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Dive into the research topics where Nobuo Matsumura is active.

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Featured researches published by Nobuo Matsumura.


Japanese Journal of Applied Physics | 1989

Y-line emission and lattice relaxation in MBE-ZnSe and -ZnSSe on GaAs

Junji Saraie; Nobuo Matsumura; Mitsutaka Tsubokura; Kazuhiro Miyagawa; Nobuhiro Nakamura

The Y-line emission in photoluminescence spectra at 11 K was studied in MBE-ZnSe and -ZnSSe (up to a sulfur content x=0.13) on GaAs. Compared with X-ray diffraction data, the Y-line seems to relate to misfit dislocations, and thus seems a good measure for checking lattice relaxation in ZnSe and ZnSSe epilayers with a sulfur content x 0.05, the reasons for which are discussed.


Journal of Crystal Growth | 1985

Preparation of CdTe thin films on Ge substrates by molecular beam epitaxy

Nobuo Matsumura; Takefumi Ohshima; Junji Saraie; Yutaka Yodogawa

Abstract CdTe films were epitaxially grown on (111) and (100) Ge substrates by MBE at substrate temperatures above 200°C in spite of the large lattice mismatch of 13.5%. From X-ray diffraction and intensity of exciton emissions in photoluminescence the quality of the films was found to be the best at 350°C and the J Cd / J Te ratio of 1/1. But some distortion existed in the epitaxial films. Especially, very large strain remained in the grown films on (100) substrates although the surface morphology was smooth. The (111) films were twinned while the (100) films were not. These results suggest that the twinning in every small area relaxes the lattice strain in (111) films.


Journal of Crystal Growth | 1988

MBE growth of high quality lattice-matched ZnSxSe1-x on GaAs substrates

Nobuo Matsumura; Mitsutaka Tsubokura; Junji Saraie; Yutaka Yodogawa

We present the optimum growth conditions of lattice-matched ZnSxSe1-x (x ≈ 0.055) by MBE on (100) GaAs substrates. Surface morphology, X-ray diffraction and photoluminescence were investigated, and the optimum growth conditions were revealed as follows: The molecular beam intensity ratio of the group VI to II element is around 2.0 and the substrate temperature is 340 °C. This molecular beam ratio means that the surface coverage fractions of the group II and group VI atoms are the same during growth. It is shown by comparing the photolumunescence spectra that the quality of the ZnSxSe1-x epilayers was higher than that of ZnSe.


Journal of Crystal Growth | 1990

Laser irradiation during MBE growth of ZnSxSe1−x: A new growth parameter

Nobuo Matsumura; Takashi Fukada; Junji Saraie

Abstract The effects of light irradiation of a He-Cd laser (441.6 nm) on MBE growth of ZnS x Se 1− x ( x =0−0.13) were studied. The growth rates of the epilayers were reduced and the photo-desorption rate constanSts of Zn, Se and S were obtained. In the photoluminescence spectra at 11 K, the intensities of the free exciton emission increased, and thus the crystallinity of the epilayers was found to be improved. The behavior of surface adatoms on the growing surface under laser irradiation is discussed.


Journal of Crystal Growth | 1985

Growth of ZnSxSe1−x by MBE on (100)GaAs substrates: Effect of lattice-matching

Nobuo Matsumura; K. Ishikawa; Junji Saraie; Yutaka Yodogawa

Abstract ZnS x Se 1− x layers were grown by MBE using Zn, Se and ZnS as source materials. The sulfur mole franction x was varied between 0 and 0.3. The quality of epilayers was found to be improved around the lattice-matching composition to the GaAs substrate ( x =0.055−0.069) judging from the lattice relaxation, FWHM values of X-ray rocking curve and the photoluminescence spectra.


Journal of Crystal Growth | 2003

Growth conditions in molecular beam epitaxy for controlling CdSeTe epilayer composition

Nobuo Matsumura; Takuya Sakamoto; Junji Saraie

Summary form only given. CdSe/sub x/Te/sub 1-x//ZnSe quantum-dots structures have a large conduction and valence band offset at an appropriate composition and are expected to be highly-efficient light-emitting material in the green region. However, to our knowledge, there have been very few reports on CdSeTe epilayers. Composition control of II-VI/sub x/VI/sub 1-x/ mixed crystals is difficult because the vapor pressures of VIth elements are high. In this report, the growth conditions were studied for controlling CdSeTe-epilayer composition.


