Nagao Kamijo

Microbeam of 100 keV x ray with a sputtered-sliced Fresnel zone plate

Microfocusing of 100 keV x ray with a sputtered-sliced Fresnel zone plate (ss-FZP) has been performed at the 250-m-long beamline (20XU) of SPring-8. The ss-FZP with an outermost zone width 0.16 μm which is composed of 70 layers of alternating Cu and Al layers and having thickness ∼180 μm was fabricated and characterized. The minimum focal spot size attained for the first order focal beam was 0.5 μm with a focal distance 900 mm at a photon energy 100 keV. The total flux of the microprobe was ∼2×106u200aphotonsu200as−1u200aμm−2.

Development of a multilayer Fresnel zone plate for high-energy synchrotron radiation X-rays by DC sputtering deposition

Hard X-ray microscopy with high spatial resolution (<or=0.1 microm) using a high-energy and high-brilliance X-ray microprobe is expected to be a promising technology for various types of analysis, imaging etc. in materials science, biology and medicine. A multilayer Fresnel zone plate (FZP) could be a promising approach to focusing optics in the high-energy X-ray region (>or=20 keV) because a large thickness (aspect ratio) can be available. Various types of multilayer FZPs have been fabricated by DC sputtering deposition. Their focusing characteristics have been evaluated at the high-brilliance undulator beamline BL47XU of SPring-8. An optical system using a Cu/Al multilayer FZP (with an outermost zone width of 0.25 microm) as the focusing optics fabricated by the optimum deposition condition with precise film (zone) thickness control has attained an almost diffraction-limited microbeam of 0.3-0.35 microm at 8.9 keV. A line-and-space resolution test pattern has been observed: fine structures up to 0.2 microm were clearly observed in the measured image. This FZP has been working since 1995, keeping good focusing characteristics. It can be said from these results that a spatial resolution better than 0.1 microm in the high-energy X-ray region is in prospect by the development of a multilayer FZP with a narrower outermost zone width in the near future.

X-ray imaging microscopy at 25keV with Fresnel zone plate optics

X-ray imaging microscopy with a sputtered-sliced Fresnel zone plate (SS-FZP) has been developed at an X-ray energy of 25keV. Objects were imaged in transmission with the SS-FZP as an objective with a magnification of 10.2 times, and detected with a X-ray image sensor. The performance of the imaging microscope has been tested with a gold mesh and a resolution test pattern at an undulator beamline 47XU of SPring-8. The resolution test patterns up to 0.5mm line-and-space structures have been resolved. # 2001 Elsevier Science B.V. All rights reserved.

Hard X-ray microbeam experiments with a sputtered-sliced Fresnel zone plate and its applications.

Hard X-ray microbeam experiments with sputtered-sliced Fresnel zone plates have been performed. Zone plates with an outermost zone width of 0.25 microm (#FZP1) and 0.1 microm (#FZP2) were fabricated and evaluated. In a scanning X-ray microscopy experiment, a line-and-space pattern with structure as fine as 0.1 microm was resolved using #FZP2 at an X-ray wavelength of 1 A. As an application of the microbeam technique, a two-dimensional distribution of constituent elements in forensic samples has been obtained (e.g. section view of human and elephant hairs) using fluorescent scanning microscopy.

Hard X-ray Microbeam Experiment at the Tristan Main Ring Test Beamline of the KEK

A hard X-ray microbeam with zone-plate optics has been tested at the MR-BW-TL beamline on the Tristan main ring of the KEK, and preliminary experiments on scanning microscopy have also been performed. A sputtered-sliced Fresnel zone plate with an Au core and Ag/C multilayer is used as an X-ray focusing device. The outermost zone width of the zone plate is 0.25 microm. A focused spot size of approximately 0.5 mum has been achieved at an X-ray energy of 8.54 keV. In a scanning X-ray microscopy experiment, test patterns with submicrometer fine structure have been clearly resolved.

Zernike-type X-ray imaging microscopy at 25 keV with Fresnel zone plate optics

A Zernike-type imaging microscope using a sputtered-sliced Fresnel zone plate (SS-FZP) has been developed and tested at an X-ray energy of 25 keV. The SS-FZP was used as an objective. A copper (Cu) phase plate was placed at the back focal plane of the SS-FZP in order to produce phase contrast. The performance of the Zernike-type imaging microscope was tested with a gold (Au) mesh and a resolution test pattern at undulator beamline 47 of SPring-8. The Au mesh and the resolution test pattern could be imaged in transmission with a magnification of x10.2. Owing to the Cu phase plate, different image contrast was observed compared with the bright-field image contrast. Tantalum microstructures down to 0.5 microm line-and-space have been observed on spatial resolution test patterns.

X-ray microbeam with sputtered-sliced Fresnel zone plate at SPring-8 undulator beamline

Abstract A hard X-ray microbeam created from a sputtered-sliced Fresnel zone plate has been tested at SPring-8 undulator beamline. Focusing properties are evaluated in the X-ray wavelength regions of 0.15– 1.5 A . The measured focal beam size is about 0.6 μm at an X-ray wavelength of 1.4 A . In a scanning microscopy experiment, resolution-test-patterns with 0.2 μm structure are resolved at an X-ray wavelength of 0.45 A .

Quasi-kinoform type multilayer zone plate with high diffraction efficiency for high-energy X-rays

Fresnel zone plate (FZP) with high diffraction efficiency leads to high performance X-ray microscopy with the reduction of the radiation damage to biological specimens. In order to attain high diffraction efficiency in high energy X-ray region, we have developed multilevel-type (6-step) multilayer FZPs with the diameter of 70 micron. The efficiencies of two FZPs were evaluated at the BL20XU beamline of SPring-8. For one FZP, the peak efficiency for the 1st-order diffraction of 51% has been obtained at 70 keV. The efficiencies higher than 40% have been achieved in the wide energy range of 70–90 keV. That for the 2nd-order diffraction of 46% has been obtained at 37.5 keV.

Microfocusing of 82 keV x rays with a sputtered-sliced Fresnel zone plate

An experiment to focus 82 keV x rays with a sputtered-sliced Fresnel zone plate (SS-FZP) optics was performed at an x-ray undulator beamline 20XU of SPring-8. The achieved beam size was 1.1 μm in vertical and 1.3 μm in horizontal directions. The measured flux density was 7×105u2009(photons/s/μm2).

Suppression of Corrugated Boundaries in Multilayer Fresnel Zone Plate for Hard X-Ray Synchrotron Radiation Using Cylindrical Slit

Corrugated zone roughness of a circular Cu/Al multilayer Fresnel zone plate (FZP) was successfully suppressed. Such a zone corrugation was often observed in the concentric multilayers prepared using a conventional sputtering apparatus. The zone corrugation is a consequence of the oblique component of the deposition flux (i.e. shadowing effect). We therefore set a cylindrical slit (a linear slit on the surface of a stainless steel cylindrical shield) between the target and the substrate in order to eliminate the oblique flux. As a result, the zone corrugation was not observed using a scanning ion microscope (SIM).