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Dive into the research topics where P. Vincze is active.

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Featured researches published by P. Vincze.


Optics Express | 2011

Surface plasmon polariton absorption modulator.

Argishti Melikyan; Nicole Lindenmann; Stefan Walheim; Philipp M. Leufke; S. Ulrich; J. Ye; P. Vincze; Horst Hahn; Th. Schimmel; Christian Koos; Wolfgang Freude; Juerg Leuthold

A new compact electrically controlled surface plasmon polariton (SPP) absorption modulator operating at communication wavelengths is introduced. The modulator is controlled by changing the free carrier density and thereby the propagation loss of the SPP.


PLOS ONE | 2014

Six Hydrophobins Are Involved in Hydrophobin Rodlet Formation in Aspergillus nidulans and Contribute to Hydrophobicity of the Spore Surface

André Grünbacher; Tanja Throm; Constanze Seidel; Beatrice Gutt; Julian Röhrig; Timo Strunk; P. Vincze; Stefan Walheim; Thomas Schimmel; Wolfgang Wenzel; Reinhard Fischer

Hydrophobins are amphiphilic proteins able to self-assemble at water-air interphases and are only found in filamentous fungi. In Aspergillus nidulans two hydrophobins, RodA and DewA, have been characterized, which both localize on the conidiospore surface and contribute to its hydrophobicity. RodA is the constituent protein of very regularly arranged rodlets, 10 nm in diameter. Here we analyzed four more hydrophobins, DewB-E, in A. nidulans and found that all six hydrophobins contribute to the hydrophobic surface of the conidiospores but only deletion of rodA caused loss of the rodlet structure. Analysis of the rodlets in the dewB-E deletion strains with atomic force microscopy revealed that the rodlets appeared less robust. Expression of DewA and DewB driven from the rodA promoter and secreted with the RodA secretion signal in a strain lacking RodA, restored partly the hydrophobicity. DewA and B were able to form rodlets to some extent but never reached the rodlet structure of RodA. The rodlet-lacking rodA-deletion strain opens the possibility to systematically study rodlet formation of other natural or synthetic hydrophobins.


Integrated Photonics Research, Silicon and Nanophotonics (IPRSN) 2014 | 2014

High-speed Plasmonic Modulators

Argishti Melikyan; Luca Alloatti; Alban Muslija; David Hillerkuss; Philipp Schindler; J. Li; Robert Palmer; Dietmar Korn; Nicole Lindenmann; S. Muehlbrandt; Stefan Walheim; P. Vincze; Philipp M. Leufke; S. Ulrich; J. Ye; Dries Van Thourhout; Baoquan Chen; Raluca Dinu; Martin Sommer; Horst Hahn; Th. Schimmel; Christian Koos; Manfred Kohl; Wolfgang Freude; Juerg Leuthold

Plasmonic modulators integrated with silicon photonic circuits are discussed. First, a 29 μm long phase modulator operating at 40Gbit/s is demonstrated. Then, an absorption modulator is presented exploiting the plasma effect in metal oxide layers.


international conference on transparent optical networks | 2017

PIPED: A silicon-plasmonic high-speed photodetector

Wolfgang Freude; S. Muehlbrandt; T. Harter; Argishti Melikyan; K. Köhnle; Alban Muslija; P. Vincze; Stefan Wolf; Peter Jakobs; Yuriy Fedoryshyn; Juerg Leuthold; Manfred Kohl; Thomas Zwick; Sebastian Randel; C. Koos

Silicon-plasmonic photodetection based on internal photoemission exploits the intrinsic absorption in plasmonic waveguides at metal-dielectric interfaces. For this purpose we designed an asymmetric metal-semiconductor-metal waveguide with a width of 75 nm. Our plasmonic internal photoemission detector (PIPED) shows a rec-ord-high photocurrent sensitivity of up to S = 0.12 A / W for light at a wavelength of 1550 nm. The opto-electronic bandwidth is extremely large and allows data reception at rates of at least 40 Gbit/s. As another appli-cation, photomixing of two different optical carriers incident on the PIPED generates photocurrents with THz-frequencies, which can be used for short-range wireless communication. Finally, because in contrast to ordinary pin-photodetectors the sensitivity S(U) depends on the voltage U across the device, a PIPED can be employed for all-optical heterodyne reception and down-conversion of data on a THz carrier.


PHYSICS OF SEMICONDUCTORS: 30th International Conference on the Physics of Semiconductors | 2011

Growth of M- and A-plane GaN on LiGaO{sub 2} by plasma-assisted MBE

R. Schuber; Mitch M.C. Chou; P. Vincze; Th. Schimmel; D. M. Schaadt

We have performed non‐polar M‐ and A‐plane GaN growth on LiGaO2 (LGO) by plasma‐assisted molecular beam expitaxy (MBE). We demonstrate that non‐polar GaN growth on LGO yields high phase purity and flat surfaces. We find that annealing of the substrates prior to growth is a suitable method for avoiding a peeling off of the film from the substrate after growth.


Optica | 2016

Silicon-plasmonic internal-photoemission detector for 40 Gbit/s data reception

S. Muehlbrandt; Argishti Melikyan; T. Harter; K. Köhnle; Alban Muslija; P. Vincze; Stefan Wolf; Peter Jakobs; Yuriy Fedoryshyn; Wolfgang Freude; Juerg Leuthold; Christian Koos; M. Kohl


Journal of Crystal Growth | 2010

Growth of A-plane GaN on (0 1 0) LiGaO2 by plasma-assisted MBE

R. Schuber; Mitch M.C. Chou; P. Vincze; Th. Schimmel; D. M. Schaadt


Journal of Crystal Growth | 2010

Growth of A-plane GaN on (010) LiGaO2 by plasma-assisted molecular beam epitaxy

R. Schuber; M. M. C. Chou; P. Vincze; Thomas Schimmel; D. M. Schaadt


Journal of Crystal Growth | 2011

Growth of non-polar GaN on LiGaO2 by plasma-assisted MBE

R. Schuber; Y.L. Chen; Cheng-Hung Shih; Teng-Hsing Huang; P. Vincze; I. Lo; Liuwen Chang; Th. Schimmel; Mitch M.C. Chou; D. M. Schaadt


conference on lasers and electro optics | 2015

Plasmonic internal photoemission detectors with responsivities above 0.12 A/W

S. Muehlbrandt; Argishti Melikyan; K. Köhnle; T. Harter; Alban Muslija; P. Vincze; Stefan Wolf; Peter Jakobs; Yuriy Fedoryshyn; Wolfgang Freude; Juerg Leuthold; Christian Koos; Manfred Kohl

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Wolfgang Freude

Karlsruhe Institute of Technology

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Christian Koos

Karlsruhe Institute of Technology

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Stefan Walheim

Karlsruhe Institute of Technology

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Th. Schimmel

Karlsruhe Institute of Technology

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Alban Muslija

Karlsruhe Institute of Technology

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D. M. Schaadt

Clausthal University of Technology

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Horst Hahn

Karlsruhe Institute of Technology

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J. Ye

Karlsruhe Institute of Technology

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