Ryuichiro Takasaki
Mitsubishi
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Publication
Featured researches published by Ryuichiro Takasaki.
Journal of Photochemistry and Photobiology A-chemistry | 1992
Temeichi Ochiai; Yasuhiro Kameyama; Ryuichiro Takasaki; Tomoyo Ishiguro; Mineo Nishi; Konoe Miura
Abstract Factors which improve the resolution of a positive-working photoresist composed of a naphthoquinonediazide and a novolac resin are discussed. Control of the dissolution rate of the resist film into the developer is essential to improve the resolution. The relationship between the dissolution rate and the chemical structures of the matrix resin and the photoactive compound is discussed. It is also shown that the photobleaching phenomenon of the photoactive compound helps to increase the resolution and the term “internal contrast-enhanced lithography (CEL) effect” is introduced.
Archive | 1999
Ryuichiro Takasaki; 龍一郎 高崎
Archive | 1999
Shingo Ikeda; Fumiyuki Matsuo; Ryuichiro Takasaki; 史之 松尾; 真吾 池田; 龍一郎 高崎
Archive | 1986
Konoe Miura; Hideki Nagasaka; Noriaki Takahashi; Tameichi Ochiai; Ryuichiro Takasaki
Archive | 1985
Konoe Miura; Hideki Nagasaka; Noriaki Takahashi; Tameichi Ochiai; Ryuichiro Takasaki
Archive | 2000
Ryuichiro Takasaki; Toshiyoshi Urano; 年由 浦野; 龍一郎 高崎
Archive | 2005
Shingo Ikeda; Fumiyuki Matsuo; Ryuichiro Takasaki; 史之 松尾; 真吾 池田; 龍一郎 高崎
Archive | 1998
Shingo Ikeda; Fumiyuki Matsuo; Ryuichiro Takasaki; 史之 松尾; 真吾 池田; 龍一郎 高崎
Archive | 1994
Noriko Endou; Tameichi Ochiai; Ryuichiro Takasaki; 為一 落合; 典子 遠洞; 龍一郎 高崎
Archive | 1984
Konoe Miura; Hideki Nagasaka; Noriaki Takahashi; Tameichi Ochiai; Ryuichiro Takasaki
