R Puyenbroek

Synthesis of siloxanes containing acid-sensitive side groups

Abstract New siloxanes with acid-sensitive substituents have been synthesized by means of hydrosilylation, starting from methylhydrosiloxanes. Details of the preparation and characterization are reported. p -t-Butoxycarbonyloxystyrene, p -t-butoxystyrene and t-butyl methacrylate turned out to be excellent reagents in these experiments. 1 H, 13 C and 29 Si nuclear magnetic resonance techniques were used for characterization. The ratio between α and β addition appears to be strongly dependent on the substituents at the vinyl group of the organic moieties.

FUNCTIONALIZATION OF POLYSILSESQUIOXANES

New polysilsesquioxanes are prepared by incorporating tetrahydropyranyl moieties into silsesquioxanes. These polymers, which are soluble in organic solvents, are synthesized by means of HCl-catalysed reactions.

NOVEL PHOSPHAZENE-SUBSTITUTED SILOXANES AND SILANES

Abstract Cyclophosphazene-substituted siloxanes and silanes are prepared by the method of hydrosilylation, starting from allylderivatized cyclophosphazenes and hydrosiloxanes or hydrosilanes in the presence of a platinum catalyst. Steric and electronic effects govern the course of the reaction.

Synthesis and characterization of silicon-containing graft copolymers

Poly(4-t-butoxycarbonyloxystyrene)-g-poly(dimethylsiloxane) and poly(t-butylmethacrylate)-g-poly(dimethylsiloxane) with various chemical compositions were synthesized via free radical polymerization of 4-t-butoxycarbonyloxystyrene (TBCS) or t-butylmethacrylate (TBMA) with silicone macromers. These macromers were prepared by anionic ring-opening polymerization of hexamethylcyclotrisiloxane (D3) and subsequent termination with a chlorosilane compound having a methacrylate functionality. The morphology of the graft copolymer systems was investigated by DSC and TEM.

Silicon containing resists with positive and negative tone

New silicon-containing polymers have been developed for e-beam and DUV exposure. The products show positive and negative tone images depending on the polarity of the developer solution and a reasonable etch resistance in oxygen RIE plasma. Lithographic performance is investigated and the underlying mechanism is studied with spectroscopic and surface analysis techniques.

The Application of Phosphazene Containing Polymers as Negative Resists in Microlithography

New terpolymers containing phosphazene, epoxy and silicon moieties have been synthesized which were used as negative resists in microlithography. In addition to synthesis and characterization, lithographic properties are discussed.

POLYMERIZATION OF ORGANOSUBSTITUTED SILANES BY HYDROSILYLATION

Abstract Polymerization of unsaturated organo-substituted sianes by catalytic hydrosilylation leads to both polymeric and cyclic carbosianes.