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Dive into the research topics where Robert Hollerweger is active.

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Featured researches published by Robert Hollerweger.


Journal of Applied Physics | 2016

Controlling microstructure, preferred orientation, and mechanical properties of Cr-Al-N by bombardment and alloying with Ta

Robert Hollerweger; Liangcai Zhou; David Holec; C.M. Koller; Richard Rachbauer; Peter Polcik; P.H. Mayrhofer

Recent ab initio studies showed that the inherent ductility of cubic structured Cr1−xAlxN coatings (as compared with similar hard coatings) significantly increases when alloyed with Ta. As there is only little experimental and theoretical information available, we have performed a combined experimental and ab initio based study on the influence of Ta additions (0, 2, 6, 12, and 26 at. % on the metal sublattice) on structure and mechanical properties of arc evaporated Cr1−x-yAlxTayN coatings with Al/(Cr + Al) ratios >0.61. With increasing Ta-content, the droplet number density decreases and the coating surface smoothens, which is much more pronounced as with increasing the bias potential from −40 to −120 V. Simultaneously, the columnar structure observed for Ta-free Cr0.37Al0.63N significantly changes into a fine-grained structure (crystallite size ∼5 nm) with clearly reduced columnar character. Increasing the Ta content also favors the formation of a preferred 200 growth orientation resulting in a reducti...


Journal of Physics D | 2013

Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5

Robert Hollerweger; David Holec; J. Paulitsch; Richard Rachbauer; Peter Polcik; P.H. Mayrhofer

Reactive magnetron sputtering enables the deposition of various thin films to be used for protective as well as optical and electronic applications. However, progressing target erosion during sputtering results in increased magnetic field strengths at the target surface. Consequently, the glow discharge, the target poisoning, and hence the morphology, crystal structure and stoichiometry of the prepared thin films are influenced. Therefore, these effects were investigated by varying the cathode current Im between 0.50 and 1.00 A, the magnetic � (%)


Surface & Coatings Technology | 2014

Thermal stability and oxidation resistance of arc evaporated TiAlN, TaAlN, TiAlTaN, and TiAlN/TaAlN coatings

C.M. Koller; Robert Hollerweger; C. Sabitzer; Richard Rachbauer; S. Kolozsvári; J. Paulitsch; P.H. Mayrhofer


Surface & Coatings Technology | 2014

Origin of high temperature oxidation resistance of Ti–Al–Ta–N coatings

Robert Hollerweger; H. Riedl; J. Paulitsch; M. Arndt; Richard Rachbauer; Peter Polcik; Sophie Primig; P.H. Mayrhofer


Surface & Coatings Technology | 2013

Phase stability, mechanical properties and thermal stability of Y alloyed Ti–Al–N coatings

H. Riedl; David Holec; Richard Rachbauer; Peter Polcik; Robert Hollerweger; J. Paulitsch; P.H. Mayrhofer


Surface & Coatings Technology | 2015

Thermal stability and mechanical properties of arc evaporated Ti–Al–Zr–N hard coatings

S.A. Glatz; Robert Hollerweger; Peter Polcik; Richard Rachbauer; J. Paulitsch; P.H. Mayrhofer


Acta Materialia | 2015

Complementary ab initio and X-ray nanodiffraction studies of Ta2O5

Robert Hollerweger; David Holec; J. Paulitsch; M. Bartosik; Rostislav Daniel; Richard Rachbauer; Peter Polcik; Jozef Keckes; Christina Krywka; H. Euchner; P.H. Mayrhofer


Surface & Coatings Technology | 2015

Annealing studies and oxidation tests of a hybrid multilayer arrangement of cathodic arc evaporated Ti–Al–N and reactively sputtered Ta–Al–N coatings

C.M. Koller; Robert Hollerweger; Richard Rachbauer; S. Kolozsvári; J. Paulitsch; P.H. Mayrhofer


Archive | 2017

revestimento com base em ti-al-ta que apresenta estabilidade térmica acentuada

C.M. Koller; Paul Heinz Mayrhofer; Richard Rachbauer; Robert Hollerweger


Archive | 2016

(AL, CR, TA)N COATING FOR ENHANCED HIGH TEMPERATURE RESISTANCE

Richard Rachbauer; Robert Hollerweger; Paul Heinz Mayrhofer

Collaboration


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P.H. Mayrhofer

Vienna University of Technology

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C.M. Koller

Vienna University of Technology

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J. Paulitsch

Vienna University of Technology

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Paul Heinz Mayrhofer

Swiss Federal Laboratories for Materials Science and Technology

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David Holec

Vienna University of Technology

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H. Riedl

Vienna University of Technology

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C. Sabitzer

Vienna University of Technology

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H. Euchner

Vienna University of Technology

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Jozef Keckes

Austrian Academy of Sciences

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