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Peter A. Burke

Wilmington University

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Publication

Featured researches published by Peter A. Burke.

Archive | 2003

Composition and method for polishing in metal cmp

Vikas Sachan; Elizabeth A. Langlois; Qianqiu Ye; Keith G. Pierce; Craig D. Lack; Terence M. Thomas; Peter A. Burke; David Gettman; Sarah Lane

Archive | 2000

Polishing pads for chemical mechanical planarization

David B. James; Arun Vishwanathan; Lee Melbourne Cook; Peter A. Burke; David Shidner

Archive | 2001

Control of removal rates in CMP

Terence M. Thomas; Qianqiu Ye; Joseph K. So; Peter A. Burke; Vikas Sachan; Elizabeth A. Langlois; Keith G. Pierce; Craig D. Lack; David Gettman; Hiroyuki Senoo; Kouchi Yoshida; Yoshikazu Nishida; Vilas N. Koinkar; Raymond Lee Lavoie Jr.

Archive | 2000

Hydrolytically stable grooved polishing pads for chemical mechanical planarization

David B. James; Arun Vishwanathan; Lee Melbourne Cook; Peter A. Burke; David Shidner; Joseph K. So; John V. H. Roberts

Archive | 2000

Grooved polishing pads for chemical mechanical planarization

David B. James; Arun Vishwanathan; Lee Melbourne Cook; Peter A. Burke; David Shidner; Joseph K. So; John V. H. Roberts

Archive | 1999

Method to decrease dishing rate during cmp in metal semiconductor structures

Keith G. Pierce; Elizabeth A. Langlois; David Gettman; Vikas Sachan; Peter A. Burke

Archive | 2001

Methods for break-in and conditioning a fixed abrasive polishing pad

Vilas N. Koinkar; Reza Golzarian; Matthew VanHanehem; Qiuliang Luo; James Shen; Peter A. Burke

Archive | 2001

Dissolution of metal particles produced by polishing

Tony Quan Tran; Vikas Sachan; David Gettman; Terence M. Thomas; Craig D. Lack; Peter A. Burke

Archive | 1999

Methods to control film removal rates for improved polishing in metal CMP

Vikas Sachan; Peter A. Burke; Elizabeth A. Langlois; Keith G. Pierce

Archive | 2000

Improved chemical mechanical polishing slurries for metal

Craig D. Lack; Qiuliang Luo; Qianqiu Christine Ye; Vikas Sachan; Terence M. Thomas; Peter A. Burke

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