R. Butté

Current status of AlInN layers lattice-matched to GaN for photonics and electronics

We report on the current properties of Al1-x InxN (x approximate to 0.18) layers lattice- matched ( LM) to GaN and their specific use to realize nearly strain- free structures for photonic and electronic applications. Following a literature survey of the general properties of AlInN layers, structural and optical properties of thin state- of- the- art AlInN layers LM to GaN are described showing that despite improved structural properties these layers are still characterized by a typical background donor concentration of ( 1 - 5) x 10(18) cm(-3) and a large Stokes shift (similar to 800 meV) between luminescence and absorption edge. The use of these AlInN layers LM to GaN is then exemplified through the properties of GaN/ AlInN multiple quantum wells ( QWs) suitable for near- infrared intersubband applications. A built- in electric field of 3.64MVcm(-1) solely due to spontaneous polarization is deduced from photoluminescence measurements carried out on strain- free single QW heterostructures, a value in good agreement with that deduced from theoretical calculation. Other potentialities regarding optoelectronics are demonstrated through the successful realization of crack- free highly reflective AlInN/ GaN distributed Bragg reflectors ( R > 99%) and high quality factor microcavities ( Q > 2800) likely to be of high interest for short wavelength vertical light emitting devices and fundamental studies on the strong coupling regime between excitons and cavity photons. In this respect, room temperature ( RT) lasing of a LM AlInN/ GaN vertical cavity surface emitting laser under optical pumping is reported. A description of the selective lateral oxidation of AlInN layers for current confinement in nitride- based light emitting devices and the selective chemical etching of oxidized AlInN layers is also given. Finally, the characterization of LM AlInN/ GaN heterojunctions will reveal the potential of such a system for the fabrication of high electron mobility transistors through the report of a high two- dimensional electron gas sheet carrier density ( n(s) similar to 2.6 x 10(13) cm(-2)) combined with a RT mobility mu(e) similar to 1170 cm(2) V-1 s(-1) and a low sheet resistance, R similar to 210 Omega square.

Crack-free fully epitaxial nitride microcavity using highly reflective AlInN∕GaN Bragg mirrors

We report the growth over 2 in. sapphire substrates of crack-free fully epitaxial nitride-based microcavities using two highly reflective lattice-matched AlInN∕GaN distributed Bragg reflectors (DBRs). The optical cavity is formed by an empty 3λ∕2 GaN cavity surrounded by AlInN∕GaN DBRs with reflectivities close to 99%. Reflectivity and transmission measurements were carried out on these structures, which exhibit a stopband of 28 nm. The cavity mode is clearly resolved with a linewidth of 2.3 nm. These results demonstrate that the AlInN∕GaN system is very promising for the achievement of strong light–matter interaction and the fabrication of nitride-based vertical cavity surface emitting lasers.

Spontaneous polarization buildup in a room-temperature polariton laser

We observe the buildup of strong (approximately 50%) spontaneous vector polarization in emission from a GaN-based polariton laser excited by short optical pulses at room temperature. The Stokes vector of emitted light changes its orientation randomly from one excitation pulse to another, so that the time-integrated polarization remains zero. This behavior is completely different from any previous laser. We interpret this observation in terms of the spontaneous symmetry breaking in a Bose-Einstein condensate of exciton polaritons.

Midinfrared intersubband absorption in lattice-matched AlInN∕GaN multiple quantum wells

We report the observation of midinfrared intersubband (ISB) absorption in nearly lattice-matched AlInN∕GaN multiple-quantum-wells. A clear absorption peak is observed around 3μm involving transitions from the conduction band ground state to the first excited state. In addition to ISB absorption, photoluminescence experiments were carried out on lattice- matched AlInN∕GaN single quantum wells in order to determine the spontaneous polarization discontinuity between GaN and Al0.82In0.18N compounds. The experimental value is in good agreement with theoretical predictions. Our results demonstrate that the AlInN∕GaN system is very promising to achieve crack-free and low dislocation density structures dedicated to intersubband devices in the 2–4μm wavelength range.

