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Dive into the research topics where Richard van de Sanden is active.

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Featured researches published by Richard van de Sanden.


210th ECS Meeting | 2007

ALD Options for Si-integrated Ultrahigh-density Decoupling Capacitors in Pore and Trench Designs

F. Roozeboom; Johan Hendrik Klootwijk; Jan Verhoeven; Eric van den Heuvel; Wouter Dekkers; Stephan Heil; Hans van Hemmen; Richard van de Sanden; Erwin Kessels; F. Le Cornec; Lionel Guiraud; David D. R. Chevrie; Catherine Bunel; Franck Murray; Heondo Kim; D Blin

This paper reviews the options of using Atomic Layer Deposition (ALD) in passive and heterogeneous integration. The miniaturization intended by both integration schemes aim at Si-based integration for the former and at die stacking in a compact System-in-Package for the latter. In future Si-based integrated passives a next miniaturization step in trench capacitors requires the use of multiple ‘classical’ MOS layer stacks and the use of so-called high-k dielectrics (based on HfO2, etc.) and novel conductive layers like TiN, etc. to compose MIS and MIM stacks in ‘trench’ and ‘pore’ capacitors with capacitance densities exceeding 200 nF/mm 2 . One of the major challenges in realizing ultrahigh-density trench capacitors is to find an attractive pore lining and filling fabrication technology at reasonable cost and reaction rate as well as low temperature (for back-end processing freedom). As the deposition for the dielectric and conductive layers should be highly uniform, step-conformal and lowtemperature (≤ 400 °C), ALD is an enabling technology here, by virtue of the self-limiting mechanism of this layer-by-layer deposition technique. This article discusses first a few examples of LPCVD deposition of conventional MOS layers with ONO-dielectrics and in situ doped polycrystalline silicon, both as single layers and multilayer stacks. In addition, a few options for ALD deposition of thin dielectric and conductive layers (e.g. HfO2- and TiN-based) will be discussed. The silicon substrates that were used contained high aspect ratio (≥ 20) features with cross-section and spacing of the order of 1 µm.


Journal of Materials Chemistry | 2004

ELNES study of carbon K-edge spectra of plasma deposited carbon films

Ann-Lenaig Hamon; Jo Verbeeck; Dominique Schryvers; J Jan Benedikt; Richard van de Sanden

Electron energy loss spectroscopy was used to investigate the bonding of plasma deposited carbon films. The experimental conditions include the use of a specific collection angle for which the shape of the spectra is free of the orientation dependency usually encountered in graphite due to its anisotropic structure. The first quantification process of the energy loss near-edge structure was performed by a standard fit of the collected spectrum, corrected for background and multiple scattering, with three Gaussian functions followed by a comparison with the graphite spectrum obtained under equivalent experimental conditions. In a second approach a fitting model directly incorporating the background subtraction and multiple scattering removal was applied. The final numerical results are interpreted in view of the deposition conditions of the films and the actual fitting procedure with the related choice of parameters.


Plasma Chemistry and Plasma Processing | 2016

Special Issue of Papers by Plenary and Topical Invited Lecturers at the 22nd International Symposium on Plasma Chemistry (ISPC 22), 5–10 July 2015, Antwerp, Belgium: Introduction

Annemie Bogaerts; Richard van de Sanden

The ISPC 22 was organised jointly by the University of Antwerp and the Dutch Institute for Fundamental Energy Research from July 5 till July 10, 2015, in the beautiful town of Antwerp at the city campus of the University of Antwerp. The conference, whose governing body is the International Plasma Chemistry Society, spans the full range of plasma chemistry and plasma processing research, from fundamentals to applications, both from academia as well as from industry. The programme included contributions from lowpressure, atmospheric-pressure non-equilibrium and thermal plasmas. Furthermore, the conference was preceded by an industrial workshop on ‘‘Re-use of CO2’’, which took place on Sunday July 5 at the University of Antwerp, as well as by an ISPC Summer school, which was hosted by DIFFER at its brand new location at the TU/e Science campus. In addition, the conference hosted the workshop on ‘‘Plasma-mediated effects on biological systems’’. This special issue, which we happily present, contains the papers by the plenary and topical invited lecturers of ISPC 22. The 22nd International Symposium on Plasma Chemistry was chaired by Prof. dr. Annemie Bogaerts of the University of Antwerp and Prof. dr. ir. Richard van de Sanden from DIFFER and Eindhoven University of Technology. The conference was sponsored by the University of Antwerp, DIFFER, Fund for Scientific Research Flanders and Wallonia– Brussels (FWO and FNRS), the Flemish Institute for Technological Research (VITO), Tekna Plasma Europe (Macon, France), AFS Entwicklungs ? Vertriebs GmbH (Horgau, Germany), InnoPhysics BV (Eindhoven, The Netherlands), Benelux Process bvba (Eke, Belgium), Bruker Belgium NV/SA (Evere, Belgium), Laser 2000 Benelux CV (Vinkeveen,


