Petr Klapetek
Masaryk University
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Publication
Featured researches published by Petr Klapetek.
Central European Journal of Physics | 2012
David Nečas; Petr Klapetek
In this article, we review special features of Gwyddion—a modular, multiplatform, open-source software for scanning probe microscopy data processing, which is available at http://gwyddion.net/. We describe its architecture with emphasis on modularity and easy integration of the provided algorithms into other software. Special functionalities, such as data processing from non-rectangular areas, grain and particle analysis, and metrology support are discussed as well. It is shown that on the basis of open-source software development, a fully functional software package can be created that covers the needs of a large part of the scanning probe microscopy user community.
Nanoscale Research Letters | 2011
Petr Klapetek; Miroslav Valtr; David Nečas; Ota Salyk; Petr Dzik
Nanoparticles are often measured using atomic force microscopy or other scanning probe microscopy methods. For isolated nanoparticles on flat substrates, this is a relatively easy task. However, in real situations, we often need to analyze nanoparticles on rough substrates or nanoparticles that are not isolated. In this article, we present a simple model for realistic simulations of nanoparticle deposition and we employ this model for modeling nanoparticles on rough substrates. Different modeling conditions (coverage, relaxation after deposition) and convolution with different tip shapes are used to obtain a wide spectrum of virtual AFM nanoparticle images similar to those known from practice. Statistical parameters of nanoparticles are then analyzed using different data processing algorithms in order to show their systematic errors and to estimate uncertainties for atomic force microscopy analysis of nanoparticles under non-ideal conditions. It is shown that the elimination of user influence on the data processing algorithm is a key step for obtaining accurate results while analyzing nanoparticles measured in non-ideal conditions.
Philosophical Magazine | 2009
Jiri Man; Petr Klapetek; Ondrej Man; Anja Weidner; Karel Obrtlík; Jaroslav Polák
Early stages of surface relief evolution of persistent slip markings (PSMs), formed in areas where persistent slip bands (PSBs) intersect the free surface, in polycrystalline 316L stainless steel cycled with constant plastic strain amplitude were studied using atomic force microscopy (AFM) and electron backscattering diffraction (EBSD). Focused ion beam (FIB) technique was employed to obtain additional, more detailed information on the shape of PSMs. To reveal true qualitative and quantitative information on the simultaneous growth of intrusions and extrusions within individual PSMs, identical areas both on the specimen surface and on its inverse copy obtained via plastic replica were studied using AFM. Intrusions are preceded by extrusions regardless of orientation of individual grains of the polycrystal. The first intrusions appear largely around 1% of fatigue life at the moment when ‘static’ extrusions are developed. They appear predominantly but not exclusively at the side of extrusions where the emerging active slip plane is inclined to the surface at an acute angle. They grow faster than the stage of stable extrusion growth. Typical morphology of mature PSMs developed at 15% of fatigue life consists of ribbon-like extrusions accompanied by two thin parallel intrusions along both PSB–matrix interfaces. Experimental data on the morphology and growth of extrusions and intrusions are discussed in relation to the theoretical models and computer simulations of surface relief evolution leading to fatigue crack initiation. †Present address: Institute of Material Science, Technische Universität Bergakademie Freiberg, Gustav-Zeuner-Str. 5, 09596 Freiberg, Germany
Measurement Science and Technology | 2011
Jan Hrabina; Josef Lazar; Petr Klapetek; Ondřej Číp
This work reports on the measurement at the nanoscale using local probe microscopy techniques, primarily atomic force microscopy. Recent applications using the atomic force microscope as a nanometrology tool require that not only the positioning of the tip has to be based on precise measurements but also the traceability of the measuring technique has to be ensured up to the primary standard. Thus, in our experimental work, laser interferometric measuring methods were employed. In this paper, a new design of the six-axis-dimensional interferometric measurement tool for local probe microscopy stage nanopositioning is presented.
Journal of Applied Physics | 2002
Daniel Franta; Ivan Ohlídal; Petr Klapetek; Alberto Montaigne-Ramil; A. Bonanni; David Stifter; H. Sitter
In this article a multisample modification of variable angle spectroscopic ellipsometry is used to characterize ZnSe thin films prepared by molecular beam epitaxy on substrates formed by GaAs single crystals. Atomic force microscopy (AFM) is employed to characterize the morphology of the upper boundaries of these films. To interpret the ellipsometric data a relatively complicated physical model that contains a rough overlayer between the ambient and the ZnSe film and a transition layer between the GaAs substrate and the ZnSe film is employed. Several models of dispersion of the optical constants of the overlayers are examined to interpret the ellipsometric data. It is shown that the choice of overlayer dispersion model has a strong influence on determining the optical constants and dielectric function of the ZnSe films in the near-UV region. Within the visible region there are no differences between the overlayer dispersion models regarding determination of the ZnSe optical constants. The spectral depende...
