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Featured researches published by Reinhard Glang.


Archive | 1989

Measurement and Distribution of Faults on Defect Test Site Chips

Reinhard Glang

In the development of Very Large Scale Integration (VLSI) processes, yield losses due to chip design errors and inadequate control of device parameters are usually corrected early in the development cycle. Thereafter, the yield of product chips is determined by the number of pattern defects picked up in the lengthy fabrication sequence. Monitoring defect levels associated with various process steps and reducing them systematically to achieve competitive costs remain necessary activities for as long as the product is manufactured.


Archive | 1970

Handbook of Thin Film Technology

Leon I. Maissel; Reinhard Glang


Archive | 1985

Preferential chemical etch for doped silicon

Bao-Tai Hwang; Wendy Ann Orr-Arienzo; Reinhard Glang


Archive | 1982

Process for fabricating polycrystalline silicon film resistors

Reinhard Glang; San-Mei Ku; Alfred Schmitt


Archive | 1987

Self-aligned polysilicon emitter and contact structure for high performance bipolar transistors

Reinhard Glang; San Mei Ku


Archive | 1975

Semiconductor device having reduced surface leakage and methods of manufacture

Reinhard Glang; S. I. Raider


Archive | 1966

Maximum thermometer for surface temperature measurements

Reinhard Glang; Leon I. Maissel


Archive | 1983

Method for making polycrystalline silicon film resistors

Reinhard Glang; San-Mei Ku; Alfred Schmitt


Archive | 1986

Etchant and method for etching doped silicon

Bao Tai Hwang; Wendy Ann Orr-Arienzo; Reinhard Glang


Archive | 1986

Etching solution and etching processes for doped silicon.

Bao Tai Hwang; Wendy Ann Orr-Arienzo; Reinhard Glang

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