Peter Murer | Researchain

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Featured researches published by Peter Murer.

Advances in Resist Technology and Processing XX | 2003

A novel photoacid generator for chemically amplified photoresist with ArF exposure

Toshikage Asakura; Hitoshi Yamato; Akira Matsumoto; Peter Murer; Masaki Ohwa

Recently a new non-ionic PAG was developed and its performance was evaluated in a model ArF photoresist formulation. The development profile of the photoresist including the new PAG was studied in detail by using dissolution rate measurement (DRM) apparatus and compared with popular PAGs, such as triphenylsulfonium triflate (TPST), bis(p-ter-butylphenyl)iodonium triflate (BTIT) and 5-norbornene-2,3-dicarboximidyl trifluoromethanesulfonate (NDIT). As the consequences, the photoefficiency of the new PAG was higher than BTIT and NDIT and comparable to TPST. From the DRM results, the new PAG showed a high contrast (high tan θ value). In addition, the simulation based on the results of DRM suggested that the new PAG is superior to TPST in terms of resolution and depth of focus (DOF) latitude.

Archive | 2004

Halogenated oxime derivatives and the use thereof as latent acids

Hitoshi Yamato; Toshikage Asakura; Akira Matsumoto; Peter Murer; Tobias Hintermann

Archive | 2009

Electroluminescent metal complexes with dibenzo[f,h]quinoxalines

Beat Schmidhalter; Thomas Schäfer; Peter Murer; Kristina Bardon; Stephan Allenbach; Andrea Ricci

Archive | 2008

ELECTROLUMINESCENT METAL COMPLEXES WITH BENZOTRIAZOLES

Thomas Schäfer; Peter Murer; Gisèle Baudin; Manuela Kocher; François Maike; Stephan Allenbach; Rosemarie Sift; Beat Schmidhalter

Archive | 2010

DIKETOPYRROLOPYRROLE POLYMERS FOR USE IN ORGANIC SEMICONDUCTOR DEVICES

Mathias Dueggeli; Olivier Frédéric Aebischer; Pascal Hayoz; Marta Fonrodona Turon; Mathieu Turbiez; Jean-Charles Flores; Hans Juerg Kirner; Peter Murer; Natalia Chebotareva; Thomas Schaefer

Archive | 2007

Heterocyclic bridged biphenyls and their use in oleds

Frédérique Wendeborn; Beat Schmidhalter; Thomas Schäfer; Peter Murer; Kristina Bardon

Chimia | 2008

A Simple Straightforward Synthesis of Phenylphosphane and the Photoinitiator Bis(mesitoyl)phenylphosphane Oxide (IRGACURE 819)

Hansjörg Grützmacher; Jens Geier; Daniel Stein; Timo Ott; Hartmut Schönberg; Reinhard H. Sommerlade; Souad Boulmaaz; Jean-Pierre Wolf; Peter Murer; Thomas Ulrich

Archive | 2005