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Dive into the research topics where Nobuyuki Otake is active.

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Featured researches published by Nobuyuki Otake.


Applied Physics Express | 2009

High-Power Vertical-Cavity Surface-Emitting Laser under a Short Pulsed Operation

Nobuyuki Otake; Katsunori Abe; Hitoshi Yamada; Hiroyuki Wado; Yukihiro Takeuchi

We report on the lasing characteristics of a single vertical-cavity surface-emitting laser (VCSEL) with InGaAs/GaAs multiple-quantum-wells under high-power pulsed operations. External quantum efficiency was improved by decreasing carrier overflow in the active region, and it was found that increasing the number of quantum wells suppressed carrier overflow. The highest peak pulsed power of over 12.5 W at an injection current of 20 A was achieved by a single VCSEL with five InGaAs quantum wells (QWs) in the active region.


IEICE Electronics Express | 2011

High-Pulsed-Power (49W) Vertical-Cavity Surface-Emitting Laser with Five Quantum Wells by Uniform Current Injection into Large Emitting Area

Nobuyuki Otake; Eiji Kojima; Hitoshi Yamada; Yukihiro Takeuchi

We report on the high-power lasing characteristics of a large area bottom-emitting vertical-cavity surface-emitting laser (VCSEL). There have been difficulties in uniform current injection for large area VCSELs, which are caused by the band discontinuity at the interface between AlAs and GaAs of the n-type Distributed Bragg Reflector (DBR). We have reported the n-type DBR using a graded composition interface of 20nm thick suppresses the crowding of current to the edge of emitting area and improves external efficiency [1]. The highest peak pulsed power of over 49W was achieved by a five-quantum-well VCSEL with a current aperture diameter of 200µm.


international symposium on power semiconductor devices and ic's | 2017

Highly reliable GaN MOS-HFET with high short-circuit capability

Youngshin Eum; Kazuhiro Oyama; Nobuyuki Otake; Shinichi Hoshi

A new MOS-HFET structure of a GaN power device for highly reliable GaN MOS gates has been designed. A normally-on JFET structure is fabricated between the gate and drain of the GaN MOS-HFET. By using this technology, the reliability of the gate insulator is greatly improved under the high drain voltage of the blocking-state. The new GaN MOS-HFET also reduces saturation current in the short-circuit condition by about 30%. It is expected that this new device improves the tolerance characteristics in the short-circuit condition without the on-resistance penalty associated with conventional structures.


international nano-optoelectronics workshop | 2008

High-power vertical-cavity surface-emitting laser under pulsed operation

Nobuyuki Otake; Hitoshi Yamada; Hiroyuki Wado; Katsunori Abe; Yukihiro Takeuchi

We have investigated InGaAs multiple-quantum-wells vertical-cavity surface-emitting laser (VCSEL) under high-power pulsed operation. The peak pulsed power of over 12.5 W has been achieved with the single VCSEL device which has five InGaAs quantum wells.


Archive | 2005

MULTIPLE WAVELENGTH LASER EQUIPMENT

Katsunori Abe; Nobuyuki Otake; 伸幸 大竹; 克則 安部


Japanese Journal of Applied Physics | 2016

Strain-induced step bunching in orientation-controlled GaN on Si

Tetsuo Narita; Hiroko Iguchi; Kayo Horibuchi; Nobuyuki Otake; Shinichi Hoshi; Kazuyoshi Tomita


Archive | 2015

REFLECTION TYPE OPTICAL ENCODER HAVING RESIN CODE PLATE

顕庸 坂田; Akinobu Sakata; 伸幸 大竹; Nobuyuki Otake


Archive | 2012

LAYERED SUBSTRATE WITH A MISCUT ANGLE COMPRISING A SILICON SINGLE CRYSTAL SUBSTRATE AND A GROUP-III NITRIDE SINGLE CRYSTAL LAYER

Tetsuo Narita; Kenji Ito; Kazuyoshi Tomita; Nobuyuki Otake; Shinichi Hoshi; Masaki Matsui


Archive | 2010

SURFACE EMISSION SEMICONDUCTOR LASER ELEMENT

Eiji Kojima; Nobuyuki Otake; 伸幸 大竹; 永児 小島


Archive | 2007

Measuring device, vehicle control device, and alarm device

Katsunori Abe; Nobuyuki Otake; 伸幸 大竹; 克則 安部

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