Recent progress in the growth of highly reflective nitride-based distributed Bragg reflectors and their use in microcavities

The growth of highly-reflective nitride-based distributed Bragg reflectors (DBRs) and their use in vertical cavity structures is reviewed. We discuss the various nitride material systems employed to design Bragg mirrors and microcavities, namely the Al-x(Ga)(1-x)N/(Al)(y)Ga1-yN and the lattice-matched Al1-xInxN/GaN (x(ln) similar to 18%)-based systems. An emphasis on particular issues such as strain management, internal absorption, alloy morphology and contribution of leaky modes is carried out. Specific properties of the poorly known AlInN alloy such as the bandgap variation with In content close to lattice-matched conditions to GaN are reported. The superior optical quality of the lattice-matched AlInN/GaN system for the realization of nitride-based DBRs is demonstrated. The properties of nitride-based vertical cavity devices are also described. Forthcoming challenges such as the realization of electrically pumped vertical cavity surface emitting lasers and strongly coupled quantum microcavities are discussed as well, and in particular critical issues such as vertical current injection.

Crack-free highly reflective AlInN/AlGaN bragg mirrors for UV applications

We report the growth of highly reflective distributed Bragg reflectors (DBRs) in the UV region using the Al0.85In0.15N∕Al0.2Ga0.8N lattice-matched system. The DBRs were deposited on nearly strain-free Al0.2Ga0.8N templates to avoid strain-induced structural degradations. The appearance of cracks was then completely suppressed. The DBRs exhibit a reflectivity higher than 99% at a wavelength as short as ∼340nm and a stop band width of 215meV (20nm).

High quality factor two dimensional GaN photonic crystal cavity membranes grown on silicon substrate

We report on the achievement of freestanding GaN photonic crystal L7 nanocavities with embedded InGaN/GaN quantum wells grown by metal organic vapor phase epitaxy on Si (111). GaN was patterned by e-beam lithography, using a SiO2 layer as a hard mask, and usual dry etching techniques. The membrane was released by underetching the Si (111) substrate. Micro-photoluminescence measurements performed at low temperature exhibit a quality factor as high as 5200 at ∼420 nm, a value suitable to expand cavity quantum electrodynamics to the near UV and the visible range and to develop nanophotonic platforms for biofluorescence spectroscopy.

Polariton lasing in a hybrid bulk ZnO microcavity

We demonstrate polariton lasing in a bulk ZnO planar microcavity under non-resonant optical pumping at a small negative detuning (δ ∼ −1/6 the 130 meV vacuum Rabi splitting) and a temperature of 120 K. The strong coupling regime is maintained at lasing threshold since the coherent nonlinear emission from the lower polariton branch occurs at zero in-plane wavevector well below the uncoupled cavity mode. The contribution of multiple localized polariton modes above threshold and the non-thermal polariton statistics show that the system is in a far-from-equilibrium regime, likely related to the moderate photon lifetime and in-plane photonic disorder in the cavity.

Impact of disorder on high quality factor III-V nitride microcavities

The authors report on the micron scale characterization of a monolithic GaN microcavity (MC) with lattice matched AlInN∕GaN distributed Bragg reflectors by means of a microtransmission setup. This technique allows extracting very high quality factors (Q up to 2800), in accordance with theoretical predictions, contrary to what was previously reported for nitride based MCs. Furthermore, two-dimensional mappings of the MC transmission spectrum allow probing the disorder in this MC. The direct relationship between an increased disorder and a reduction in the Q factor is clearly observed.

Blue lasing at room temperature in high quality factor GaN/AlInN microdisks with InGaN quantum wells

The authors report on the achievement of optically pumped III-V nitride blue microdisk lasers operating at room temperature. Controlled wet chemical etching of an AlInN interlayer lattice matched to GaN allows forming inverted cone pedestals. Whispering gallery modes are observed in the photoluminescence spectra of InGaN∕GaN quantum wells embedded in the GaN microdisks. Typical quality factors of several thousands are found (Q>4000). Laser action at ∼420nm is achieved under pulsed excitation at room temperature for a peak power density of 400kW∕cm2. The lasing emission linewidth is down to 0.033nm.