R. Ebner

Pulsed laser deposition of diamond-like carbon coatings for industrial tribological applications

Abstract The aim of the present work is the investigation of the structural, mechanical and tribological properties of low-wear diamond-like carbon (DLC) coatings for industrial applications. Amorphous hydrogen-free (a-C) and hydrogenated (a-C:H) DLC coatings were coated onto various steel substrates (AISI 1045H, B7, H13, D2, M2) with hardness levels varying from 28 to 66 HRC, by employing the pulsed laser deposition (PLD) method. Therefore, graphite targets were ablated with the 1064 nm wavelength of an Nd:YAG laser in argon and C 2 H 2 atmospheres. The high mean laser power of the applied PLD equipment guarantees deposition rates competitive to other physical vapour deposition (PVD) techniques. Because of the specific process conditions and the use of pure titanium adhesive interface layers, coatings with high adhesion to the substrates were produced at room temperature. The investigations of the coatings by means of light and scanning electron microscopy reveals the high surface quality and extremely dense coating structures. XRD measurements indicated the amorphous structure of the coatings. The nature of the chemical bonding was examined by XPS, indicating different amounts of sp 3 carbon bonds. Pin-on-disc tests against 100Cr6 ball-bearing steel balls as counterparts show an excellent wear resistance of a-C and a-C:H DLC coatings on all different steel substrates. These results, demonstrated the applicability of PLD–DLC coatings for wear protection of high precision components in the field of tools and mechanical components.

Room temperature deposition of (Ti,Al)N and (Ti,Al)(C,N) coatings by pulsed laser deposition for tribological applications

Abstract Titanium–aluminium based nitride (Ti,Al)N and carbonitride (Ti,Al)(C,N) hard coating systems possess excellent tribological behaviour in metal cutting and polymer forming contacts. In the present work (Ti,Al)N and (Ti,Al)(C,N) coatings were deposited by employing the pulsed laser deposition (PLD) technique. A pulsed Nd:YAG laser with 1064 nm wavelength was used for the vaporization of TiAl targets in low-pressure N2 or N2/C2H2, atmospheres at room temperature. The highly ionized metal vapour was deposited onto polished substrates (molybdenum, AISI D2). The coatings were characterized by light-microscopy, scanning electron microscopy, X-ray diffraction and hardness tests. The variation of the deposition parameters causes a change of the chemical composition, the texture and crystallinity of the coatings and, consequently, the mechanical properties and tribological behaviour. The latter was characterized in pin-on-disc tests at room temperature by using coated discs and uncoated AISI 52100 (DIN 100Cr6) steel and alumina pins as counterparts. The results demonstrate the excellent industrial applicability of these coatings for cold-forming operations: very low-wear rates were found for the (Ti,Al)N coatings. In contrast, the (Ti,Al)(C,N) coatings possess low-friction coefficients of approximately 0.2. As an outstanding advantage of these coatings, which were deposited at the room temperature by the PLD process, their excellent adhesion to the substrate can be pointed out, reaching the highest level (HF 1) in the Rockwell indentation test.

Pulsed laser deposition: a new technique for deposition of amorphous SiOx thin films

Abstract Pulsed laser deposition (PLD) is a physical vapour deposition coating technique for the production of thin films with complex chemical compositions. One of the main advantages of PLD is that excellent coating properties can be achieved even at low deposition temperatures. However, particulate defects in the growing films resulting from the evaporation process are often mentioned as the most important disadvantages of the PLD process. Unfavourable optical, thermo-physical and mechanical properties of the target material evaporated by laser radiation promote the formation of particulate defects. This paper presents some results on silicon-based PLD-films with reduced density of particulates. Silicon, SiO x and SiO 2 thin films were deposited by laser ablation from silicon targets with a high power pulsed Nd:YAG laser of 1064 nm wavelength in argon and oxygen containing atmospheres. The substrates were arranged in shaded off-axis geometry. The chemical composition and structure of the films were investigated employing transmission electron microscopy (TEM), secondary ion mass spectroscopy, X-ray photoelectron spectroscopy and ellipsometry. The results demonstrate the capability of PLD for the deposition of SiO x films with varying composition (0⩽ x ⩽2) by shaded off-axis PLD. The results of TEM and spectroscopic ellipsometry are indicating amorphous film structures in all cases.