Nobuhiko Kakuda
Nippon Telegraph and Telephone
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Publication
Featured researches published by Nobuhiko Kakuda.
IEEE Electron Device Letters | 1985
Nobuhiko Kakuda; Tsutomu Wada; Noboru Naito; Nobuo Mutoh
A five-metal-layered interconnection 20k gate CMOS LSI is fabricated using polyimide resist insulators. It is proved that the use of polyimide resist insulators results in excellent planarization, small residual stress, a smooth via profile, and a reduction in the number of steps required for the process. As a result, this technique appears to be a practical means of fabricating five or more layered interconnection systems.
Archive | 1991
Nobuhiko Kakuda; Tsutomu Wada; Kinya Kato; Tadamichi Kawada; Masamichi Okamura; Shigeo Aoki; Yasuhiro Ukai; Kiyoshi Taruta; Tomihisa Sunata; Hiroshi Saito; Takanobu Nakagawa
Archive | 1988
Kinya Kato; Nobuhiko Kakuda; Noboru Naito; Tsutomu Wada
Archive | 1991
Kinya Kato; Nobuhiko Kakuda; Noboru Naito; Tsutomu Wada
Archive | 1991
Nobuhiko Kakuda; Tsutomu Wada; Kinya Kato; Tadamichi Kawada; Masamichi Okamura; Shigeo Aoki; Yasuhiro Ukai; Kiyoshi Taruta; Tomihisa Sunata; Hiroshi Saito; Takanobu Nakagawa
Archive | 1988
Kinya Kato; Nobuhiko Kakuda; Noboru Naito; Tsutomu Wada
Electronics and Communications in Japan Part Ii-electronics | 1986
Noboru Naito; Nobuhiko Kakuda; Tsutomu Wada
Archive | 1991
Nobuhiko Kakuda; Tsutomu Wada; Kinya Kato; Tadamichi Kawada; Masamichi Okamura; Shigeo Aoki; Yasuhiro Ukai; Kiyoshi Taruta; Tomihisa Sunata; Hiroshi Saito; Takanobu Nakagawa
Archive | 1991
Nobuhiko Kakuda; Tsutomu Wada; Kinya Kato; Tadamichi Kawada; Masamichi Okamura; Shigeo Aoki; Yasuhiro Ukai; Kiyoshi Taruta; Tomihisa Sunata; Hiroshi Saito; Takanobu Nakagawa
Archive | 1991
Nobuhiko Kakuda; Tsutomu Wada; Kinya Kato; Tadamichi Kawada; Masamichi Okamura; Shigeo Aoki; Yasuhiro Ukai; Kiyoshi Taruta; Tomihisa Sunata; Hiroshi Saito; Takanobu Nakagawa
