O.A Makarov

Micron spatial resolution X-ray image plates with non-erasing reading

Abstract New silverless radiophotoluminescence substances NaCl(Me) and LiF(Me) are proposed and tested as X-ray image detectors. Their spatial resolution is not worse than 2 μm and they allow one to register X-ray pictures with a dynamic range of about 5000. A stored X-ray image can be read out many times by photoluminescence measurements under UV excitation. The image can be erased completely by heating the substances up to a temperature of 400°C during 0.5 h.

Fabrication and preliminary testing of regular microporous membranes manufactured by deep X-ray lithography at the VEPP-3 storage ring

Abstract Regular microporous membranes with pores of 0.3–0.5 μm in diameter arranged in a rectangular grid with 1 μm spacing have been made on the basis of 2.5, 3, 6 and 10 μm thick mylar films by deep X-ray lithography at the VEPP-3 storage ring. The membranes have a geometrical transparency of 10–20% and this value can be increased up to 50% and higher by using an X-ray mask with an appropriate pattern. The results of preliminary membrane testing by scanning electron microscopy and by gas conductance measurements are presented. In contrast to the traditional track membranes with random pore locations, the regular membranes have no dispersion of pore sizes caused by confluence of adjoining pores. Some possible applications of the membranes are discussed.

The optical properties of regular microporous membranes

Abstract Transmission coefficients in the spectral range of 115–350 nm were measured for regular microporous polyethylene terephthalate (Lavsan) membranes with a 1 μm structure spacing. The obtained results are analyzed with account of diffraction phenomena and optical properties of the membrane polymer. The optical properties of regular and normal track membranes with commensurable pore sizes are compared. The investigated samples can be used as diffraction filters for UV, EUV and VUV radiation.

Measurements of the absolute spectral sensitivity of X-ray semiconductor detectors in the photon energy range of 1.5–15 keV using “white” SR beam of the VEPP-3 storage ring

Abstract Results of measurements of the absolute spectral sensitivity of silicon semiconductor detectors in the X-ray quanta energy range of 1.5–15 keV are presented. The detectors, being calibrated, were placed into the direct “white” synchrotron radiation (SR) beam from the VEPP-3 storage ring. The spectrum of X-radiation at the entrance window of the detectors was changed by using sets of calibrated filters, as well as by varying the energy of the electrons in the storage ring. The possibility of accurate calculation of the SR spectrum on the calibrated detector under its irradiation in different conditions allowed us to determine the detector spectral sensitivity from a set of integral equations connecting the spectral sensitivity to the registered detector currents. The analysis of possible experimental errors indicates that the absolute spectral sensitivity of the detectors was restored with an accuracy of not worse than 10% in the total photon energy range under the study.

Preliminary experience of optical elements fabrication by X-ray lithography

Abstract X-ray lithography using synchrotron radiation from the VEPP-3 storage ring was applied for the fabrication of test specimens of some optical elements such as Fresnel lenses and arrays of optical elements for visible light. A promising advantage of the application of X-ray lithography is the possibility of micron scale patterning on curved surfaces. The patterns of Fresnel-like structures were generated by an annular laser photoplotter for the fabrication of an X-ray mask on a 2-μm-thick silicon membrane with a 1.5-μm-thick gold absorber. The X-ray lithography station at the VEPP-3 storage ring was used for deep X-ray lithography.

Regular micropore filters for X-ray fluorescent analysis of atmospheric aerosols and suspensions in liquids

Abstract The first experience of the application of film micropore filters with regularly spaced holes of 0.4 μm in diameter for X-ray fluorescent elemental analysis of atmospheric aerosols and water suspensions is described.

Diffraction optical elements with deep phase profile obtained with the use of x-ray parallel intensive beam

X-ray lithography with synchrotron radiation was applied for formation of the Fresnel zone structure profile onto a curved surface of a refractive polymer lens to achieve multifocus properties of the lens. First prototypes of the hybrid refractive-diffractive lens were fabricated in such a way and their optical properties were investigated. Some possibilities for creation of diffraction apochromatic optical elements are considered as well.

Application of deep x-ray lithography for fabrication of polymer regular membranes with submicrometer pores

The X-ray lithography with synchrotron radiation at the VEPP-3 storage ring was applied for fabrication of polymer microstructures with submicron sizes of elements and with rather high aspect ratio (up to 20). The microstructures are the regular microporous membranes with pores of 0.3-0.5 micrometers in diameter arranged with a 1 micrometers spacing. The membranes were fabricated on a base of 2.5, 3, 6 and 10 micrometers thick mylar films. In contrast to the commercial track membranes with random pore locations, the regular membranes have no dispersion of pore sizes caused by confluence of adjoining pores. The fabricated membranes have a porosity of 10-20 percent and this value can be increased up to 50 percent and higher by using an X-ray mask with an appropriate pattern. The results of the membrane examination by different techniques are presented. Possible improvements of the membrane parameters and some potential applications of the membranes are discussed as well.

The use of SR for the creation of a topology in layers of metal phthalocyanines

Abstract The influence of synchrotron radiation (SR) on vacuum-deposited layers of copper and aluminium phthalocyanines is investigated. For the creation of patterns in these layers X-ray radiation exposure and vacuum thermal development were used. It was established, that the layers of copper phthalocyanine (CuPc) possess the properties of both positive and negative vacuum X-ray resist upon radiation exposures of 5 kJ/cm 3 and 35 kJ/cm 3 , respectively. The layers of aluminium phthalocyanine (AlPcX, where X = Cl, F, OH) possess the properties of only negative vacuum X-ray resists. The possibility of the creation of a submicron topology in layers of metal phthalocyanines has been demonstrated.

The selective properties of regular track membranes

Abstract Selective properties of regular track membranes, made by deep-etch X-ray lithography using synchrotron radiation of the VEPP-3 storage ring, were studied. These membranes with a high porosity have practivally no dispersion of the pore sizes and can find a number of useful applications.