Philip Willke

Doping of Graphene by Low-Energy Ion Beam Implantation: Structural, Electronic, and Transport Properties

We investigate the structural, electronic, and transport properties of substitutional defects in SiC-graphene by means of scanning tunneling microscopy and magnetotransport experiments. Using ion incorporation via ultralow energy ion implantation, the influence of different ion species (boron, nitrogen, and carbon) can directly be compared. While boron and nitrogen atoms lead to an effective doping of the graphene sheet and can reduce or raise the position of the Fermi level, respectively, (12)C(+) carbon ions are used to study possible defect creation by the bombardment. For low-temperature transport, the implantation leads to an increase in resistance and a decrease in mobility in contrast to undoped samples. For undoped samples, we observe in high magnetic fields a positive magnetoresistance that changes to negative for the doped samples, especially for (11)B(+)- and (12)C(+)-ions. We conclude that the conductivity of the graphene sheet is lowered by impurity atoms and especially by lattice defects, because they result in weak localization effects at low temperatures.

Spatial extent of a Landauer residual-resistivity dipole in graphene quantified by scanning tunnelling potentiometry.

Electronic transport on a macroscopic scale is described by spatially averaged electric fields and scattering processes summarized in a reduced electron mobility. That this does not capture electronic transport on the atomic scale was realized by Landauer long ago. Local and non-local scattering processes need to be considered separately, the former leading to a voltage drop localized at a defect, the so-called Landauer residual-resistivity dipole. Lacking precise experimental data on the atomic scale, the spatial extent of the voltage drop remained an open question. Here, we provide an experimental study showing that the voltage drop at a monolayer-bilayer boundary in graphene clearly extends spatially up to a few nanometres into the bilayer and hence is not located strictly at the structural defect. Moreover, different scattering mechanisms can be disentangled. The matching of wave functions at either side of the junction is identified as the dominant process, a situation similar to that encountered when a molecule bridges two contacts.

Short-range ordering of ion-implanted nitrogen atoms in SiC-graphene

We perform a structural analysis of nitrogen-doped graphene on SiC(0001) prepared by ultra low-energy ion bombardment. Using scanning tunneling microscopy, we show that nitrogen atoms are incorporated almost exclusively as graphitic substitution in the graphene honeycomb lattice. With an irradiation energy of 25 eV and a fluence of approximately 5 × 1014 cm−2, we achieve a nitrogen content of around 1%. By quantitatively comparing the position of the N-atoms in the topography measurements with simulated random distributions, we find statistically significant short-range correlations. Consequently, we are able to show that the dopants arrange preferably at lattice sites given by the 6 × 6-reconstruction of the underlying substrate. This selective incorporation is most likely triggered by adsorbate layers present during the ion bombardment. This study identifies low-energy ion irradiation as a promising method for controlled doping in epitaxial graphene.

Minimum Resistance Anisotropy of Epitaxial Graphene on SiC

We report on electronic transport measurements in rotational square probe configuration in combination with scanning tunneling potentiometry of epitaxial graphene monolayers which were fabricated by polymer-assisted sublimation growth on SiC substrates. The absence of bilayer graphene on the ultralow step edges of below 0.75 nm scrutinized by atomic force microscopy and scanning tunneling microscopy result in a not yet observed resistance isotropy of graphene on 4H- and 6H-SiC(0001) substrates as low as 2%. We combine microscopic electronic properties with nanoscale transport experiments and thereby disentangle the underlying microscopic scattering mechanism to explain the remaining resistance anisotropy. Eventually, this can be entirely attributed to the resistance and the number of substrate steps which induce local scattering. Thereby, our data represent the ultimate limit for resistance isotropy of epitaxial graphene on SiC for the given miscut of the substrate.

Magnetotransport on the nano scale

Transport experiments in strong magnetic fields show a variety of fascinating phenomena like the quantum Hall effect, weak localization or the giant magnetoresistance. Often they originate from the atomic-scale structure inaccessible to macroscopic magnetotransport experiments. To connect spatial information with transport properties, various advanced scanning probe methods have been developed. Capable of ultimate spatial resolution, scanning tunnelling potentiometry has been used to determine the resistance of atomic-scale defects such as steps and interfaces. Here we combine this technique with magnetic fields and thus transfer magnetotransport experiments to the atomic scale. Monitoring the local voltage drop in epitaxial graphene, we show how the magnetic field controls the electric field components. We find that scattering processes at localized defects are independent of the strong magnetic field while monolayer and bilayer graphene sheets show a locally varying conductivity and charge carrier concentration differing from the macroscopic average.