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Dive into the research topics where Ojas Mahapatra is active.

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Featured researches published by Ojas Mahapatra.


Journal of Experimental Nanoscience | 2008

Ultrafine dispersed CuO nanoparticles and their antibacterial activity

Ojas Mahapatra; Megha Bhagat; C. Gopalakrishnan; Kantha D. Arunachalam

Copper oxide nanoparticles with a particle size ranging from 80 to 160 nm were prepared by a wet chemical procedure. Copper carbonate hydroxide and sodium hydroxide were used as raw materials. Copper hydroxide was generated as a precursor which was thermally decomposed to CuO nanoparticles. The nanoparticles were characterised using atomic force microscopy, X-ray diffraction and UV-visible spectrometry. The nanoparticles were tested for antibacterial activity against Klebsiella pneumoniae, Pseudomonas aeruginosa, Salmonella paratyphi and Shigella strains.


Surface Review and Letters | 2009

Influence Of Plasma Pretreatment In The Formation Of Diamond-Like Carbon Thin Films

R. Maheswaran; Shivaraman Ramaswamy; Ojas Mahapatra; B. Purnachandra Rao; C. Gopalakrishnan; D. John Thiruvadigal

Plasma-enhanced chemical vapor deposition has been used to synthesize diamond-like carbon (DLC) thin films. High purity argon and methane gases were used as precursors for the fabrication of the DLC films. The influence of plasma pretreatment on the growth of the DLC films has been studied by subjecting one of the substrates to plasma pretreatment prior to deposition of the DLC films, while maintaining the other substrate as the control. The structural properties of the DLC films have been characterized using atomic force microscopy and Raman spectroscopy. The film grown on the pretreated substrate shows a more uniform coating as compared to the film grown on non-pretreated silicon substrate. The results are discussed based on diffusivity of carbon on silicon and the effect of the plasma pretreatment.


Fullerenes Nanotubes and Carbon Nanostructures | 2009

Low Temperature Growth of Carbon Nanostructures by Radio Frequency‐Plasma Enhanced Chemical Vapor Deposition (Low Temperature Growth of Carbon Nanostructures by RF‐PECVD)

B. Purna Chandra Rao; R. Maheswaran; Shivaraman Ramaswamy; Ojas Mahapatra; C. Gopalakrishanan; D. John Thiruvadigal

This paper reports the growth of carbon nanostructures on Si (100) substrate in the absence of catalyst using radio‐frequency plasma enhanced chemical vapor deposition (RF‐PECVD). A variety of carbon nanostructures have been grown by low pressure high density plasma process at 400°C using a methane/argon mixture. Various shapes and structures including novel carbon nanoparticles have been found. The surface morphology was studied by Atomic Force Microscope (AFM) and Scanning Electron Microscope (SEM) while the chemical composition was studied using Energy Dispersive Spectroscopy (EDS). The AFM images show that the nanostructures are predominantly either particulate (spherical) in nature or have a sheet‐like morphology. SEM images are in good correspondence to the AFM results and indicate formation of either individual islands or two‐dimensional nanosheet‐like structures. The crux of this work is in the synthesis of the carbon nanostructures at comparatively low fabrication temperature (400°C) as compared to other techniques.


Colloid Journal | 2011

Effects of quenching on the morphology and crystal structure of ZnO nanostructures

Ojas Mahapatra; Shivaraman Ramaswamy; N. Satya Vijaya Kumar; B. Brabu; Angeline Littleflower; C. Gopalakrishnan

Zinc oxide nanostructures were prepared by a simple wet chemical procedure using zinc acetate and sodium hydroxide as precursors. The process was subjected to quenching treatment and the effect of the treatment on the formation of the nanostructures was studied using atomic force and scanning electron microscopies. The change in crystal structure of the nanostructures due to quenching was studied using an X-ray diffractometry that established that physical and structural properties of the nanostructures were largely influenced by the quenching treatment.


Surface Review and Letters | 2009

Effect Of Temperature On Self-Assembly Of Diamond-Like Carbon (Dlc) Grown By Plasma Enhanced Chemical Vapor Deposition (Pecvd)

Ojas Mahapatra; R. Maheswaran; N. Satya Vijaya Kumar; K. R. Ganesh; C. Gopalakrishnan; D. John Thiruvadigal; S. V. Kasmir Raja

Diamond-like carbon nanostructures were prepared using Plasma enhanced chemical vapor deposition (PECVD). Temperature dependence of self-assembly of carbon nanostructures is noted. Carbon and silicon exhibit significant lattice mismatch and during the self-assembly, stacking of carbon atoms takes place which results in conic projections. The carbon nanostructures were prepared at 600°C and 100 W RF power and were subjected to a cooling treatment. Argon and Methane were used as reactant gases. The formation of nanostructures did not use any catalyst. The surface morphology and roughness analysis was carried by Atomic Force microscopy. The nanocones were characterized by X Ray Diffractometer and Raman Spectroscopy.


Journal of General and Applied Microbiology | 2011

Corn flake-like morphology of iron nanoparticles and its antibacterial property

Ojas Mahapatra; Shivaraman Ramaswamy; Satya Vijaya Kumar Nune; Tejabhiram Yadavalli; C. Gopalakrishnan


Surface and Interface Analysis | 2010

Surface studies of diamond-like carbon films grown by plasma-enhanced chemical vapor deposition

R. Maheswaran; R. Sivaraman; Ojas Mahapatra; P. C. Rao; C. Gopalakrishnan; D. J. Thiruvadigal


Journal of Nanoelectronics and Optoelectronics | 2008

Size Dependence of CuO Nanoparticles Synthesized by Wet Chemical Method

C. Gopalakrishnan; Ojas Mahapatra


Journal of Advanced Microscopy Research | 2013

Nanoscale analysis of surface topography and adhesion force measurements of flagella isolated from chlamydomonas reinhardtii

Shivaraman Ramaswamy; Dhananjay Suresh; Harsha Bathula; Ojas Mahapatra; Kantha D. Arunachalam; C. Gopalakrishnan


Journal of Scanning Probe Microscopy | 2008

Atomic Force Microscopy Studies of Carbon Nanostructures Grown by Radio Frequency Plasma Enhanced CVD (RF-PECVD)

Ojas Mahapatra; R. Maheswaran; B. Purna Chandra Rao; C. Gopalakrishnan; D. John Thiruvadigal

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