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Naokichi Hosokawa

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Publication

Featured researches published by Naokichi Hosokawa.

Archive | 1985

Target assembly capable of attaining a high step coverage ratio in a magnetron-type sputtering device

Yohichi Hirukawa; Toshiyuki Nozaki; Naokichi Hosokawa

Shinku | 1973

The Effect of rf-Power Dissipation on the Temperature of Substrate in a rf-Sputtering System

Naokichi Hosokawa; Masashi Nakatsukasa

Shinku | 1976

New Magnetron-Sputtering Methods and their Application for Electronic Device Fabrication

Naokichi Hosokawa

Journal of The Surface Finishing Society of Japan | 1985

Sputtering: History and applications.

Shiro Fukushima; Naokichi Hosokawa

Shinku | 1981

High-rate Magnetron RF Sputtering of Tantalum

Shiro Fukushima; Naokichi Hosokawa; Takayuki Mizuta

Shinku | 1976

Effect of Vacuum Quality on the Deposition Rate of SiO2 in an rf-Sputtering System

Naokichi Hosokawa

Shinku | 1987

Caracteristics of TiN Thin Films Prepared by Inline Sputtering System for VLSI

Hitoshi Yamanishi; Hidekazu Yoshihara; Hiroaki Kitahara; Naokichi Hosokawa

Shinku | 1985

Characteristics of Silicide Thin Films Prepared by Sputtering Using Hot-Pressed Target (II)

Hidekazu Yoshihara; Hiroaki Kitahara; Naokichi Hosokawa

Shinku | 1985

Step Coverage of Al Films Prepared by DC Magnetron Sputtering Using the Dual-Structure Target

Toshiyuki Nozaki; Yoichi Hirukawa; Makoto Goto; Hiroaki Kitahara; Naokichi Hosokawa

Shinku | 1980

Preparation and Properties of Carbon Films with Magnetron Sputtering

Akio Konishi; Naokichi Hosokawa; Katsuto Annoh; Hajime Hiratsuka

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Hajime Hiratsuka

Japan Atomic Energy Research Institute

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Hitoshi Yamanishi

Osaka Electro-Communication University

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Katsuto Annoh

Japan Atomic Energy Research Institute

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Takayuki Mizuta

NEC

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