Ph. Guittienne

Magnetization reversal triggered by spin-polarized current in magnetic nanowires

It is shown experimentally that a pulsed current driven through a Ni nanowire provokes an irreversible magnetization reversal at a field differing from the spontaneous switching field Hsw by ΔH of as much as 40% of Hsw. The state of the magnetization is assessed by anisotropic magnetoresistance measurements carried out on single, isolated nanowires with and without spin polarizer (Co/Cu multilayers). The parameter ΔH is studied as a function of the angle θ between the applied field and the wire. A shift of about 90° between both profiles ΔH(θ) with and without spin polarizer shows that the observed effect is related to the spin polarization of the current. The results are interpreted with a model of generalized Landau-Lifshitz-Gilbert equation with spin-polarized current.

R&D around a photoneutralizer-based NBI system (Siphore) in view of a DEMO Tokamak steady state fusion reactor

ince the signature of the ITER treaty in 2006, a new research programme targeting the emergence of a new generation of neutral beam (NB) system for the future fusion reactor (DEMO Tokamak) has been underway between several laboratories in Europe. The specifications required to operate a NB system on DEMO are very demanding: the system has to provide plasma heating, current drive and plasma control at a very high level of power (up to 150 MW) and energy (1 or 2 MeV), including high performances in term of wall-plug efficiency (η  >  60%), high availability and reliability. To this aim, a novel NB concept based on the photodetachment of the energetic negative ion beam is under study. The keystone of this new concept is the achievement of a photoneutralizer where a high power photon flux (~3 MW) generated within a Fabry–Perot cavity will overlap, cross and partially photodetach the intense negative ion beam accelerated at high energy (1 or 2 MeV). The aspect ratio of the beam-line (source, accelerator, etc) is specifically designed to maximize the overlap of the photon beam with the ion beam. It is shown that such a photoneutralized based NB system would have the capability to provide several tens of MW of D0 per beam line with a wall-plug efficiency higher than 60%. A feasibility study of the concept has been launched between different laboratories to address the different physics aspects, i.e. negative ion source, plasma modelling, ion accelerator simulation, photoneutralization and high voltage holding under vacuum. The paper describes the present status of the project and the main achievements of the developments in laboratories.

Towards an optimal antenna for helicon waves excitation

Helicon sources are known to produce high-density plasmas and have found many applications. Different types of antenna have been used for helicon excitation but none of them generate a radio-frequency (rf) field that matches the helicon wave field determined by the dispersion equation. We show that this match can be obtained to a very good approximation by using a birdcage type antenna. Our plasma experiments show that a helicon regime with electron densities up to 5×1012cm−3 is obtained for very low rf power injection (typically 200 W), and at an unusual operating pressure up to 25 Pa.

Switching time measurements of current-induced magnetization reversal

Electrical contacts to single isolated nickel nanowires (80 nm in diameter, 6000 nm in length), pulsed current densities of about 10/sup 7/ A/cm/sup 2/ and a Wheatstone bridge of a 1 GHz bandwidth allow detection of the magnetization switching in static magnetic fields. The temperature of the nanowires during the current pulse is deduced from their resistance change. The measurements of switching time as a function of applied field and current demonstrate that the current lowers the energy barrier for switching.

Negative ion source development for a photoneutralization based neutral beam system for future fusion reactors

In parallel to the developments dedicated to the ITER neutral beam (NB) system, CEA-IRFM with laboratories in France and Switzerland are studying the feasibility of a new generation ofNBsystem able to provide heating and current drive for the future DEMOnstration fusion reactor. For the steadystate scenario, theNBsystem will have to provide a highNBpower level with a high wall-plug efficiency (η∼60%). Neutralization of the energetic negative ions by photodetachment (so called photoneutralization), if feasible, appears to be the ideal solution to meet these performances, in the sense that it could offer a high beam neutralization rate (>80%) and a wall-plug efficiency higher than 60%. The main challenge of this new injector concept is the achievement of a very high power photon flux which could be provided by 3MWFabry–Perot optical cavities implanted along the 1 MeVD− beam in the neutralizer stage. The beamline topology is tall and narrow to provide laminar ion beam sheets, which will be entirely illuminated by the intra-cavity photon beams propagating along the vertical axis. The paper describes the presentR&D(experiments and modelling) addressing the development of a new ion source concept (Cybele source) which is based on a magnetized plasma column. Parametric studies of the source are performed using Langmuir probes in order to characterize and compare the plasma parameters in the source column with different plasma generators, such as filamented cathodes, radio-frequency driver and a helicon antenna specifically developed at SPC-EPFL satisfying the requirements for the Cybele (axial magnetic field of 10 mT, source operating pressure: 0.3 Pa in hydrogen or deuterium). The paper compares the performances of the three plasma generators. It is shown that the helicon plasma generator is a very promising candidate to provide an intense and uniform negative ion beam sheet.

