Qin Shu-Ji

Determination of Tungsten Layer Profiles in Bilayer Structures Using X-Ray Reflectivity Method

An effectual method is presented to determine the profiles of a tungsten (W) layer, such as the density, the thickness and the roughness in the multilayer structures, using the x-ray reflectivity technique. To avoid oxidation effects of tungsten, a B4C capping layer is deposited onto to the W layer. To observe the profiles of the tungsten layer with different thicknesses, three groups of W/B4C bilayers with different thicknesses are prepared by using ultra high vacuum dc magnetron sputtering and measured by an x-ray diffractometer. A type of genetic algorithm called the differential evolution is used to simulate the measurement data so as to obtain the parameters of bilayers. According to the simulation, it is shown that the W layer density varies from 95.26% to 97.51% compared to the bulk. In our experiment, the deposition rate is 0.044 nm/s, and the thickness is varied in the range of 9.8–19.4 nm.

Design of Grazing-Incidence Broad-Band Multilayers for Hard X-Ray Reflectors

A new method of designing x-ray supermirrors with broad angular or energy response for use as coatings in x-ray optics is presented. The design is based on an analytical method with oversimplified analytical and semi-empirical formulae, and an extensive numerical method is used in the optimization design. A better initial multilayer is obtained with the former method and optimized with the latter method. In the optimization, a good design is achieved with much less computing time. In addition, the saturation effect due to the interfacial roughness in multilayer also emerges in the design of x-ray supermirrors with definite performances. The reflectivity of C/W x-ray supermirrors as a function of photon energy at the fixed grazing incident angle 0.5 degrees is presented.

Fabrication and Characterization of Ni Thin Films Using Direct-Current Magnetron Sputtering

Ni films are deposited by using ultra high vacuum dc magnetron sputtering onto silicon substrates at room temperature, and the high-quality and high-density films are prepared. The parameters, such as thickness, density and surface roughness, are obtained by using small-angle x-ray diffraction (XRD) analyses with the Marquardt gradient-expansion algorithm. The deposition rate is calculated and the Ni single layer can be fabricated precisely. Based on the fitting results, we can find that the surface roughness of the Ni films is about 0.7 nm, the densities of Ni films are around 97% and the deposition rate is 0.26 nm/s. The roughness of the surface is also characterized by using an atomic force microscope (AFM). The changing trend of the surface roughness in the simulation of XRD is in good agreement with the AFM measurement.

Design, Fabrication and Measurement of Ni/Ti Multilayer Used for Neutron Monochromator

Ni/Ti multilayers, which can be used for neutron monochromators, are designed, fabricated and measured. Firstly, their reflectivities are simulated based on the Nevot–Croce model. Reflectivities of two Ni/Ti multilayer mirrors with periods d = 10.3 nm (M1) and d = 7.8 nm (M2) are calculated. In the calculation, the reflectivity of the Ni/Ti multilayer is taken as a function of the grazing angle with different roughness factors δ = 1.0 nm and δ = 1.5 nm. Secondly, these two multilayers are fabricated by the direct current magnetron sputtering technology. Thirdly their structures are characterized by small-angle x-ray diffraction. The roughness factors are fitted to be 0.68 nm and 1.16 nm for M1 and M2, respectively. Finally their reflective performances are measured on the V14 neutron beam line at the Berlin Neutron Scattering Centre (BENSC), Germany. The experimental data show that the grazing angle of the reflected neutron intensity peak increases, but the reflected neutron intensity decreases, with the decreasing periods of the multilayers.

High Spectral Resolution Mo/Si Multilayers Working at High Order Reflection

The high reflectance orders are used to improve the spectral resolution of Mo/Si multilayers. The multilayers for the first-, second- and third-order reflectance are designed and optimized, respectively. These multilayers are fabricated by using a directed current magnetron sputtering system, and the reflectivity is measured in an extreme ultraviolet range by synchrotron radiation. The experimental results show that the spectral resolution λ/Δλ (λ = 14 nm) increases from 24.6 for the first order to 66.6 for the third order.

Design and Fabrication of Ni/Ti Multilayer for Neutron Supermirror

In the applications of neutron guides and focusing devices, by using the Ni/Ti multilayer supermirrors (SM), the neutron flux is significantly enhanced, because the critical reflective angle of supermirrors increases m times compared to the one of natural bulk Ni. We design and fabricate the Ni/Ti multilayer supermirrors by considering the effect of the interfacial imperfection, such as interface roughness and diffusion, and by using the direct current magnetron sputtering technology. The reflective performances of these supermirrors are measured on a V14 neutron beam line at the Berlin Neutron Scattering Centre (BENSC), Germany. The measurement data suggest that the critical angles of the supermirrors are 1.5 and 2.2 times that of bulk Ni, respectively.

Design and Fabrication of Broad Angular Response Supermirror for Hard X-Ray Optics

A broad angular response supermirror is designed by the simplex optimization method and fabricated by dc magnetron sputtering. The negative effect of the interfacial imperfection, mainly consulting from interface roughness and diffusion, is emerged in the calculation of the precise performance of the supermirror. The reflectivity of such a supermirror is measured by the x-ray diffraction instrument (XRD) at Cu K? line (? = 0.154?nm). The experimental reflectivity is about 30% in a fixed broad grazing incident angular range (0.55??0.85?). The fitting data prove that the thickness of each layer, which is larger than the prospect 0.5?nm, is different from the designed one and the roughness in the supermirror is about 0.85?nm.

Design, fabrication and characterization of the X-ray supermirrors

The design, fabrication and characterization of the X-ray supermirrors are discussed in this paper. Using the local optimization method of simplex algorithm and the global one of simulated annealing algorithm with different initial multilayer structures, we designed the broad angular band supermirrors with different grazing incidence angle intervals at the energy of 8.0 keV (the Kα line of Cu) and the broad energetic band supermirrors with different energy intervals at fixed grazing incidence angles. The fabricating techniques for depositing non-periodic multilayers are also studed. The W/C and W/Si supermirrors are deposited on silicon substrates and characterized by a high resolution X-ray D1 diffractometer from Bede Company, UK. Choosing the interface roughness and the densities of the materials as independent variables, some measured reflectivity curves are fitted using the Debye-Waller factor with interface roughness. The experimental results show that the optical performances of the fabricated supermirrors are in agreement with the designed ones.