Ralf Herkelmann
Solvay
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Featured researches published by Ralf Herkelmann.
Journal of Fluorine Chemistry | 1991
Ralf Herkelmann
Abstract Meanwhile nitrogen trifluoride is a commercially available product. It is used e.g. as a dry etching agent for semiconductors, as a fluorine source in high energy lasers or as in situ cleaning of chemical vapor deposition equipment. For all applications a more or less high purity of the nitrogen trifluoride is required. Apart from the problems with the synthesis there are many complications regarding the purification and handling of nitrogen trifluoride. A review of problems concerning the synthesis and purification of nitrogen trifluoride will be given.
Archive | 1998
Ralf Herkelmann; Carsten Brosch; Vincent Wilmet
Archive | 1993
Ralf Herkelmann; Werner Rudolph; Dirk Seffer
Archive | 1993
Ralf Herkelmann; Werner Dr Rudolph; Dirk Seffer
Archive | 1998
Ralf Herkelmann; Carsten Brosch; Vincent Wilmet
Archive | 1998
Carsten Brosch; Ralf Herkelmann; Vincent Wilmet; ヴィルム ヴァンサン; ブロッシュ カルシュテン; ハーケルマン ラルフ
Archive | 1994
Ralf Herkelmann; Werner Rudolph; Ruediger Sander; Alf Schulz
Archive | 1998
Carsten Brosch; Ralf Herkelmann; Vincent Wilmet
Archive | 1998
Ralf Herkelmann; Carsten Brosch; Vincent Wilmet
Archive | 1998
Carsten Brosch; Ralf Herkelmann; Vincent Wilmet