Resonant RF network antennas for large-area and large-volume inductively coupled plasma sources

Large-area and large-volume radio frequency (RF) plasmas are produced by different arrangements of an elementary electrical mesh consisting of two conductors interconnected by a capacitor at each end. The obtained cylindrical and planar RF networks are resonant and generate very high RF currents. The input impedance of such RF networks shows the behaviour of an RLC parallel resonance equivalent circuit. The real impedance at the resonance frequency is of great advantage for power matching compared with conventional inductive devices. Changes in the RLC equivalent circuit during the observed E-H transition will allow future interpretation of the plasma-antenna coupling. Furthermore, high power transfer efficiencies are found during inductively coupled plasma (ICP) operation. For the planar RF antenna network it is shown that the E-H transition occurs simultaneously over the entire antenna. The underlying physics of these discharges induced by the resonant RF network antenna is found to be identical to that of the conventional ICP devices described in the literature. The resonant RF network antenna is a new versatile plasma source, which can be adapted to applications in industry and research.

Plasma generation by inductive coupling with a planar resonant RF network antenna

A planar antenna operating at 13.56MHz is presented for potential applications in plasma processing. It consists of interconnected elementary resonant meshes composed of inductive and capacitive elements. Due to its structure, the antenna exhibits a set of resonant modes associated with peaks of the real input impedance. Each mode is defined by its particular distribution of current and voltage oscillating at the frequency of the mode. A rectangular antenna of 0.55m x 0.20m has been built and first results obtained with argon plasmas are presented. Efficient plasma generation is shown by plasma densities above 3 x 10(17) m(-3) at 2000 W with reasonable uniformity over the antenna area. The plasma couples inductively with the resonating currents flowing in the antenna above a threshold power of about 60 W. The real input impedance at antenna resonance avoids the problem of strong reactive currents and voltages in the matching box and RF power connections associated with conventional large-area plasma sources. Resonant RF networks have a strong potential interest for various designs of plasma sources.

Resonant planar antenna as an inductive plasma source

A resonant planar antenna as an inductive plasma source operating at 13.56 MHz inside a low pressure vacuum vessel is presented for potential plasma processing applications. Its principle consists in interconnecting elementary resonant meshes composed of inductive and capacitive elements. Due to its structure, the antenna shows a set of resonant modes associated with peaks of the real input impedance. Each of these modes is defined by its own current and voltage distribution oscillating at the frequency of the mode. A rectangular antenna of 0.55 m x 0.20 m has been built, and first results obtained with argon plasmas are presented. Plasma generation is shown to be efficient as densities up to 4 x 10(17) m(-3) at 2000 W have been measured by microwave interferometry at a distance of 4 cm from the source plane. It is also demonstrated that the plasma couples inductively with the resonating currents flowing in the antenna above a threshold power of about 60 W. A non-uniformity of less than +/- 5% is obtained at 1000 W at a few centimeters above the antenna over 75% of its surface

Plasma Jet-Substrate Interaction in Low Pressure Plasma Spray-CVD Processes

Conventional equipment for plasma spraying can be adapted for operation at low pressure so that PECVD-like processing can be performed. The plasma jet generated by the torch is characterized by a high convective velocity and a high gas temperature. The influence of these properties on a deposition process are investigated in the framework of simple theoretical considerations and illustrated by various experimental results obtained with SiOx deposition. A conclusion of this study is that the deposition process is dominated by diffusion effects on the substrate surface: the deposition profiles and the deposition rates are determined by the precursor density and by the gas temperature on the substrate surface. The high velocity of the jet does not play a direct role in the deposition mechanism. On the other hand it strongly increases the precursor density available for the deposition since it efficiently transports the precursor up to the substrate.

Industrial plasmas in academia

The present review, written at the occasion of the 2014 EPS Innovation award, will give a short overview of the research and development of industrial plasmas within the last 30 years and will also provide a first glimpse into future developments of this important topic of plasma physics and plasma chemistry. In the present contribution, some of the industrial plasmas studied at the CRPP/EPFL at Lausanne are highlighted and their influence on modern plasma physics and also discharge physics is discussed. One of the most important problems is the treatment of large surfaces, such as that used in solar cells, but also in more daily applications, such as the packaging industry. In this contribution, the advantages and disadvantages of some of the most prominent plasmas such as capacitively-and inductively-coupled plasmas are discussed. Electromagnetic problems due to the related radio frequency and its consequences on the plasma reactor performance, and also dust formation due to chemical reactions in plasma, are highlighted. Arcing and parasitic discharges occurring in plasma reactors can lead to plasma reactor damages. Some specific problems, such as the gas supply of a large area reactor, are discussed in more detail. Other topics of interest have been dc discharges such as those used in plasma spraying where thermal plasmas are applied for advanced material processing. Modern plasma diagnostics make it possible to investigate sparks in electrical discharge machining, which surprisingly show properties of weakly-coupled plasmas. Nanosecond dielectric barrier discharge plasmas have been applied to more speculative topics such as applications in aerodynamics and will surely be important in the future for ignition and combustion. Most of the commonly-used plasma sources have been shown to be limited in their performance. Therefore new, more effective plasma sources are urgently required. With the recent development of novel resonant network antennas for new advanced large area or large volume plasma sources, an important step towards high performance plasmas and new fast processes is made.