Riza Iskandar

Microstructure analysis of thin Cr2AlC films deposited at low temperature by magnetron sputtering

Cr2AlC belongs to the so called of MAX phases which have promising features because they combine unique properties usually found in either metals or ceramics. They have high elastic moduli and they are machinable [1], they exhibit good damage tolerance [2,3] good corrosion and oxidation resistance[2,4], good electrical and thermal conductivity[1], they passes a low friction coefficient, good damage tolerance [2] and high temperature stability [3]. In this work, Cr2AlC films have been synthesized by magnetron sputtering from a compound Cr2AlC target [5,6,7]. In this process, the influences of different substrate bias, deposition temperature (Ts), deposition time (t) and substrate material on the structure evolution have been investigated.