P. Castrillo

Study of the two‐dimensional–three‐dimensional growth mode transition in metalorganic vapor phase epitaxy of GaInP/InP quantum‐sized structures

Ga0.5In0.5P/InP quantum‐sized structures, grown by metalorganic vapor phase epitaxy, have been optically characterized by photoluminescence, cathodoluminescence, and photoluminescence excitation spectroscopy. Additional structural information has been obtained by atomic force microscopy. We find that the two‐dimensional layer‐by‐layer growth mode is limited to the growth of 1‐ML‐thick and, in part, 2‐ML‐thick quantum wells. The transition towards three‐dimensional Stranski–Krastanow island growth occurs before the second monolayer of InP is completed. To further study the dynamics of the island formation, growth interruptions were introduced between the InP deposition and the subsequent growth of the upper GaInP barrier. The two types of coherent islands show a quantum confinement in vertical direction, corresponding to about 2‐ and 3‐ML‐thick and about 9‐ and 10‐ML‐thick InP strained quantum wells.

Carbon in silicon: Modeling of diffusion and clustering mechanisms

Carbon often appears in Si in concentrations above its solubility. In this article, we propose a comprehensive model that, taking diffusion and clustering into account, is able to reproduce a variety of experimental results. Simulations have been performed by implementing this model in a Monte-Carlo atomistic simulator. The initial path for clustering included in the model is consistent with experimental observations regarding the formation and dissolution of substitutional C–interstitial C pairs (Cs–Ci). In addition, carbon diffusion profiles at 850 and 900 °C in carbon-doping superlattice structures are well reproduced. Finally, under conditions of thermal generation of intrinsic point defects, the weak temperature dependence of the Si interstitial undersaturation and the vacancy supersaturation in carbon-rich regions also agree with experimental measurements.

Excited states of individual quantum dots studied by photoluminescence spectroscopy

The photoluminescence from individual InP quantum dots embedded in a matrix of GaInP has been studied. In addition to the ground state emission that consists of several peaks, we observe excited states of the dot. These states are observed either via state filling or with photoluminescence excitation spectroscopy. We observe a fast relaxation to the set of states with lowest energy but no relaxation between these states.

Band filling at low optical power density in semiconductor dots

We have studied band filling in strained InP dots grown on GaInP. Compared to quantum wells, the dots show band filling at two orders of magnitude lower optical excitation power density. We show that the emission attributed to band filling originates from the dots by using spatially resolved photoluminescence recording emission from single dots with very high spectral resolution. With time‐resolved photoluminescence spectra we follow the dynamic relaxation of the charge carriers in the dots.

Modeling arsenic deactivation through arsenic-vacancy clusters using an atomistic kinetic Monte Carlo approach

A comprehensive atomistic model for arsenic in silicon which includes charge effects and is consistent with first-principles calculations for arsenic-vacancy cluster energies has been developed. Emphasis has been put in reproducing the electrical deactivation and the annealed profiles in preamorphized silicon. The simulations performed with an atomistic kinetic Monte Carlo simulator suggest a predominant role of the mobile interstitial arsenic in deactivation experiments and provide a good understanding of the arsenic behavior in preamorphized silicon during annealing.

Physical modeling and implementation scheme of native defect diffusion and interdiffusion in SiGe heterostructures for atomistic process simulation

