Oliver Supplie

Epitaxial III–V Films and Surfaces for Photoelectrocatalysis

Efficient photoelectrochemical devices for water splitting benefit from the highest material quality and dedicated surface preparation achieved by epitaxial growth. InP(100)-based half-cells show significant solar-to-hydrogen efficiencies, but require a bias due to insufficient voltage. Tandem absorber structures may provide both adequate potential and efficient utilization of the solar spectrum. We propose epitaxial dilute nitride GaPNAs photocathodes on Si(100) substrates to combine close-to-optimum limiting efficiency, lattice-matched growth, and established surface preparation. Prior to a discussion of the challenging III-V/Si(100) heterojunction, we describe the closely related epitaxial preparation of InP(100) surfaces and its beneficial impact on photoelectrochemical water-splitting performance. Analogies and specific differences to GaP(100) surfaces are discussed based on in situ reflectance anisotropy and on two-photon photoemission results. Preliminary experiments regarding GaP/Si(100) photoelectrochemistry and dilute nitride GaPN heteroepitaxy on Si(100) confirm the potential of the GaPNAs/Si tandem absorber structure for future water-splitting devices.

Time-Resolved In Situ Spectroscopy During Formation of the GaP/Si(100) Heterointerface.

Though III-V/Si(100) heterointerfaces are essential for future epitaxial high-performance devices, their atomic structure is an open historical question. Benchmarking of transient optical in situ spectroscopy during chemical vapor deposition to chemical analysis by X-ray photoelectron spectroscopy enables us to distinguish between formation of surfaces and of the heterointerface. A terrace-related optical anisotropy signal evolves during pulsed GaP nucleation on single-domain Si(100) surfaces. This dielectric anisotropy agrees well with the one calculated for buried GaP/Si(100) interfaces from differently thick GaP epilayers. X-ray photoelectron spectroscopy reveals a chemically shifted contribution of the P and Si emission lines, which quantitatively corresponds to one monolayer and establishes simultaneously with the nucleation-related optical in situ signal. We attribute that contribution to the existence of Si-P bonds at the buried heterointerface. During further pulsing and annealing in phosphorus ambient, dielectric anisotropies known from atomically well-ordered GaP(100) surfaces superimpose the nucleation-related optical in situ spectra.

Domain-sensitive in situ observation of layer-by-layer removal at Si(100) in H2 ambient

Double-layer step formation on Si(100) substrates is a crucial prerequisite for antiphase-domain free III?V compound semiconductor heteroepitaxy. Due to its unequaled relevance in microelectronics, the (100) oriented surface of silicon is by far the most studied semiconductor surface. However, Si(100) preparation in hydrogen process gas ambient, which is commonly employed for Si and III?V device preparation, is completely different from preparation in ultra-high vacuum due to strong interaction between H2 and the Si surface, leading to a kinetically driven different step formation. Here, we observe chemical layer-by-layer removal of surface atoms from the terraces at the Si(100) surface during annealing in hydrogen ambient. Mutually perpendicularly oriented dimers on subsequently removed monolayers induce oscillations in the in situ reflection anisotropy spectroscopy (RAS) signal. Scanning tunneling microscopy measurements support a model, where surface atom removal proceeds by formation and anisotropic expansion of vacancy islands on the terraces. We determined an activation energy Ed of 2.75???0.20?eV for Si etching in H2 ambient by transient in situ RAS measurements. In situ control of the highly reactive Si(100) surface preparation is essential for subsequent defect-free III?V heteroepitaxy.

The interface of GaP(100) and H2O studied by photoemission and reflection anisotropy spectroscopy

We study the initial interaction of adsorbed H2O with P-rich and Ga-rich GaP(100) surfaces. Atomically well defined surfaces are prepared by metal-organic vapour phase epitaxy and transferred contamination-free to ultra-high vacuum, where water is adsorbed at room temperature. Finally, the surfaces are annealed in vapour phase ambient. During all steps, the impact on the surface properties is monitored with in situ reflection anisotropy spectroscopy (RAS). Photoelectron spectroscopy and low-energy electron diffraction are applied for further in system studies. After exposure up to saturation of the RA spectra, the Ga-rich (2 × 4) surface reconstruction exhibits a sub-monolayer coverage in form of a mixture of molecularly and dissociatively adsorbed water. For the p(2 × 2)/c(4 × 2) P-rich surface reconstruction, a new c(2 × 2) superstructure forms upon adsorption and the uptake of adsorbate is significantly reduced when compared to the Ga-rich surface. Our findings show that microscopic surface reconstructions of GaP(100) greatly impact the mechanism of initial interface formation with water, which could benefit the design of e.g. photoelectrochemical water splitting devices.

Formation of GaP/Si(100) Heterointerfaces in the Presence of Inherent Reactor Residuals.

Adequate silicon preparation is a prerequisite for defect-free III-V growth on Si. We transfer the silicon processing from clean to GaP containing metalorganic vapor phase epitaxy reactors, where we monitor the entire process in situ with reflection anisotropy spectroscopy and analyze the chemical composition of the surface with X-ray photoelectron spectroscopy. Beyond a certain submonolayer threshold value of (Ga,P) residuals found on the Si(100) surface, GaP grows with an inverted majority sublattice. Analogously to III-V growth on two-domain substrates, the coexistence of Si-Ga and Si-P interfacial bonds at terraces of the same type causes antiphase disorder in GaP epilayers.