Journal of Crystal Growth | 1991

Photo-assisted MBE growth of ZnSe on GaAs substrates

Nobuo Matsumura; Takashi Fukada; Ken-ichi Senga; Yasumori Fukushima; Junji Saraie

ZnSe epilayers have been grown by photo-assisted MBE on GaAs substrates at various substrates temperatures and under various molecular beam intensity ratios of group VI to group III element. A He-Cd laser with 441.6 mm wavelength was used as a light source. From the temperature dependence of the photo-desorption rate constants, the activation energies of photo-desorption of Zn and Se adatoms from the physical adsorption state (EPZn, EPSs) and from the chemical adsorption state (EC) are obtained, that is, EPZn=7.8 kcal/mol, EPSe=6.7 kcal/mol and EC=16.1 kcal/mol. Thus, the photo-desorption observed is photo-enhanced “thermal” desorption. ZnSe epilayers have been successfully grown at a temperature as low as 150°C. A sharp and strong free-excition emission is observed in photoluminescence spectra at 11 K in the low-temperature grown samples, which shows that the crystallinity is almost comparable with that of the unirradiated epilayer grown at 340°C (the optimum growth temperature without irradiation).


Journal of Crystal Growth | 1989

Lattice strain and its effects on energy band structure in MBE-ZnSxSe1−x/GaAs

Nobuo Matsumura; Mitsutaka Tsubokura; Junji Saraie

Abstract ZnS x Se 1− x layers with various compositions ( x = 0−0.13) and layer thicknesses (0.1–3.5 μm) were grown on (100)GaAs by MBE. Lattice strain and its effects on energy band structure of the epilayers are studied. The lattice constants normal to the substrate revealed that the thin layers (0.1-0.3 μm) grew coherently. Splitting and shifting of exciton emissions due to two-dimensional strain were observed, and hydrostatic and shear deformation potentials were determined. The thick lattice-mismatched layers consist of thin coherently grown layers and remaining relaxed layers. The strain in the relaxed layers are affected both by the mismatches of lattice constants and by the difference in thermal expansion coefficients. The residual strain of the epilayers can be determined by the exciton emission energies using the deformation potentials.


Japanese Journal of Applied Physics | 2000

Self-Assembling CdSe, ZnCdSe and CdTe Quantum Dots on ZnSe(100) Epilayers

Nobuo Matsumura; Eiji Tai; Yoshihisa Kimura; Takashi Saito; Masao Ohira; Junji Saraie

CdSe quantum dots were fabricated on ZnSe(100) epilayers by the molecular beam epitaxy (MBE) and the solid phase reaction method. ZnCdSe quantum dots were prepared by MBE and the atomic layer epitaxial method. CdTe quantum dots were fabricated by alternate supply of Cd and Te beams. Nanoscale surface structures of these self-assembling dots were observed using an atomic force microscope. Broad emissions were observed in the photoluminescence of these capped samples.


Japanese Journal of Applied Physics | 1990

Molecular Beam Epitaxial Growth of ZnSSe with Hg-Xe Lamp Irradiation

Nobuo Matsumura; Mitsutaka Tsubokura; Kazuhiro Miyagawa; Nobuhiro Nakamura; Yoichi Miyanagi; Takashi Fukada; Junji Saraie

ZnSSe epilayers were grown by MBE with light irradiation using a Hg-Xe lamp. The free-exciton-emission intensities increased in the photoluminescence spectra of the light-irradiated epilayers, and the sulfur composition also increased. However, the surface morphologies were rough. The irradiated-photon-energy dependence of the above irradiation effects was investigated for the first time, and it turned out that the photons of energy larger than the band-gap energy of the epilayer were responsible for the light-irradiation effects.

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Junji Saraie

Kyoto Institute of Technology

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Mitsutaka Tsubokura

Kyoto Institute of Technology

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Ken-ichi Senga

Kyoto Institute of Technology

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Takashi Fukada

Kyoto Institute of Technology

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Susumu Ichikawa

Kyoto Institute of Technology

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Takuya Sakamoto

Kyoto Institute of Technology

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Yasumori Fukushima

Kyoto Institute of Technology

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Yutaka Yodogawa

Kyoto Institute of Technology

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H. Endo

Kyoto Institute of Technology

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H. Shimakawa

Kyoto Institute of Technology

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