Richard J. Komp
Xerox
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Featured researches published by Richard J. Komp.
Photochemistry and Photobiology | 1968
Richard J. Komp; Thomas J. Fitzsimmons
Abstract— The electron affinities and ionization potentials of amorphous sulfur, vitreous selenium and several phthalocyanines were measured by Nelsons electron beam retardation method and photoelectric emission, respectively. The electron affinities (Ac) measured were: 4.5 eV for sulfur, 3.4eV for selenium, and approximately 4.3 eV for all the phthalocyanines measured. Photoemission thresholds (Ic) were 7.0 eV for sulfur and 6.0 eV for selenium. Two photoionization thresholds (at about 5.2 and 6.1 eV) were found for both α‐copper and α‐metal‐free phthalocyanine; the former is attributed to impurity levels, the latter to bulk states. In each case, the band gap calculated from Ic and Ac was found to be approximately equal to the optical threshold for photoconductivity.
Archive | 1972
Robert M. Ferguson; Richard J. Komp
Solar Energy Materials and Solar Cells | 2006
Frédéric Dross; Ariane Labat; Mauro Antonio Perez Lopez; Marco Antonio Perez Lopez; Rudolfo Raudez; Anna Bruce; Susan Kinne; Richard J. Komp
Archive | 1978
N. A. Economou; Robert Stephen Toth; Richard J. Komp; Dan Trivich
Archive | 1967
John W. Weigl; Richard J. Komp
Archive | 1978
C. Noguet; M. Tapiero; Christoph Georg Schwab; Jean P. Zielinger; Dan Trivich; Richard J. Komp; E. Y. Wang; Kook Weng
Refocus | 2001
Susan Kinne; Richard J. Komp
Archive | 1970
Richard J. Komp; John W. Weigl
Archive | 2010
Richard J. Komp; John Burke; Maine Solar; Susan Kinne; Marco Antonio Perez; Mauro Perez; Grupo Fenix; Jean Ronel Noel; Alex Georges; Citi de Soleil; Pedro Sanchez Cortez
Journal of The Electrochemical Society | 1966
Richard J. Komp; Dan Trivich