Materials for light-induced water splitting: In situ controlled surface preparation of GaPN epilayers grown lattice-matched on Si(100)

Energy storage is a key challenge in solar-driven renewable energy conversion. We promote a photochemical diode based on dilute nitride GaPN grown lattice-matched on Si(100), which could reach both high photovoltaic efficiencies and evolve hydrogen directly without external bias. Homoepitaxial GaP(100) surface preparation was shown to have a significant impact on the semiconductor-water interface formation. Here, we grow a thin, pseudomorphic GaP nucleation buffer on almost single-domain Si(100) prior to GaPN growth and compare the GaP_(0.98)N_(0.02)/Si(100) surface preparation to established P- and Ga-rich surfaces of GaP/Si(100). We apply reflection anisotropy spectroscopy to study the surface preparation of GaP_(0.98)N_(0.02) in situ in vapor phase epitaxy ambient and benchmark the signals to low energy electron diffraction, photoelectron spectroscopy, and x-ray diffraction. While the preparation of the Ga-rich surface is hardly influenced by the presence of the nitrogen precursor 1,1-dimethylhydrazine (UDMH), we find that stabilization with UDMH after growth hinders well-defined formation of the V-rich GaP_(0.98)N_(0.02)/Si(100) surface. Additional features in the reflection anisotropy spectra are suggested to be related to nitrogen incorporation in the GaP bulk.

In situ antiphase domain quantification applied on heteroepitaxial GaP growth on Si(100)

Via a particular postgrowth annealing procedure applied to heteroepitaxial GaP films grown on Si(100) substrates by metal-organic vapor phase epitaxy, ex situ atomic force microscopy (AFM) provides insight into the spatial distribution of antiphase domains (APDs). On a specific sample, the AFM characterization reveals a variation of the APD concentration over the sample’s surface. In situ reflectance anisotropy spectroscopy (RAS) was used as a complementary technique for the quantification of APDs on the P-rich prepared GaP surface. Besides the expected linear reduction of the RAS signal according to the presence of antiphase disorder, the comparison with the reflection anisotropy (RA) spectrum of an identically prepared, (2×2)/c(4×2) reconstructed surface of a homoepitaxial GaP(100) reference revealed further characteristic deviations. In principle, they originated from the additional reflection at the GaP/Si(100) heterointerface. Mainly, its interference with the surface reflection affected the normaliz...

Controlling the polarity of metalorganic vapor phase epitaxy-grown GaP on Si(111) for subsequent III-V nanowire growth

Nanowire growth on heteroepitaxial GaP/Si(111) by metalorganic vapor phase epitaxy requires the [-1-1-1] face, i.e., GaP(111) material with B-type polarity. Low-energy electron diffraction (LEED) allows us to identify the polarity of GaP grown on Si(111), since (2×2) and (1×1) surface reconstructions are associated with GaP(111)A and GaP(111)B, respectively. In dependence on the pre-growth treatment of the Si(111) substrates, we were able to control the polarity of the GaP buffers. GaP films grown on the H-terminated Si(111) surface exhibited A-type polarity, while GaP grown on Si surfaces terminated with arsenic exhibited a (1×1) LEED pattern, indicating B-type polarity. We obtained vertical GaAs nanowire growth on heteroepitaxial GaP with (1×1) surface reconstruction only, in agreement with growth experiments on homoepitaxially grown GaP(111).

In situ controlled heteroepitaxy of single-domain GaP on As-modified Si(100)

Metalorganic vapor phase epitaxy of III-V compounds commonly involves arsenic. We study the formation of atomically well-ordered, As-modified Si(100) surfaces and subsequent growth of GaP/Si(100) quasisubstrates in situ with reflection anisotropy spectroscopy. Surface symmetry and chemical composition are measured by low energy electron diffraction and X-ray photoelectron spectroscopy, respectively. A two-step annealing procedure of initially monohydride-terminated, (1 × 2) reconstructed Si(100) in As leads to a predominantly (1 × 2) reconstructed surface. GaP nucleation succeeds analogously to As-free systems and epilayers free of antiphase disorder may be grown subsequently. The GaP sublattice orientation, however, is inverted with respect to GaP growth on monohydride-terminated Si(100).

In situ control of As dimer orientation on Ge(100) surfaces

We investigated the preparation of single domain Ge(100):As surfaces in a metal-organic vapor phase epitaxy reactor. In situ reflection anisotropy spectra (RAS) of vicinal substrates change when arsenic is supplied either by tertiarybutylarsine or by background As4 during annealing. Low energy electron diffraction shows mutually perpendicular orientations of dimers, scanning tunneling microscopy reveals distinct differences in the step structure, and x-ray photoelectron spectroscopy confirms differences in the As coverage of the Ge(100):As samples. Their RAS signals consist of contributions related to As dimer orientation and to step structure, enabling precise in situ control over preparation of single domain Ge(100):As surfaces.