N. D. Zakharov

NANO-phase SBT-family ferroelectric memories

Abstract Recent studies have produced 0.1 × 0.1 μm ferroelectric cells in both bismuth titanate and strontium bismuth tantalate, thus taking thin-film ferroelectric memories into the regime of nanoscale (100 nm or less) devices. A review is presented of deposition, switching, and leakage current in these devices, which are small enough to permit 1 Gbit memories on a standard Si chip.

Nanoshell tubes of ferroelectric lead zirconate titanate and barium titanate

Wafer-scale fabrication of ferroelectric oxide nanoshell tubes as well as ordered nanotube arrays have been accomplished using a simple and convenient fabrication method that allows full tailoring of tube dimensions as well as array pattern and size. Using different silicon and alumina templates, barium titanate and lead zirconate titanate tubes with diameters ranging from 50 nm up to several micrometers meter and lengths of more 100 μm have been fabricated. Ferroelectric switching of submicrometer tubes has been shown using piezoresponse scanning probe microscopy.

Silicon nanowhiskers grown on 〈111〉Si substrates by molecular-beam epitaxy

Silicon nanowhiskers in the diameter range of 70 to 200 nm were grown on 〈111〉-oriented silicon substrates by molecular-beam epitaxy. Assuming the so-called “vapor–liquid–solid” (VLS) growth process to operate, we initiated the growth by using small clusters of gold at the silicon interface as seeds. The in situ generation of the Au clusters as well as the growth parameters of the whiskers are discussed. The experimentally observed radius dependence of the growth velocity of the nanowhiskers is opposite to what is known for VLS growth based on chemical vapor deposition and can be explained by an ad-atom diffusion on the surface of the whiskers.

Switching properties of self-assembled ferroelectric memory cells

In this letter, we report on the switching properties of an ordered system of Bi4Ti3O12 ferroelectric memory cells of an average lateral size of 0.18 μm formed via a self-assembling process. The ferroelectricity of these cells has been measured microscopically and it has been demonstrated that an individual cell of 0.18 μm size is switching. Switching of single nanoelectrode cells was achieved via scanning force microscopy working in piezoresponse mode.

Self-patterning nano-electrodes on ferroelectric thin films for gigabit memory applications

In the present work, we report self-assembling bismuth-containing nano-electroded cells of layered perovskite ferroelectric thin films that are about 200 nm in size, that is 50 times smaller than the smallest cell reported to date. Heteroepitaxial Bi-rich Bi4Ti3O12 films were grown by pulsed laser deposition (PLD) on top of epitaxial conductive La0.5Sr0.5CoO3 (LSCO) layers equally deposited by PLD. The epitaxial LSCO has been grown on top of an epitaxial CeO2 yttrium-stabilized zirconia (YSZ) stack, itself deposited by PLD on Si(100) substrates. As a consequence of the high substrate temperature during the epitaxial deposition of the Bi4Ti3O12 layer, the excess Bi segregates, migrates to the surface where it forms a self-organized array of epitaxial mesas which possess metallic-like electrical characteristics.

Structural and electrical properties of electron beam gun evaporated Er2O3 insulator thin films

