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Dive into the research topics where N. A. Economou is active.

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Featured researches published by N. A. Economou.


Journal of Materials Science | 1981

On the phase diagram of the Ga-Te system in the composition range 55 at % Te

J.G. Antonopoulos; Th. Karakostas; G. L. Bleris; N. A. Economou

Monoclinic Ga-Te was heated in the electron microscope. At about 800° C decomposition was observed and after cooling down to room temperature, two compounds were identified: the fcc Ga2Te3 and the Ga3Te4, for which a trigonal structure was identified. A relation between the three structures of Ga-Te, Ga3Te4 and Ga2Te3 is put forward.


Journal of Crystal Growth | 1976

Growth of Germanium Monoselenide single crystals

D.S. Kyriakos; Th. Karakostas; N. A. Economou

Abstract GeSe single crystals are grown in an ampoule by vapour transport. The mp and the orthorhombic symmetry was confirmed. Transmission electron microscope studies revealed that the crystals are composed of areas of simple structure and areas were a more complicated structure is evident. This structure, by lattice image techniques was proved to contain periodic spacing anomalies, with walls lying on (110) planes.


Acta Crystallographica Section A | 1978

The ordered state of In3Te4

Th. Karakostas; N. F. Flevaris; N. Vlachavas; G. L. Bleris; N. A. Economou

The composition of In3Te4 has been established as a single-phase material. Single crystals of this material have been prepared and its structure has been identified as tetragonal with lattice parameters a0 = b0 = 6.173 and c0 = 12.438 A. The stability of the structure has also been investigated.


Journal of Materials Science | 1992

Ultra-low pressure chemical vapour deposition of polycrystalline and amorphous silicon

W. Ahmed; D. B. Meakin; J. Stoemenos; N. A. Economou; R.D. Pilkington

The deposition of undoped polycrystalline and amorphous silicon in an ultra-low pressure chemical vapour deposition system capable of achieving operating pressure of 0.03 Pa is discussed. It is found that at deposition temperatures in the region of 630 °C and reactor pressures of less than 1.3 Pa very large grained polycrystalline silicon films are obtained, and in this regime the growth rate is independent of the reactor pressure. Excellent uniformity is obtained and the process can be easily scaled up for large substrates and high volume batch production.


Materials Research Bulletin | 1980

On the high temperature electrical resistivity behaviour of Cu55-Ni45 alloy

S. Chadjivasiliou; J.A. Tsoukalas; H. Papadimitraki-Chlichlia; J.G. Antonopoulos; Th. Karakostas; N. A. Economou

Resistivity measurements supplemented with electron microscopy investigation in a Cu55-Ni45 alloy are reported, in the temperature range 273–700 K. An anomalous high temperature resistivity minimum is observed at 673 K whereas at the same temperature diffuse intensity maxima appear. It is suggested that the resistivity minimum could be attributed to the effect of short range order cluster formation.


Physica Status Solidi (a) | 1975

Ordered phases of In2Te3

Th. Karakostas; N. A. Economou


Physica Status Solidi (a) | 1976

On the short‐range order arrangement at the transition state of β‐In2Te3

G. L. Bleris; Th. Karakostas; J. Stoemenos; N. A. Economou


Physica Status Solidi (a) | 1978

The ordered state of In2Te3 and its relation to the transition state

G. L. Bleris; Th. Karakostas; N. A. Economou; R. de Ridder


Physica Status Solidi (a) | 1980

An electron microscopic examination of monoclinic GaTe

Th. Karakostas; J.G. Antonopoulos; S. Kokkou; G. L. Bleris; N. A. Economou


Journal of Materials Science Letters | 1988

The preferred orientation of silicon films grown by Lpcvd at relatively low temperatures

Th. Karakostas; D. Meakin; P. Migliorato; J. Stoemenos; N. A. Economou

Collaboration


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Th. Karakostas

Aristotle University of Thessaloniki

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G. L. Bleris

Aristotle University of Thessaloniki

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J. Stoemenos

Aristotle University of Thessaloniki

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J.G. Antonopoulos

Aristotle University of Thessaloniki

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F. Komninou

Aristotle University of Thessaloniki

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K. Chrissafis

Aristotle University of Thessaloniki

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O. Valassiades

Aristotle University of Thessaloniki

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Ph. Komninou

Aristotle University of Thessaloniki

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S. Kokkou

Aristotle University of Thessaloniki

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