Paul G. Dewa

Nanoporous structure of a GdF 3 thin film evaluated by variable angle spectroscopic ellipsometry

As excimer lasers extend to deep-ultraviolet and vacuum-ultraviolet wavelengths at 193 and 157 nm, optical coatings experience the challenge of eliminating possible environmental contamination, reducing scattering loss, and increasing laser irradiation durability. Wide bandgap metal fluorides become the materials of choice for the laser optics applications. To understand the optical properties of nanostructure fluoride films, thin GdF(3) films grown on CaF(2) (111) substrates were evaluated by variable angle spectroscopic ellipsometry. An effective medium approximation model was used to determine both the film porosity and the surface roughness. Structural evolution of the GdF(3) film was revealed with improved ellipsometric modeling, suggesting the existence of multilayer structure, a densified bottom layer, middle layers with increasing porosity, and a rough surface. The nanostructure of the film and the surface roughness were confirmed by atomic force microscopy. The attraction of the nanostructure to environmental contamination was experimentally demonstrated.

Innovative Manufacturing and Test Technologies for Imaging Hyperspectral Spectrometers

Corning has developed a number of manufacturing and test techniques to meet the challenging requirements of imaging hyperspectral optical systems. These processes have been developed for applications in the short-wave visible through long-wave IR wavelengths. Optical designs for these imaging systems are typically Offner or Dyson configurations, where the critical optical components are powered gratings and slits. Precision alignment, system athermalization, and harsh environmental requirements, for these systems drive system level performance and production viability. This paper will present the results of these techniques including all aluminum gratings and slits, innovative grating profiles, snap together self-aligning mechanical designs, and visible test techniques for IR systems.

Depth of focus and resolution enhancement of i-line and deep-UV lithography using annular illumination

Annular illumination has been studied as a method for improving depth of focus (DOF) in microlithographic systems. A 2X increase in DOF for 0.25 micrometers dense line/space features has been demonstrated using a deep-UV exposure tool with annular illumination. The same increase in DOF for 0.35 micrometers dense line/space patterns has been demonstrated using an i- line exposure tool employing annular illumination. No improvement in isolated features has been found. Annular illumination exhibits no degradation in isolated feature DOF, but the critical dimension (CD) split between dense and isolated features is affected when using annular illumination. Prototype i-line and deep-UV annular illumination systems have been built and tested which minimize the reduction in intensity and loss of uniformity control when using annular illumination. We have employed the use of conical optics as a high efficiency method of producing ring-shaped illumination in an i-line illumination system. The deep-UV prototype system uses a pre-uniformizer device to convert the collimated excimer laser light into a flat-top pupil fill which is then centrally obscured to produce annular illumination.

Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH

Significant improvement in 157nm optical components lifetime is required for successful implementation of pilot and production scale 157nm lithography. To date, most of the 157nm optics lifetime data has been collected in controlled laboratory conditions by introducing predetermined concentrations of contaminants and monitoring degradation in terms of transmission loss. This publication compliments prior work by documenting field experience with the 157nm Exitech Microstepper currently in operation at International SEMATECH. Failure mechanisms of various optical components are presented and molecular contamination levels in purge gas, tool enclosure, and clean room are documented. Finally the impacts of contaminant deposition and degradation of components on imaging performance is discussed.

Advances in diamond-turned surfaces enable unique cost-effective optical system solutions

Corning has developed a number of manufacturing and test techniques to meet the challenging requirements of imaging hyperspectral optical systems. These processes have been developed for applications in the short-wave visible through long-wave IR wavelengths. Optical designs for these imaging systems are typically Offner or Dyson configurations, where the critical optical components are powered gratings and slits. Precision alignment, system athermalization, and harsh environmental requirements, for these systems drive system level performance and production viability. This paper will present the results of these techniques including all aluminum gratings and slits, innovative grating profiles, snap together self-aligning mechanical designs, and visible test techniques for IR systems.

