Richard E. Demaray

Pure aluminum process solution for advanced LCDs

Large size high-resolution liquid crystal displays put severe restriction on metal selection for gate lines where very low resistivity is required. Pure aluminum (Al) could be used of hillocking issues could be resolved. In this paper we demonstrated an Al deposition process on glass substrates with ultra low hillock density after photoresist and dielectric processing. Effects of process parameters such as substrate temperature, substrate roughness, base pressure and underlayer thickness on morphology and texture of aluminum are discussed.