier absorption ...

Making germanium, an indirect band gap semiconductor, suitable for light-emitting devices*

Germanium (Ge) is a group-IV indirect band gap semiconductor but the difference between its direct and indirect band gap is only 140 meV. It has been shown that when Ge is subjected to a tensile strain and a heavy n-doping level, room-temperature photoluminescence (PL) can be greatly enhanced. Among these two factors, achieving a heavy n-doping level in Ge (i.e., electron concentrations higher than 1 × 1019 cm−3) is a challenge since the solubility of most group-V elements (P, As, Sb) in Ge is very low. We report here Ge growth on silicon substrates using molecular beam epitaxial (MBE) technique. To enhance the n-doping level in Ge, a specific n-doping process based on the decomposition of the GaP compound has been implemented. The GaP decomposition allows producing P2 molecules, which have a higher sticking coefficient than that of P4 molecules. We show that phosphorus doping at low substrate temperatures followed by flash thermal annealing are essential to get a high doping level. We have obtained an activate phosphorus concentration up to 2 × 1019 cm−3 and room-temperature PL measurements reveal an intensity enhancement up to 50 times. This result opens a new route for the realization of group-IV semiconductor optoelectronic devices.

Tensile Strained Ge Layers Obtained via a Si-CMOS Compatible Approach

Although rapid advances in Si photonics over the last decade has enabled mass production of higher functionality and lower cost photonic components (such as waveguides, couplers, modulators, photodetectors, etc..) integrated with both digital and analog circuitry in silicon complementary metal oxide semiconductor technology (Si-CMOS), an efficient electrically-pumped light emitter integrated in the Si-CMOS has so far been considered the Holy Grail of the monolithic electronics-photonics integration.

Q factor limitation at short wavelength (around 300 nm) in III-nitride-on-silicon photonic crystal cavities

III-nitride-on-silicon L3 photonic crystal cavities with resonances down to 315 nm and quality factors (Q) up to 1085 at 337 nm have been demonstrated. The reduction of the quality factor with decreasing wavelength is investigated. Besides the quantum well absorption below 340 nm, a noteworthy contribution is attributed to the residual absorption present in thin AlN layers grown on silicon, as measured by spectroscopic ellipsometry. This residual absorption ultimately limits the Q factor to around 2000 at 300 nm when no active layer is present.

Two-Dimensional Photonic Crystals Coupled to One-Dimensional Bragg Mirrors

Planar two-dimensional (2-D) photonic crystals can be combined with a one-dimensional (1-D) Bragg mirror to control the quality factor and out-of-plane coupling of optical modes. We have investigated the optical properties of such structures fabricated on silicon. The optical properties are probed by the room-temperature photoluminescence of Ge/Si self-assembled islands as an internal source. We show that the enhancement of the quality factor can be obtained by controlling the thickness of the silicon upper layer in which the 2-D photonic crystal is etched and the air filling factor of the photonic crystal. Quality factors of 2200 around 1100nm are obtained by this method for bulk photonic crystals with a square lattice pattern. The experimental results are supported by three-dimensional (3-D) finite-difference time-domain calculations of the investigated structures

III-nitride on silicon microdisks: electrical injection and bus waveguide side-coupling (Conference Presentation)

Group-III-nitride nanophotonics on silicon is a booming field, from the near-IR to the UV spectral range. The main interest of III-nitride nanophotonic circuits is the integration of active structures and laser sources. Laser sources with a small footprint can be obtained with microresonators formed by photonic crystals or microdisks, exhibiting quality factors up to a few thousand down to the UV-C. So far, single microdisk laser devices have been demonstrated, mostly under optical pumping. Combining microdisk lasers under electrical injection with passive devices represents a major challenge in realizing a viable III-nitride nanophotonic platform on silicon. As a first step to realize this goal, we have separately demonstrated electroluminescence from microdisks and side-coupling of microdisks to bus waveguides with outcoupling gratings in the blue spectral range. We have developed the fabrication of electrically injected microdisks with a circular p-contact on top of the disk that is connected to a larger pad via a mechanically stable metal microbridge. Blue electroluminescence is observed under current injection at room temperature. We also demonstrated high Q factor (Q > 2000) WGMs in the blue spectral range from microdisks side-coupled to bus waveguides, as measured from the luminescence of embedded InGaN quantum wells. The WGM resonances are clearly observed through outcoupling gratings following propagation in partially etched waveguides to remove quantum well absorption. Small gaps between microdisks and bus waveguides of around 100 nm are necessary for efficient coupling in the blue spectral range, which represents a major fabrication challenge. We will discuss the progress brought by these building blocks to generate future III-nitride photonic circuits.

Blue microlasers integrated on a photonic platform on silicon

The main interest of group-III-nitride nanophotonic circuits is the integration of active structures and laser sources. A photonic platform of group-III-nitride microdisk lasers integrated on silicon and emitting in the blue spectral range is demonstrated. The active microdisks are side-coupled to suspended bus waveguides, and the coupled emission is guided and outcoupled to free space using grating couplers. A small gap size of less than 100 nm between the disk and the waveguide is required in the blue spectral range for optimal evanescent coupling. To avoid reabsorption of the microdisk emission in the waveguide, the quantum wells are etched away from the waveguide. Under continuous-wave excitation, loaded quality factors greater than 2000 are observed for the whispering gallery modes for devices with small gaps and large waveguide bending angles. Under pulsed excitation conditions, lasing is evidenced for 3 μm diameter microdisks integrated in a full photonic circuit. We thus present a first demonstrat...

Ge/Si self-assembled Islands for Photonics Applications

We first present an analysis of the band line-up in the case of SiGe/Si quantum wells and in the case of SiGe/Si self-assembled islands. The conduction and valence band diagrams are obtained from a 30 band k.p Hamiltonian which allows to describe simultaneously conduction and valence band states. The strain field is obtained from a microscopic valence force field theory. The band edge alignment is strongly dependent on the input parameters for this heterosystem. We determine the average valence band offset from photoluminescence measurements of heterostructures grown on relaxed SiGe buffer layers. A type II band line-up is calculated for all Ge compositions in the case of two-dimensional quantum wells and SiGe/Si self-assembled islands. The 30-band formalism allows the determination of the near-infrared interband recombination energy as a function of the self-assembled island structural parameters. We then present recent results obtained by embedding SiGe/Si self-assembled islands in two-dimensional photonic crystals. The photoluminescence of GeSi islands acts as an internal probe to characterize the optical properties of silicon-based two-dimensional photonic crystals designed for the near-infrared spectral range. Cavities, defect-free photonic crystals operated at the second Bragg order and two-dimensional photonic crystals fabricated on top of one-dimensional Bragg mirrors (2D + 1D) are described. We show that, in the case of 2D +1D structures, we can control the quality factor of optical modes at the second Bragg order by matching the resonance conditions and controlling the thickness of the layers. Photonic crystals with pure Ge layers are finally described.

Light emission from Ge/Si self-assembled islands in microcavities

We have investigated the optical properties of defect-microcavities in two-dimensional photonic crystals by the room temperature photoluminescence of Ge/Si self-assembled islands. Enhanced emission is observed at 300 K in the 1.2 -1.6 /spl mu/m spectral range.