Mushtaq Ali

Magnetic properties of ultrathin Ni81Fe19 films with Ta and Ru capping layers.

Magnetic properties of Ni81Fe19 (permalloy) ultrathin films with Ru and Ta capping layers (CLs) were investigated for applications to magnetic random access memory units (MRAM). The sample structure, which simulated an MRAM free layer, is Si- sub./SiO2/Ni81Fe19/Ru(Ta). The Ni81Fe19 thin films less than 3 nm thick with Ru CL show low coercive fields compared with the Ta capping layer. Both systems showed loss of momentum equivalent to magnetically dead layers of thickness (δ) ~0.6 nm for Ru cap layer and ~1.4 nm for Ta cap layer, respectively. Moreover, after annealing the thicknesses are slightly increased to an equivalent magnetic dead layer thickness of δ ~0:84 nm and ~1.80 nm for Ru and Ta CL, respectively. Our calculations showed that the presence of only 11% Ta concentration at the interface reduced the Ni momentum to zero, with the Ni–Ta coupling being anti-ferromagnetic; while 50% Ru intermixing at the interface reduced the Ni momentum to zero with the coupling between Ru and Ni being ferromagnetic. To find out more about the intermixing at the interface, the composition and chemical states were characterized by the x-ray photoelectron spectroscopy and peak decomposition technique. The result showed that the peak positions were different from the pure metallic case at the interface region, mainly because of the intermixing between two layers. In conclusion, the Ru capping layer might be important for MRAM use in terms of low coercive field and small δ layer thickness if compared with the Ta capping layer.

Optimal construction parameters of electrosprayed trilayer organic photovoltaic devices

A detailed investigation of the optimal set of parameters employed in multilayer device fabrication obtained through successive electrospray deposited layers is reported. In this scheme, the donor/acceptor (D/A) bulk heterojunction layer is sandwiched between two thin stacked layers of individual donor and acceptor materials. The stacked layers geometry with optimal thicknesses plays a decisive role in improving operation characteristics. Among the parameters of the multilayer organic photovoltaics device, the D/A concentration ratio, blend thickness and stacking layers thicknesses are optimized. Other parameters, such as thermal annealing and the role of top metal contacts, are also discussed. Internal photon to current efficiency is found to attain a strong response in the 500 nm optical region for the most efficient device architectures. Such an observation indicates a clear interplay between photon harvesting of active layers and transport by ancillary stacking layers, opening up the possibility to engineer both the material fine structure and the device architecture to obtain the best photovoltaic response from a complex organic heterostructure.