Peter Thissen

Recovery of nonwetting characteristics by surface modification of gallium-based liquid metal droplets using hydrochloric acid vapor

The applicability of gallium-based liquid metal alloy has been limited by the oxidation problem. In this paper, we report a simple method to remove the oxide layer on the surface of such alloy to recover its nonwetting characteristics, using hydrochloric acid (HCl) vapor. Through the HCl vapor treatment, we successfully restored the nonwetting characteristics of the alloy and suppressed its viscoelasticity. We analyzed the change of surface chemistry before and after the HCl vapor treatment using X-ray photoelectron spectroscopy (XPS) and low-energy ion-scattering spectroscopy (LEIS). Results showed that the oxidized surface of the commercial gallium-based alloy Galinstan (Ga(2)O(3) and Ga(2)O) was replaced with InCl(3) and GaCl(3) after the treatment. Surface tension and static contact angle on a Teflon-coated glass of the HCl-vapor-treated Galinstan were measured to be 523.8 mN/m and 152.5°. A droplet bouncing test was successfully carried out to demonstrate the nonwetting characteristics of the HCl-vapor-treated Galinstan. Finally, the stability of the transformed surface of the HCl-vapor-treated Galinstan was investigated by measuring the contact angle and LEIS spectra after reoxidation in an ambient environment.

Adsorption kinetics of organophosphonic acids on plasma-modified oxide-covered aluminum surfaces.

Tailoring of oxide chemistry on aluminum by means of low-pressure water and argon plasma surface modification was performed to influence the kinetics of the self-assembly process of octadecylphosphonic acid monolayers. The plasma-induced surface chemistry was studied by in situ FTIR reflection-absorption spectroscopy (IRRAS). Ex situ IRRAS and X-ray photoelectron spectroscopy were applied for the analysis of the adsorbed self-assembled monolayers. The plasma-induced variation of the hydroxide to oxide ratio led to different adsorption kinetics of the phosphonic acid from dilute ethanol solutions as measured by means of a quartz crystal microbalance. Water plasma treatment caused a significant increase in the density of surface hydroxyl groups in comparison to that of the argon-plasma-treated surface. The hydroxyl-rich surface led to significantly accelerated adsorption kinetics of the phosphonic acid with a time of monolayer formation of less than 1 min. On the contrary, decreasing the surface hydroxyl density slowed the adsorption kinetics.

Stability of Phosphonic Acid Self-Assembled Monolayers on Amorphous and Single-Crystalline Aluminum Oxide Surfaces in Aqueous Solution

The formation of octadecylphosphonic acid (ODPA) self-assembled monolayers (SAMs) and their stability in water has been studied on four distinctly different aluminum oxide surfaces. The aim was to improve the understanding of the state of binding between the phosphonic acid to the oxide surface and how this interaction depends on the structure and termination of the oxide surface. Single crystalline Al(2)O(3)(0001) and Al(2)O(3)(1102) surfaces were compared to amorphous oxide passive films on aluminum and physical vapor deposited (PVD) amorphous aluminum oxide films on gold. The monolayers were adsorbed from ethanol solution, characterized by means of high-resolution in situ atomic force microscopy (AFM), contact angle measurements, polarization modulated infrared reflection absorption spectroscopy (PM-IRRAS), and diffuse reflectance infrared Fourier transform spectroscopy (DRIFTS), and proved to be self-assembled. On Al(2)O(3)(1102) surfaces and amorphous Al(2)O(3) surfaces, the ODPA self-assembled monolayers showed high stability in aqueous environments. However, the adsorbed ODPA monolayers were substituted by the adsorption of interfacial water on the Al(2)O(3)(0001) surface via the intermediate formation of micelles. The different stability of the monolayers in aqueous environments is explained by the variation of interfacial binding states ranging from ionic interactions between phosphonate groups and the positively charged hydrolytated oxide surface to directed coordination bonds between the phosphonate group and Al ions.

