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Dive into the research topics where Ryuta Washiya is active.

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Featured researches published by Ryuta Washiya.


Langmuir | 2018

Selection of Diacrylate Monomers for Sub-15 nm Ultraviolet Nanoimprinting by Resonance Shear Measurement

Shunya Ito; Motohiro Kasuya; Kenji Kawasaki; Ryuta Washiya; Yuzuru Shimazaki; Akihiro Miyauchi; Kazue Kurihara; Masaru Nakagawa

In UV nanoimprinting, the selection of monomers suitable for sub-15 nm patterning is difficult because the filling behavior of resin at this scale still remains scientifically unclear. We demonstrate sub-15 nm patterning by UV nanoimprinting using silica molds with 20, 15, and 7 nm diameter holes; however, the 7 nm diameter pillar patterns were not fabricated using hydroxy-containing monomers. The filling behavior into silica holes of around 10 nm depended on the chemical structure of the monomers. Resonance shear measurements revealed the following: (1) The viscosities of hydroxy-containing monomers confined between chlorodimethyl(3,3,3-trifluoropropyl)silane (FAS3-Cl)-modified surfaces began to increase at distances shorter than those of the monomers between unmodified surfaces. (2) The monomers confined between tridecafluoro-1,1,2,2-tetrahydrooctyltrimethoxysilane-modified surfaces were squeezed out when the surface-surface distance decreased at less than 7 nm. The measured viscosities between the FAS3-Cl-modified silica surfaces were correlated with the insufficient filling behavior into the silica holes of around 10 nm in UV nanoimprinting. Contact angle measurements provided an additional insight that a higher wettability of the monomers onto the antisticking chemisorbed monolayers resulted in imprinted patterns with higher aspect ratios. Considering the increase in the monomer viscosity in the nanospace and the wettability of monomers onto chemisorbed monolayers, we concluded that the monomer showing low viscosity under confinement and high wettability onto the mold surface was suitable for single-digit nanometer UV nanoimprinting.


international microprocesses and nanotechnology conference | 2007

Fundamental investigation on transparent replicated mold using an organic-inorganic hybrid material

Ryuta Washiya; Takashi Ando; H. Ohkubo; Nobuaki Kitano; Tsuneo Shiota; Akihiro Miyauchi

This paper investigates a replication process using the organic-inorganic hybrid material. The condition of heat treatment was determined on the basis of the hardness and transmission measurements. 100 repeated imprints were demonstrated using the replicated mold and achieved good fidelity.


Archive | 2009

Method and apparatus for imprinting microstructure and stamper therefor

Ryuta Washiya; Takashi Ando; Masahiko Ogino; Akihiro Miyauchi


Archive | 2008

IMPRINT DEVICE AND METHOD OF MANUFACTURING IMPRINTED STRUCTURE

Ryuta Washiya; Takashi Ando; Masahiko Ogino; Hideaki Kataho; Akihiro Miyauchi; Kosuke Kuwabara


Archive | 2009

STAMPER FOR MINUTE STRUCTURE TRANSFER AND A METHOD FOR MANUFACTURING THE SAME

Takashi Ando; Nobuaki Kitano; Akihiro Miyauchi; Ryuta Washiya; Kazumasa Ohsono; Akihito Hongo; Tsuneo Shiota


Archive | 2011

PHOTOPOLYMERIZABLE RESIN COMPOSITION FOR TRANSFERRING MICROSTRUCTURE

Ryuta Washiya; Masahiko Ogino; Noritake Shizawa; Kyoichi Mori; Akihiro Miyauchi


Archive | 2010

MICROPATTERN TRANSFER STAMPER AND MICROPATTERN TRANSFER DEVICE

Ryuta Washiya; Masahiko Ogino; Noritake Shizawa; Kyoichi Mori; Akihiro Miyauchi


Archive | 2010

Micropattern transfer device

Ryuta Washiya; Masahiko Ogino; Noritake Shizawa; Kyoichi Mori; Akihiro Miyauchi


Archive | 2012

DEVICE AND METHOD FOR TRANSFERRING MICRO STRUCTURE

Ryuta Washiya; Masahiko Ogino; Noritake Shizawa; Kyoichi Mori; Akihiro Miyauchi


Archive | 2010

MICROFINE STRUCTURE, METHOD FOR PRODUCING MICROFINE STRUCTURE, AND POLYMERIZABLE RESIN COMPOSITION FOR PRODUCING THE SAME

Masahiko Ogino; Susumu Komoriya; Akihiro Miyauchi; Ryuta Washiya; Kyoichi Mori; Noritake Shizawa

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