Richard R. Poole

New ‘‘diamondlike carbon’’ film deposition process using plasma assisted chemical vapor transport

We have deposited ‘‘diamondlike carbon’’ films on various substrates using a new plasma assisted chemical vapor transport process in a high rf power density presssure ratio gas discharge. The films reported here exhibit the following properties: (1) high transparency for wavelengths greater than 300 nm; (2) an index of refraction of ∼2 at 850 nm; (3) a hardness between that of quartz and sapphire, increasing with ion energy bombarding the deposition surface; (4) strong adhesion to KBr, sapphire, and Si substrates; (5) high dielectric strength; (6) inertness to highly reactive chemicals.

Highly transmissive ion implanted germanium windows

Ion implantation and diffusion have been used to create conductive layers in germanium windows while maintaining high LWIR transmission. We have reduced the sheet resistance to below 5 ohms/square while limiting transmission losses to less than 9% in the 8-12 micron range.

CCD modeling and design for enhanced-UV response

A model of back illuminated CCDs is presented that concentrates on the fields that can exist at or near the illuminated surface. The parameters that influence these fields and how they affect the device quantum efficiency are explored. We also present a design for a thinned CCD using ion implantation and KrF excimer laser anneal that is tuned for enhanced UV response.