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Dive into the research topics where Nyrissa S. Rogado is active.

Publication


Featured researches published by Nyrissa S. Rogado.


Advanced Materials | 2005

Magnetocapacitance and Magnetoresistance Near Room Temperature in a Ferromagnetic Semiconductor: La2NiMnO6

Nyrissa S. Rogado; Jun Li; Arthur W. Sleight; M.A. Subramanian


Advanced Materials | 2006

Giant room-temperature magnetodielectric response in the electronic ferroelectric LuFe2O4

M.A. Subramanian; Tao He; Jiazhong Chen; Nyrissa S. Rogado; Thomas G. Calvarese; Arthur W. Sleight


Archive | 2005

Compositions comprising polyimide and hydrophobic epoxy, and methods relating thereto

Thomas Eugene Dueber; John D. Summers; Brian C. Auman; Munirpallam A. Subramanian; Nyrissa S. Rogado


Archive | 2007

Compositions comprising polyimide and hydrophobic epoxy and phenolic resins, and methods relating thereto

Thomas Eugene Dueber; Nyrissa S. Rogado


Archive | 2005

Composition of polyimide and sterically-hindered hydrophobic epoxy

Thomas Eugene Dueber; John D. Summers; Brian C. Auman; Munirpallam A. Subramanian; Nyrissa S. Rogado


Proceedings of SPIE | 2008

High-Index Immersion Fluids Enabling Cost-Effective Single- Exposure Lithography For 32 nm Half Pitches

Roger H. French; Hoang V. Tran; Doug J. Adelman; Nyrissa S. Rogado; Mureo Kaku; Michael T. Mocella; Charles Y. Chen; Eric Hendrickx; Freida Van Roey; Adam S. Bernfeld; Rebekah Ann Derryberry


Journal of Photopolymer Science and Technology | 2008

High Refractive Index Fluid Evaluations at 193nm: Fluid Lifetime and {Fluid/Resist} Interaction Studies

Hoang V. Tran; Eric Hendrickx; Roger H. French; Douglas J. Adelman; Nyrissa S. Rogado; Mureo Kaku; Michael T. Mocella; John J. Schmieg; Charles Y. Chen; Frieda Van Roey; Adams S. Bernfeld; Rebekah Ann Derryberry


Archive | 2006

Low temperature coefficient of resistivity polymeric resistors based on metal carbides and nitrides

Nyrissa S. Rogado; Munirpallam A. Subramanian


Proceedings of SPIE | 2008

High-index immersion fluids enabling cost-effective single-exposure lithography for 32 nm half pitches

Roger H. French; Hoang V. Tran; Douglas J. Adelman; Nyrissa S. Rogado; Mureo Kaku; Michael T. Mocella; Charles Y. Chen; Eric Hendrickx; F Van Roey; As Bernfeld; Rebekah Ann Derryberry


Archive | 2006

Compositions comprenant un polyimide et un epoxyde hydrophobe et procedes correspondants

Thomas Eugene Dueber; John D. Summers; Brian C. Auman; Munirpallam A. Subramanian; Nyrissa S. Rogado

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