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Ronald Norman Schulz

IBM

Publication

Featured researches published by Ronald Norman Schulz.

Archive | 1985

Method of preventing asymmetric etching of lines in sub-micrometer range sidewall images transfer

Seiki Ogura; Jacob Riseman; Nivo Rovedo; Ronald Norman Schulz

Archive | 1992

Method of forming a BiCMOS SOI wafer having thin and thick SOI regions of silicon

Taqi Nasser Buti; Louis L. Hsu; Mark E. Jost; Seiki Ogura; Ronald Norman Schulz

Archive | 1990

High performance vertical bipolar transistor structure via self-aligning processing techniques

Gary B. Bronner; David L. Harame; Mark E. Jost; Ronald Norman Schulz

Archive | 1992

Confined water fixture for holding wafers undergoing chemical-mechanical polishing

James Edward Currie; Ronald Norman Schulz; Adam Ticknor

Archive | 1983

Deep trench etching process using CCl2 F2 /Ar and CCl2 F.sub. /O2 RIE

Fang-shi J. Lai; Ronald Norman Schulz

Archive | 1990

Vertical bipolar transistor structure and method of manufacturing

Gary B. Bronner; David L. Harame; Mark E. Jost; Ronald Norman Schulz

Archive | 1993

Bicmos SOI wafer having thin and thick SOI regions of silicon

Taqi Nasser Buti; Louis Lu-Chen Hsu; Mark E. Jost; Seiki Ogura; Ronald Norman Schulz

Archive | 1986

Method of forming a sub-micrometer trench structure on a semiconductor substrate

Seiki Ogura; Jacob Riseman; Nivo Rovedo; Ronald Norman Schulz

Archive | 1984

Ion etching process for deep trench etching multi-layer semiconductor substrates

Fang-Shi Jordan Lai; Ronald Norman Schulz

Archive | 1993

Water cushion device are subjected to hold the wafer, the chemical mechanical polishing

James Edward Currie; Ronald Norman Schulz; Adam Ticknor

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