We present a detailed study of the evolution with annealing temperature (in an oxygen environment) of the morphological and structural properties of thin erbium oxide (Er2O3) films evaporated in an electron beam gun system. The electrical characteristics of metal-oxide-semiconductor structures are also described. Atomic force microscope and x-ray difractometry were used to map out the morphology and crystalline nature of films ranging in thickness from 4.5 to 100 nm. High-resolution cross-sectional transmission electron microscopy imaging and Auger electron spectroscopy reveal three sublayers: an outer dense nanocrystalline Er2O3 layer, a middle transition layer and amorphous SiO2 film placed close to the Si substrate. The effective dielectric constant depends on the thickness and the annealing temperature. A 1–2.8 nm interfacial SiO2 layer as well as an ErO inclusion with low polarizability are formed during the deposition and the annealing process has a profound effect on the dielectric constant and the leakages. The minimum effective oxide thickness is 2.4–2.8 nm and in the thinnest films we obtained a leakage current density as low as 1–5×10−8 A/cm2 at an electric field of 1 MV/cm. We observe a shift of the flatband voltage to the positive side and significant lowering of the positive charge down to ∼1×1010 cm−2. For a 4.5 nm film, the maximum total breakdown electric field was approximately 1×107 V/cm.We present a detailed study of the evolution with annealing temperature (in an oxygen environment) of the morphological and structural properties of thin erbium oxide (Er2O3) films evaporated in an electron beam gun system. The electrical characteristics of metal-oxide-semiconductor structures are also described. Atomic force microscope and x-ray difractometry were used to map out the morphology and crystalline nature of films ranging in thickness from 4.5 to 100 nm. High-resolution cross-sectional transmission electron microscopy imaging and Auger electron spectroscopy reveal three sublayers: an outer dense nanocrystalline Er2O3 layer, a middle transition layer and amorphous SiO2 film placed close to the Si substrate. The effective dielectric constant depends on the thickness and the annealing temperature. A 1–2.8 nm interfacial SiO2 layer as well as an ErO inclusion with low polarizability are formed during the deposition and the annealing process has a profound effect on the dielectric constant and the...

Single-mode submonolayer quantum-dot vertical-cavity surface-emitting lasers with high modulation bandwidth

Single-mode vertical-cavity surface-emitting lasers based on dense arrays of stacked submonolayer grown InGaAs quantum dots, emitting near 980nm, demonstrate a modulation bandwidth of 10.5GHz. A low threshold current of 170μA, high differential efficiency of 0.53W∕A, and high modulation current efficiency factor of 14GHz∕mA are realized from a 1μm oxide aperture single-mode device with a side mode suppression ratio of >40dB and peak output power of >1mW. The lasers are also suitable for high temperature operation.

Luminescence emission from forward- and reverse-biased multicrystalline silicon solar cells

We study the emission of light from industrial multicrystalline silicon solar cells under forward and reverse biases. Camera-based luminescence imaging techniques and dark lock-in thermography are used to gain information about the spatial distribution and the energy dissipation at pre-breakdown sites frequently found in multicrystalline silicon solar cells. The pre-breakdown occurs at specific sites and is associated with an increase in temperature and the emission of visible light under reverse bias. Moreover, additional light emission is found in some regions in the subband-gap range between 1400 and 1700 nm under forward bias. Investigations of multicrystalline silicon solar cells with different interstitial oxygen concentrations and with an electron microscopic analysis suggest that the local light emission in these areas is directly related to clusters of oxygen.

On the formation of Si nanowires by molecular beam epitaxy

Abstract Silicon nanowires can be successfully grown by applying the vapor–liquid–solid process. In the case of the commonly used chemical vapor deposition technique, a Si containing gas/precursor is cracked at Au droplets acting as seeds. Si adatoms are subsequently dissolved in the liquid metal. Due to a supersaturation within this droplet, Si precipitates predominantly at the liquid–solid interface – a nanowire grows. A different situation occurs if nanowires are grown by molecular beam epitaxy via the vapor–liquid–solid mechanism. The difference consists, for example, of the role of the metal seed, the morphology of the nanowires and their aspect ratio. In particular, surface diffusion including the metal used as well as Si, strongly influences the growth process. This article describes molecular beam epitaxy growth experiments of Si nanowires under ultra-high vacuum conditions and compares the results with other growth techniques.

Charge transport in Si nanocrystal/SiO2 superlattices

Size-controlled silicon nanocrystals in silicon oxynitride matrix were prepared using plasma-enhanced chemical vapor deposition following the superlattice approach. A combination of current transport and charge trapping studies is carried out on a number of samples with varied structural configuration. We demonstrate that at low electric fields, trapping of injected carriers dominates, if the coupling between the silicon nanocrystals is strong. In contrast, we show that at higher electric fields, the charge distribution within the films is essentially governed by charge separation within the superlattice. This effect can be well explained by a two-step electric field ionization of silicon nanocrystals that proceeds via defect-assisted band-to-band tunneling of silicon valence electrons to the conduction band and is mediated by silicon surface dangling bonds. The defects are dominating the charge transport even if the defect density is reduced to a minimum by efficient hydrogen passivation.