Network


Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot


Dive into the research topics where Ryoko Miyanaga is active.

Publication


Featured researches published by Ryoko Miyanaga.


international electron devices meeting | 2011

Demonstration of high-density ReRAM ensuring 10-year retention at 85°C based on a newly developed reliability model

Z. Wei; Takeshi Takagi; Yoshihiko Kanzawa; Yoshikazu Katoh; Takeki Ninomiya; Ken Kawai; Shunsaku Muraoka; Satoru Mitani; Koji Katayama; Satoru Fujii; Ryoko Miyanaga; Yoshio Kawashima; Takumi Mikawa; Kazuhiko Shimakawa; Kunitoshi Aono

A new oxygen diffusion reliability model for a high-density bipolar ReRAM is developed based on hopping conduction in filaments, which allows statistical predication of activation energy. The filament in the active cells is confirmed by EBAC and TEM directly for the first time. With optimized filament size, a 256-kbit ReRAM with long-term retention exceeding 10 years at 85°C is successfully demonstrated.


international memory workshop | 2012

Retention Model for High-Density ReRAM

Z. Wei; Takeshi Takagi; Yoshihiko Kanzawa; Yoshikazu Katoh; Takeki Ninomiya; Ken Kawai; Shunsaku Muraoka; Satoru Mitani; Koji Katayama; Satoru Fujii; Ryoko Miyanaga; Yoshio Kawashima; Takumi Mikawa; Kazuhiko Shimakawa; Kunitoshi Aono

A retention model for both the high resistance state and low resistance state of the bipolar ReRAM is developed. Degradation of resistance is caused by the oxygen vacancy profile in filament changing due to oxygen diffusion.


Archive | 2008

Nonvolatile memory element, manufacturing method thereof, and nonvolatile semiconductor apparatus using the nonvolatile memory element

Yoshihiko Kanzawa; Koji Katayama; Satoru Fujii; Shunsaku Muraoka; Koichi Osano; Satoru Mitani; Ryoko Miyanaga; Takeshi Takagi; Kazuhiko Shimakawa


Archive | 2008

NONVOLATILE STORAGE ELEMENT, ITS MANUFACTURING METHOD, AND NONVOLATILE SEMICONDUCTOR DEVICE USING THE NONVOLATILE STORAGE ELEMENT

Yoshihiko Kanzawa; Koji Katayama; Satoru Fujii; Shunsaku Muraoka; Koichi Osano; Satoru Mitani; Ryoko Miyanaga; Takeshi Takagi; Kazuhiko Shimakawa


Archive | 2003

Method of fabricating nitride semiconductor, method of fabricating nitride semiconductor device, nitride semiconductor device, semiconductor light emitting device and method of fabricating the same

Isao Kidoguchi; Akihiko Ishibashi; Ryoko Miyanaga; Gaku Sugahara; Masakatsu Suzuki; Masahiro Kume; Yuzaburo Ban; Kiyoyuki Morita; Ayumu Tsujimura; Yoshiaki Hasegawa


Archive | 2005

Silicon carbide semiconductor device and process for producing the same

Kunimasa Takahashi; Makoto Kitabatake; Kenya Yamashita; Masao Uchida; Osamu Kusumoto; Ryoko Miyanaga


Archive | 2004

Silicon carbide semiconductor device and method for fabricating the same

Osamu Kusumoto; Makoto Kitabatake; Kunimasa Takahashi; Kenya Yamashita; Ryoko Miyanaga; Masao Uchida


Archive | 2002

Semiconductor substrate, semiconductor device and method for fabricating the same

Kunimasa Takahashi; Masao Uchida; Makoto Kitabatake; Toshiya Yokogawa; Osamu Kusumoto; Kenya Yamashita; Ryoko Miyanaga


Archive | 2001

Method for fabricating nitride semiconductor, method for fabricating nitride semiconductor device, and nitride semiconductor device

Akihiko Ishibashi; Ayumu Tsujimura; Yoshiaki Hasegawa; Nobuyuki Otsuka; Gaku Sugahara; Ryoko Miyanaga; Toshitaka Shimamoto; Kenji Harafuji; Yuzaburoji Ban; Kiyoshi Ohnaka


Archive | 2004

Silicon carbide element and its manufacturing method

Koichi Hashimoto; Makoto Kitahata; Osamu Kusumoto; Ryoko Miyanaga; Kunimasa Takahashi; Masao Uchida; Masaya Yamashita; 正雄 内田; 真 北畠; 良子 宮永; 賢哉 山下; 修 楠本; 浩一 橋本; 邦方 高橋

Collaboration


Dive into the Ryoko Miyanaga's collaboration.

Researchain Logo
Decentralizing Knowledge