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Dive into the research topics where Philippe Maurel is active.

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Featured researches published by Philippe Maurel.


Japanese Journal of Applied Physics | 1991

Metal Organic Molecular Beam Epitaxy Growth of Ga0.5In0.5P/GaAs Quantum Well Structures

Jean Charles Garcia; Philippe Maurel; Philippe Bove; Jean Pierre Hirtz

High-quality GaAs/GaInP single and multi-quantum-well structures have been grown by metal organic molecular beam epitaxy. Wells as thin as 10 A have been grown exhibiting confinement energies exceeding 310 meV. The influence of growth interruption at both interfaces has been investigated by low-temperature photoluminescence. The critical role of the relative incorporation kinetics of arsenic and phosphorus atoms in determining the nature of the normal and inverted interfaces defining GaAs quantum wells is shown. An excitonic type recombination is evidenced by low-temperature-dependence photoluminescence measurements. Carrier capture is shown to be very efficient, even for the narrowest wells studied.


Japanese Journal of Applied Physics | 1993

Influence of rapid thermal annealing on the properties of strained GaInAs quantum well lasers

Philippe Maurel; Julien Nagle; Jean Pierre Hirtz

The influence of rapid thermal annealing on the properties of GaInAs strained quantum well lasers is studied. Photoluminescence performed at 300 and 77 K shows that an optimum is found for annealing at 800°C-10 s. The threshold current density of the laser decreases by a factor of 2 to 3 while its internal quantum efficiency increases from 30% up to 60%. The origin of the non radiative traps involved in the process is discussed.


MRS Proceedings | 1991

Structural and Defect Study of Low Temperature INP Grown by Gas Source Molecular Beam Epitaxy

J. Ch. Garcia; Jean-Pierre Hirtz; Philippe Maurel; H. J. von Bardeleben; J. C. Bourgoin

The low temperature growth procedure used in the case of GaAs to introduce high concentrations of deep traps such as arsenic antisite defects has been extended to the growth of InP by gas source molecular beam epitaxy. The low temperature growth of InP induces a strong group V stoechiometric deviation (of the order of +1%). On the other hand, Secondary Ion Mass Spectrometry reveals high levels of hydrogen ranging from 3.10 18 to 3.10 19 cm −3 depending on growth temperature. Undoped layers are found to be resistive without any post annealing. Annealing experiments above 250°C lead to conductive layers suggesting a passivation effect of both shallow donors and acceptors by hydrogen.


Archive | 1992

Method for the making of an optoelectronic device

Jean-Pierre Hirtz; Jean-Charles Garcia; Philippe Maurel


Archive | 1995

Method for the making of surface-emitting laser diodes with mechanical mask, the apertures having inclined flanks

Philippe Maurel; Jean-Charles Garcia; Jean-Pierre Hirtz


Archive | 1996

Method for manufacturing surface emitting laser diodes

Philippe Maurel; Jean-Charles Garcia; Jean-Pierre Hirtz


Archive | 1995

Transistor bipolaire à hétérojonction à sous-collecteur/collecteur enterré.

Jean-Charles Garcia; Herve Blanck; Philippe Maurel


Archive | 1994

Two-colour semiconductor laser

Philippe Maurel; Julien Nagle


Archive | 1993

PROCEDE DE REALISATION D'UN DISPOSITIF OPTOELECTRONIQUE.

Jean-Pierre Hirtz; Jean-Charles Garcia; Philippe Maurel


Archive | 1992

Manufacturing method for an optoelectronic device.

Jean-Pierre Hirtz; Jean-Charles Garcia; Philippe Maurel

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