Optical metrology for 193-nm immersion objective characterization

The production of integrated circuits with ever-smaller feature sizes has historically driven the shift to shorter wavelength radiation sources and increases in numerical aperture (the product of the sine of the imaging cone angle and the refractive index of the media at the image plane). When a next-generation design rule demanded a numerical aperture larger than was technically feasible, a move to a shorter wavelength was the only available solution. Immersion imaging is a detour along the path of shorter wavelengths. Here, the resolution improvement is achieved by exceeding the numerical aperture barrier of 1.0 (for optical systems that form an image in air) by placing a liquid between the final element and the image plane. This liquid layer presents numerous challenges to the optical metrologist. Results of testing a 193nm small-field immersion objective will be reported. The immersion fluid for this objective is de-ionized water. The characterization of the optical and physical properties of the water layer and the effect of those properties on the metrology of the objective will be discussed.

Aberration determination in early 157-nm exposure system

Aberrations, aberrations, here there everywhere but how do we collect useful data that can be incorporated into our simulators? Over the past year there have no less than 18 papers published in the literature discussing how to measure aberrations to answering the question if Zernikes are really enough. The ability to accurately measure a Zernike coefficient in a timely cost effective manner can be priceless to device manufacturers. Exposure tool and lens manufacturers are reluctant to provide this information for a host of reasons, however, device manufacturers can use this data to better utilize each tool depending on the level and the type of semiconductors they produce. Dirksen et al. first discussed the ring test as an effective method of determining lens aberrations in a step and repeat system, later in a scanning system. The method is based on two elements; the linear response to the ring test to aberrations and the use of multiple imaging conditions. The authors have been working to further enhance the capability on the test on the first small field 157 nm exposure system at International SEMATECH. This data was generated and analyzed through previously discussed methods for Z5 through Z25 and correlated back to PMI data. Since no 157nm interferemetric systems exist the lens system PMI data was collected at 248nm. Correlation studies have isolated the possible existence of birefringence in the lens systems via the 3-foil aberration which was not seen at 248nm. Imaging experiments have been conducted for various geometrys and structures for critical dimensions ranging from 0.13micrometers down to 0.10micrometers with binary and 0.07micrometers with alternating phase shift mask. The authors will review the results of these experiments and the correlation to imaging data and PMI data.

Applications of a grating shearing interferometer at 157 nm

Progress along the path towards smaller semiconductor feature sizes continually presents new challenges. 157nm technology is a promising new step along this path. The major challenges encountered to date include environmental purging for high transmission and beam alignment in a purged environment at this short wavelength. We present a simple shearing interferometer consisting of two Ronchi phase gratings in series, used on axis. The common path set-up and zero optical path difference between the interfering diffraction orders makes this device both robust and easy to align. Ease of alignment is an added benefit when working remotely in a purged environment with low light levels. If one grating is shifted relative to the other, a phase shift is introduced and phase measurement techniques can be employed for high accuracy characterization of the incident wavefront. Set-ups, measurements and characterization of wavefronts and spatial-coherence at 157nm made with this device are presented.

Advancements in adhesive mounting of optics

Adhesive mounting of lenses can allow flexible position control of each optical element, low stress, low part count, and precise alignment of lens assemblies in addition to high durability with respect to thermal expansion, shock, and vibration. Historic implementations of this method carried risk of UV degradation, photo contamination, long term stability, and long assembly cycle times. Others have developed non-adhesive friction/contact approaches to mount lenses but with significant compromises in durability and product cost. These two methods are compared and an optimal approach to achieve high lens mounting durability, low cycle time and negligible photo-contamination is demonstrated. Durability of this adhesive mounting solution will be established with examples including shock and vibration, mechanical stress decoupling factors, and optical stability over a wide range of shipping temperatures.

Nanostructure of GdF3 thin film evaluated by variable angle spectroscopic ellipsometry

As excimer lasers extend to deep-ultraviolet and vacuum-ultraviolet wavelengths at 193nm and 157nm, optical coatings experience the challenge of eliminating possible environmental contamination, reducing scattering loss, and increasing laser irradiation durability. Wide band-gap metal fluorides become the materials of choice for the laser optics applications. In order to understand the optical properties of nanostructured fluoride films, thin GdF3 films grown on CaF2 (111) substrates were evaluated by variable angle spectroscopic ellipsometry. An effective medium approximation model was used to determine both the film porosity and the surface roughness. Structural evolution of the GdF3 film was revealed with improved ellipsometric modeling, suggesting the existence of 3-layer structure, a densified bottom layer, a porous middle layer and a rough top surface. The nanostructure of the film and the surface roughness were confirmed by atomic force microscopy. The attraction of the nano-structure to environmental contamination was experimentally demonstrated.