Nicole D. Kerness

3D heterogeneous integration for analog

We illustrate capabilities of 3D integration for analog applications through both wafer-level and packaging technologies. Examples of wafer-level 3D integration include integrated capacitors and optical sensors. Integrated Si capacitors demonstrate the highest reported capacitor density of C=1 μF/mm2 (=1,000 fF/μm2) and the figure of merit (FOM) C*Vbd=11 C/m2 (Vbd is the breakdown voltage). Through-Si vias can be used to combine passive and active die into a single stack. Addition of optical layers to the Bipolar CMOS DMOS (BCD) process allows light detection in the visible and infrared range. 3D package-level integration is illustrated by embedding of multiple active and passive components in one package.