Journal of Visualized Experiments | 2017

Non-equilibrium microwave plasma for efficient high temperature chemistry

Dirk van den Bekerom; Niek den Harder; Teofil Minea; Nicola Gatti; Jose Palomares Linares; W.A. Bongers; Richard van de Sanden; Gerard van Rooij

A flowing microwave plasma based methodology for converting electric energy into internal and/or translational modes of stable molecules with the purpose of efficiently driving non-equilibrium chemistry is discussed. The advantage of a flowing plasma reactor is that continuous chemical processes can be driven with the flexibility of startup times in the seconds timescale. The plasma approach is generically suitable for conversion/activation of stable molecules such as CO2, N2 and CH4. Here the reduction of CO2 to CO is used as a model system: the complementary diagnostics illustrate how a baseline thermodynamic equilibrium conversion can be exceeded by the intrinsic non-equilibrium from high vibrational excitation. Laser (Rayleigh) scattering is used to measure the reactor temperature and Fourier Transform Infrared Spectroscopy (FTIR) to characterize in situ internal (vibrational) excitation as well as the effluent composition to monitor conversion and selectivity.


international conference on plasma science | 2016

Co2 conversion by plasmolysis: A route to solar fuels

Gerard van Rooij; Dirk van den Bekerom; Niek den Harder; Teofil Minea; W.A. Bongers; Richard van de Sanden; Giel Berden; Richard Engeln

Summary form only given. Sustainable energy generation by means of wind or from solar radiation through photovoltaics or concentrated solar power will be a significant part of the energy mix in 2025. Intermittency (due to e.g. day/night cycle) as well as regional variation of these energy sources requires means to store and transport energy on a large scale. A promising option is creating artificial solar fuels (or CO2 neutral fuels) with sustainable energy, which can easily be deployed within the present infrastructure for conventional fossil fuels. A candidate raw material would be CO2 itself (fitting in carbon capture and utilization, CCU, strategies). Presently, no efficient schemes are yet available for the conversion of CO2 into fuels. A plasma chemical approach potentially offers high energy efficiency (up to 90%) due to selectivity in the reaction processes that can be tailored via its inherently strong out-of-equilibrium processing conditions. At the same time, it is characterized by efficient and fast power switching, low investment costs, no scarce materials required, and high power density, which are all advantageous for addressing intermittency. In this presentation, the plasma chemical approach will be introduced and examples will be discussed of research carried out at the DIFFER to ultimately enable a scale up to industrial applications. In particular, a common microwave reactor approach is evaluated experimentally with Rayleigh scattering and Fourier transform infrared spectroscopy to assess gas temperatures (up to ~3000 K) and conversion degrees (up to 30%), respectively. The results are interpreted on basis of estimates of the plasma dynamics obtained with electron energy distribution functions calculated with a Boltzmann solver. It indicates that the intrinsic electron energies are higher than is favorable for preferential vibrational excitation due to dissociative excitation, which causes thermodynamic equilibrium chemistry still to dominate the initial experiments. Pulsing the power is shown to decrease gas temperatures and improve efficiency. Novel reactor approaches are proposed to tailor the plasma dynamics to achieve the non-equilibrium in which vibrational excitation is dominant.


Microporous and Mesoporous Materials | 2014

On the role of nanoporosity in controlling the performance of moisture permeation barrier layers

Alberto Perrotta; Erik R.J. van Beekum; Gianfranco Aresta; Anu Jagia; W Wytze Keuning; Richard van de Sanden; Erwin Kessels; M. Creatore


23rd European Photovoltaic Solar Energy Conference and Exhibition, 1-5 September 2008, Valencia, Spain | 2008

Progress in the surface passivation of silicon solar cells

Jan Schmidt; Agnes Merkle; Robert Bock; Pietro P. Altermatt; Andres Cuevas; Nils-Peter Harder; Bram Hoex; Richard van de Sanden; Erwin Kessels; Rolf Brendel


EPJ Web of Conferences | 2014

Production of solar fuels by CO2 plasmolysis

A. P. H. Goede; W.A. Bongers; M.F. Graswinckel; Richard van de Sanden; Martina Leins; Jochen Kopecki; Andreas Schulz; Mathias Walker


Plasma Processes and Polymers | 2017

Plasma-driven dissociation of CO2 for fuel synthesis

W.A. Bongers; Henricus J.M. Bouwmeester; Bram Wolf; F. J. J. Peeters; Stefan Welzel; Dirk van den Bekerom; Niek den Harder; Adelbert Goede; M.F. Graswinckel; Pieter Willem Groen; Jochen Kopecki; Martina Leins; Gerard van Rooij; Andreas Schulz; Matthias Walker; Richard van de Sanden


Plasma Processes and Polymers | 2005

Plasma processes and film growth of expanding thermal plasma deposited textured zinc oxide

R Roland Groenen; Hans Linden; Richard van de Sanden

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Erwin Kessels

Eindhoven University of Technology

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F. Roozeboom

Eindhoven University of Technology

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Richard Engeln

Eindhoven University of Technology

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Stephan Heil

Eindhoven University of Technology

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A. P. H. Goede

Royal Netherlands Meteorological Institute

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F. J. J. Peeters

Eindhoven University of Technology

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