Activation of Surface Hydroxyl Groups by Modification of H- Terminated Si(111) Surfaces

Chemical functionalization of semiconductor surfaces, particularly silicon oxide, has enabled many technologically important applications (e.g., sensing, photovoltaics, and catalysis). For such processes, hydroxyl groups terminating the oxide surface constitute the primary reaction sites. However, their reactivity is often poor, hindering technologically important processes, such as surface phosphonation requiring a lengthy postprocessing annealing step at 140 °C with poor control of the bonding geometry. Using a novel oxide-free surface featuring a well-defined nanopatterned OH coverage, we demonstrate that hydroxyl groups on oxide-free silicon are more reactive than on silicon oxide. On this model surface, we show that a perfectly ordered layer of monodentate phosphonic acid molecules is chemically grafted at room temperature, and explain why it remains completely stable in aqueous environments, in contrast to phosphonates grafted on silicon oxides. This fundamental understanding of chemical activity and surface stability suggests new directions to functionalize silicon for sensors, photovoltaic devices, and nanoelectronics.

Environment-controlled tethering by aggregation and growth of phosphonic acid monolayers on silicon oxide.

Phosphonic acid monolayers are being considered as versatile surface modification agents due to their unique ability to attach to surfaces in different configurations, including mono-, bi-, or even tridentate arrangements. Tethering by aggregation and growth (T-BAG) of octadecylphosphonic acid (ODPA) on silicon oxide surfaces has proven to be a robust method to establish a strong chemical bond. However, it requires a long processing time (> 48 h) that is a substantial drawback for industrial applications. We demonstrate here that the humidity level during processing is the most important parameter controlling the reaction. Using in situ Fourier Transform Infrared Spectroscopy (FTIR), we first show that the initially physisorbed layer obtained upon immersion in ODPA is composed of well-ordered bilayers and only reacts with the SiO(2) surface at 140 °C. Importantly, we show that the presence of water at the interface (determined by the humidity level) greatly influences the reaction time and completion. In humid environments (relative humidity, RH > 40%), there is no reaction, while in dry environments (RH < 16%), the reaction is essentially instantaneous at 140 °C. Ab initio calculations and modeling confirm that the degree of chemical reaction with the surface OH groups depends on the chemical potential (i.e., concentration) of interfacial water molecules. These findings provide a workable modification of the traditional T-BAG method consistent with many industrial applications.

Interface Chemistry and Molecular Interactions of Phosphonic Acid Self-Assembled Monolayers on Oxyhydroxide-Covered Aluminum in Humid Environments

Barrier properties of self-assembled octadecylphosphonic acid (ODPA) monolayers on plasma-modified oxyhydroxide-covered aluminum surfaces were analyzed by means of in situ photoelastic modulated infrared reflection absorption spectroscopy (PM-IRRAS). The surface hydroxyl density prior to ODPA adsorption was increased by means of a low-temperature H(2)O-plasma treatment. Adsorption isotherms of H(2)O on ODPA self-assembled monolayer (SAM) modified surfaces in comparison to bare oxide covered aluminum surfaces showed that the ODPA SAM leads to a strongly reduced amount of adsorbed water based on the inability of water to form hydrogen bonds to the low-energy aliphatic surface. However, the ODPA SAM covered surfaces did not show a significant inhibition of the H(2)O/D(2)O isotope exchange reaction between the D(2)O gas phase and the hydroxyl groups of the aluminum oxyhydroxide film, as the interfacial layer between the ODPA SAM and the metal substrate, while the interfacial phosphonate group as well as the orientation of the SAM is not affected by the adsorption of water. It can be followed that the strong adhesion promoting and high corrosion resistances of organophosphonate monolayers on oxyhydroxide-covered aluminum is a result of the strong acid-base interaction of the phosphonate headgroup with the Al ions in the oxyhydroxide film, even in the presence of high interfacial water activity and the molecular interactions of the aliphatic chains. However, the barrier effect of such monolayers on the transport of water is negligible.