Mikrochimica Acta | 2000
Daniel Franta; Ivan Ohlídal; Petr Klapetek
Abstract. In this paper the analysis of a family of rough silicon single crystal surfaces covered with native oxide layers is performed using a combined optical method based on a multisample treatment of the experimental data obtained using variable angle of spectroscopic ellipsometry and near normal spectroscopic reflectometry. Within this analysis the values of the thicknesses of the native oxide layers are determined together with the values of statistical parameters of roughness, i.e. with the rms values of the heights and the values of the autocorrelation lengths, for all the samples studied. For interpreting experimental data the perturbation Rayleigh–Rice theory and scalar diffraction theory are employed. By means of the results of the analysis achieved using both the theories limitations of the validity of these theories is discussed. The correctness of the values of the statistical parameters determined using the optical method is verified using AFM measurements.
Ultramicroscopy | 2003
Petr Klapetek; Ivan Ohlídal
In this paper, the theoretical analysis of the influence of finite linear dimensions of an atomic force microscope tip on profiles of the upper boundaries of columnar thin films and their statistical quantities is performed. This analysis is based on a numerical evaluation of the main statistical quantities, i.e. the standard deviations of the heights and slopes, one-dimensional distributions of the probability density of heights and slopes and power spectral density function, corresponding to a simulated columnar structure of the thin films. It is shown that the strongest misrepresentation of the measured profiles of the upper boundaries of the columnar films originates in the cases when the linear dimensions of the columns are smaller or comparable with the linear dimensions of the tip. Further, it is shown that using a surface reconstruction procedure one can correct (improve) the boundary profiles and their statistical quantities partially. The results of this analysis enable us to perform rough estimation of the errors achieved within atomic force microscopy studies of the real columnar thin films. Moreover, these results allow to estimate the corrections of the statistical quantities mentioned above to be obtained using the surface reconstruction.
Measurement Science and Technology | 2011
Petr Klapetek; David Nečas; Anna Campbellová; Andrew Yacoot; Ludger Koenders
This paper describes the processing of three-dimensional (3D) scanning probe microscopy (SPM) data. It is shown that 3D volumetric calibration error and uncertainty data can be acquired for both metrological atomic force microscope systems and commercial SPMs. These data can be used within nearly all the standard SPM data processing algorithms to determine local values of uncertainty of the scanning system. If the error function of the scanning system is determined for the whole measurement volume of an SPM, it can be converted to yield local dimensional uncertainty values that can in turn be used for evaluation of uncertainties related to the acquired data and for further data processing applications (e.g. area, ACF, roughness) within direct or statistical measurements. These have been implemented in the software package Gwyddion.
Measurement Science and Technology | 2011
Miloslav Ohlídal; Ivan Ohlídal; Petr Klapetek; David Nečas; Abhijit Majumdar
In this paper, an original method for the complete optical characterization of thin films exhibiting area thickness non-uniformity is presented. This method is based on interpreting experimental data obtained using an original imaging spectroscopic photometer operating in the reflection mode at normal incidence of light. A CCD camera is employed as a detector of the photometer. The spectral dependences of the reflectance measured simultaneously by individual pixels of the CCD camera correspond to the local reflectance of small areas of the non-uniform thin films characterized. These areas form a matrix along a relatively large part of the substrate covered with the non-uniform film. The spectral dependences of the local reflectance measured by the individual pixels are treated separately by means of the formulae for the reflectance valid for uniform thin films. The reason is that the local areas corresponding to the pixels are sufficiently small so that the film characterized can be considered to be uniform within these local areas. Using this approach, it is possible to determine the values of the local thickness and local optical constants for every small area of the matrix. Thus, in principle it is possible to determine the distributions (maps) of the local thickness and the local optical constants of the non-uniform films simultaneously. This method is used to characterize carbon-nitride thin films exhibiting only the thickness area non-uniformity.
Measurement Science and Technology | 2009
Josef Lazar; Petr Klapetek; Ondřej Číp; Martin Čížek; Mojmír Šerý
We present a system of positioning and interferometric monitoring of a sample position for measurements and calibration in the nanoscale in metrology. The positioning is based on a three-axis stage which allows replacing scanning by the probe of an atomic force microscope with a system with full interferometric displacement measurement. A stage with 200 µm × 200 µm of horizontal travel extends also the microscope range. The stage allows positioning with sub-nanometer resolution in all three axes under a closed loop control with position detection via capacitive sensors. Interferometric system monitoring all six degrees of freedom of the stage ensures full metrological traceability of the positioning to the fundamental etalon of length and improves resolution and overall precision of the displacement monitoring.