In order to simulate the diffusion kinetics during thermal treatments in SiGe heterostructures, a physically-based atomistic model including chemical and strain effects has been developed and implemented into a nonlattice atomistic kinetic monte carlo (KMC) framework. This model is based on the description of transport capacities of native point defects (interstitials and vacancies) with different charge states in SiGe alloys in the whole composition range. Lattice atom diffusivities have been formulated in terms of point defect transport, taking into account the different probability to move Si and Ge atoms. Strain effects have been assessed for biaxial geometries including strain-induced anisotropic diffusion, as well as charge effects due to strain-induced modifications of the electronic properties. Si-Ge interdiffusion in heterostructures has been analyzed from an atomistic perspective. A limited set of physical parameters have been defined, being consistent with previously reported ab initio calculations and experiments. The model has been implemented into a nonlattice KMC simulator and the relevant implementation details and algorithms are described. In particular, an efficient point defect mediated Si-Ge exchange algorithm for interdiffusion is reported. A representative set of simulated interdiffusion profiles are shown, exhibiting good agreement with experiments.In order to simulate the diffusion kinetics during thermal treatments in SiGe heterostructures, a physically-based atomistic model including chemical and strain effects has been developed and implemented into a nonlattice atomistic kinetic monte carlo (KMC) framework. This model is based on the description of transport capacities of native point defects (interstitials and vacancies) with different charge states in SiGe alloys in the whole composition range. Lattice atom diffusivities have been formulated in terms of point defect transport, taking into account the different probability to move Si and Ge atoms. Strain effects have been assessed for biaxial geometries including strain-induced anisotropic diffusion, as well as charge effects due to strain-induced modifications of the electronic properties. Si-Ge interdiffusion in heterostructures has been analyzed from an atomistic perspective. A limited set of physical parameters have been defined, being consistent with previously reported ab initio calculat...

Ion-beam amorphization of semiconductors: A physical model based on the amorphous pocket population

We introduce a model for damage accumulation up to amorphization, based on the ion-implant damage structures commonly known as amorphous pockets. The model is able to reproduce the silicon amorphous-crystalline transition temperature for C, Si, and Ge ion implants. Its use as an analysis tool reveals an unexpected bimodal distribution of the defect population around a characteristic size, which is larger for heavier ions. The defect population is split in both size and composition, with small, pure interstitial and vacancy clusters below the characteristic size, and amorphous pockets with a balanced mixture of interstitials and vacancies beyond that size.

Nano-Optical Studies of Individual Nanostructures

Optical techniques play a significant role in studies of nano-structures. The electronic structures of quantum dots, for example, vary with the geometric sizes in an ensemble, resulting in broadened spectral lines. Recently, different forms of local spectroscopic techniques have been applied to investigate such inhomogeneously broadened emission lines. In this paper we report on three methods for local spectroscopy : cathodo-luminescence, luminescence induced by a scanning tunnel microscope and microphotoluminescence. Each of these techniques is shown to have the capacity to investigate single quantum dots, with linewidths in the range 40-1000 μev. Besides demonstrating the possibility of imaging and spectroscopically studing individual dots, we also demonstrate the possibility of investigating single impurity atoms, in imaging as well as in emission spectroscopy modes.

Comprehensive model of damage accumulation in silicon

Ion implantation induced damage accumulation is crucial to the simulation of silicon processing. We present a physically based damage accumulation model, implemented in a nonlattice atomistic kinetic Monte Carlo simulator, that can simulate a diverse range of interesting experimental observations. The model is able to reproduce the ion-mass dependent silicon amorphous-crystalline transition temperature of a range of ions from C to Xe, the amorphous layer thickness for a range of amorphizing implants, the superlinear increase in damage accumulation with dose, and the two-layered damage distribution observed along the path of a high-energy ion. In addition, this model is able to distinguish between dynamic annealing and post-cryogenic implantation annealing, whereby dynamic annealing is more effective in removing damage than post-cryogenic implantation annealing at the same temperature.

Spectroscopy, Imaging and Switching Behaviour of Individual InP/GaInP Quantum Dots

We have measured the photoluminescence of individual quantum dots grown by the Stranski-Krastanow growth mode. Studies of many individual quantum dots reveal that about one quantum dot in a thousand switches between two emission intensity levels on a time-scale of seconds. The switching is temperature and excitation power activated. For each set of experimental conditions, the statistics is consistent with random telegraph noise. By strong illumination it is possible to turn the switching off, after which the quantum dot emits continuously.