Controlled, Low-Coverage Metal Oxide Activation of Silicon for Organic Functionalization: Unraveling the Phosphonate Bond

Deposition of thin films and grafting of organic molecules on semiconductor surfaces, particularly oxide surfaces, are widely studied as means of passivation and functionalization for a variety of applications. However, organic functionalization of silicon oxide is challenging, as the currently used molecules (silanes and phosphonates) do not form layers that are stable in aqueous environments and present challenges during the grafting process. For instance, the chemical grafting of phosphonates requires high temperature (140 °C) to perform. Modification of SiO(2) surfaces with metal oxides is an attractive alternative since strong bonds can be established between metal oxides and relevant molecules (silanes, phosphonates). While such modification is possible using vapor-phase methods, such as atomic layer deposition and physical vapor-phase deposition, wet chemical processing is inexpensive and technologically very attractive. We describe here a simple wet chemical method to deposit an ultrathin layer of metal oxide/hydroxide groups. Further, using a model surface with exactly one-third monolayer OH groups on oxide-free Si surfaces, the precise adsorption geometry on single Al(OH)(3) groups is shown to be bidentate, and the distance between the Al and P atoms is determined to be the main influencing parameter for a thermodynamically stable formation of the Al-O-P bond.

Microscopic structure and properties of discrete water layer in Na-exchanged montmorillonite.

In this work, we focus on the atomic structure of the water interlayer of Na-exchanged montmorillonite. For two different surface charge densities, namely -0.086 and -0.172 C/m(2), the adsorption process in the presence of water is described by first principles calculations. We describe the interactions and forces for every water molecule entering the interlayer during the swelling process. In particular, the dielectric permittivity of the water interlayer is calculated. Finally, we confirm our results performing ab initio thermodynamics calculations leading to a wide range of realistic experimental scenarios.

Optical response of metal-insulator-metal heterostructures and their application for the detection of chemicurrents

The optical response of thin-film metal-insulator-metal (MIM) systems of tantalum-tantalum oxide-Au type is studied by recording the macroscopic current across the device resulting from the low-energy electron-hole pairs excited in the metals by red and near-infrared (NIR) light (h < 2eV). It is observed that current flows from the top Au to the back Ta electrode, although a larger number of photons is absorbed in the latter. This directional preference is attributed to the built-in electric field across the oxide layer. The yield per photon increases strongly as photon energy becomes comparable to the barrier height. Current exhibits a strong dependence on bias voltages applied across the oxide layer. Photoyields induced by NIR light (h 1.5eV) were found to be comparable to recently observed chemicurrents arising from exposure of a MIM sensor to atomic hydrogen, when compared on a current per photon to current per impinging hydrogen atom basis.

Carbonation of Wollastonite(001) Competing Hydration: Microscopic Insights from Ion Spectroscopy and Density Functional Theory

In this paper, we report about the influence of the chemical potential of water on the carbonation reaction of wollastonite (CaSiO3) as a model surface of cement and concrete. Total energy calculations based on density functional theory combined with kinetic barrier predictions based on nudge elastic band method show that the exposure of the water-free wollastonite surface to CO2 results in a barrier-less carbonation. CO2 reacts with the surface oxygen and forms carbonate (CO3(2-)) complexes together with a major reconstruction of the surface. The reaction comes to a standstill after one carbonate monolayer has been formed. In case one water monolayer is covering the wollastonite surface, the carbonation is no more barrier-less, yet ending in a localized monolayer. Covered with multilayers of water, the thermodynamic ground state of the wollastonite completely changes due to a metal-proton exchange reaction (also called early stage hydration) and Ca(2+) ions are partially removed from solid phase into the H2O/wollastonite interface. Mobile Ca(2+) reacts again with CO2 and forms carbonate complexes, ending in a delocalized layer. By means of high-resolution time-of-flight secondary-ion mass spectrometry images, we confirm that hydration can lead to a partially delocalization of Ca(2+) ions on wollastonite surfaces. Finally, we evaluate the impact of our model surface results by the meaning of low-energy ion-scattering spectroscopy combined with careful discussion about the competing reactions of carbonation vs hydration.