S. Baricordi
University of Ferrara
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Featured researches published by S. Baricordi.
Journal of Physics D | 2008
S. Baricordi; V. Guidi; A. Mazzolari; D. Vincenzi; Matteo Ferroni
We present an idea and its development to realize crystals for channelling experiments, which result in significant improvement of the crystal quality with respect to the traditional methods of fabrication. The technique relies on non-conventional usage of the established technique of the anisotropic etching of silicon in micro-machining. Morphological and structural analyses were carried out through electron and scanning-probe microscopy to show that the crystal exhibited flat surfaces with atomically sharp termination, i.e. no appreciable surface damage was induced by the preparation. Thereby, the crystal meets the stringent requirements that are demanded for operation with high-energy beams and in particular for halo collimation in modern hadron colliders.
Applied Physics Letters | 2007
S. Baricordi; V. Guidi; A. Mazzolari; G. Martinelli; A. Carnera; D. De Salvador; A. Sambo; G. Della Mea; Riccardo Milan; Alberto Vomiero; W. Scandale
The new generation of hadron machines may profitably take advantage of channeling for steering and collimation of high-energy particle beams. In that case, the requirements on the quality of the crystal surface are rather stringent in terms of both lattice perfection and roughness. Here, the authors show the structural and morphological characterizations of crystals fabricated through a method to achieve a surface that fulfills all needed specifications for application in hadron machines.
Applied Physics Letters | 2005
S. Baricordi; V.M. Biryukov; A. Carnera; Yu.A. Chesnokov; G. Della Mea; V. Guidi; Yu.M. Ivanov; G. Martinelli; E. Milan; Silvio Restello; A. Sambo; W. Scandale; Alberto Vomiero
Channeling of relativistic particles in bent Si crystals is a powerful technique for use with accelerators. Its efficiency can be found to be highly dependent on the state of the surface of the crystal steering the particles. We investigated the morphology and structure of the surface of the samples that have been used with high efficiency for channeling in accelerators. Low-energy channeling of 2MeVα particles or protons was used as a probe. We found that mechanical treatment of the samples leads to a superficial damaged layer, which is correlated to efficiency limitations of the crystal in accelerators. In contrast, chemical etching, which was used to treat the surface of the most efficient crystals, leaves a surface with superior perfection.
Review of Scientific Instruments | 2008
W. Scandale; I. Efthymiopoulos; Dean Still; A. Carnera; Gianantonio Della Mea; Davide De Salvador; Riccardo Milan; Alberto Vomiero; S. Baricordi; Stefano Chiozzi; Pietro Dalpiaz; Chiara Damiani; M. Fiorini; V. Guidi; G. Martinelli; A. Mazzolari; E. Milan; G. Ambrosi; P. Azzarello; R. Battiston; B. Bertucci; W.J. Burger; M. Ionica; P. Zuccon; Gianluca Cavoto; Roberta Santacesaria; Paolo Valente; Erik Vallazza; Alexander G. Afonin; Vladimir T. Baranov
A high performance apparatus has been designed and built by the H8-RD22 collaboration for the study of channeling and volume reflection phenomena in the interaction of 400 GeV/c protons with bent silicon crystals, during the 2006 data taking in the external beamline H8 of the CERN SPS. High-quality silicon short crystals were bent by either anticlastic or quasimosaic effects. Alignment with the highly parallel (8 murad divergence) proton beam was guaranteed through a submicroradian goniometric system equipped with both rotational and translational stages. Particle tracking was possible by a series of silicon microstrip detectors with high-resolution and a parallel plate gas chamber, triggered by various scintillating detectors located along the beamline. Experimental observation of volume reflection with 400 GeV/c protons proved true with a deflection angle of (10.4+/-0.5) murad with respect to the unperturbed beam, with a silicon crystal whose (111) planes were parallel to the beam.
EPL | 2011
W. Scandale; Alberto Vomiero; E. Bagli; S. Baricordi; P. Dalpiaz; M. Fiorini; V. Guidi; A. Mazzolari; D. Vincenzi; Riccardo Milan; G. Della Mea; E. Vallazza; A. G. Afonin; Yu.A. Chesnokov; V. A. Maisheev; I. A. Yazynin; A. D. Kovalenko; A.M. Taratin; A. S. Denisov; Yu.A. Gavrikov; Yu.M. Ivanov; L.P. Lapina; L. G. Malyarenko; V. V. Skorobogatov; V.M. Suvorov; S. Vavilov; D. Bolognini; S. Hasan; A. Mattera; M. Prest
Multiple volume reflection by different planes passing through the 〈111〉 axis in a bent silicon crystal was observed for the first time for 150 GeV/c negative particles, π- mesons, at one of the se ...
arXiv: Accelerator Physics | 2006
V.M. Biryukov; A. G. Afonin; V. T. Baranov; S. Baricordi; S. Bellucci; G. I. Britvich; V. N. Chepegin; Yu.A. Chesnokov; C. Balasubramanian; G. Giannini; V. Guidi; Yu.M. Ivanov; V. I. Kotov; A. Kushnirenko; V. A. Maisheev; C. Malagù; G. Martinelli; E. Milan; A. A. Petrunin; V. A. Pikalov; V. V. Skorobogatov; Marco Stefancich; V. I. Terekhov; F. Tombolini; U.I. Uggerhøj
A series of Silicon crystal undulator samples were produced based on the approach presented in PRL 90 (2003) 034801, with the periods of undulation from 0.1 mm to 1 mm, and the number of periods on the order of 10. The samples were characterized by X-rays, revealing the sine-like shape of the crystal lattice in the bulk. Next step in the characterization has been the channeling tests done with 70 GeV protons, where good channeling properties of the undulated Silicon lattice have been observed. The photon radiation tests of crystal undulators with high energy positrons are in progress on several locations: IHEP Protvino, LNF Frascati, and CERN SPS. The progress in the experimental activities and the predictions from detailed simulations are reported.
Applied Physics Letters | 2014
Gabriele Calabrese; S. Baricordi; Paolo Bernardoni; D. De Salvador; Matteo Ferroni; V. Guidi; V. Morandi; D. Vincenzi
We report on the epitaxial growth of Ge virtual substrates directly on Si (001) and on different porosity porous silicon (pSi) buffers. Obtained results indicate that Ge grown on low porosity (22%) pSi buffer has a better crystalline quality compared to Ge grown on bulk Si and on higher porosity buffers. This result is attributed to the compliant nature of pSi and to its reduced Youngs modulus, which leads to plastic tensile deformation of the 22% porosity buffer under the in-plane tensile stress introduced by Ge lattice. The same result is not observed for higher porosity buffers, this effect being attributed to the higher buffer fragility. A low porosity pSi layer can hence be used as buffer for the growth of Ge on Si virtual substrates with reduced dislocation content and for the growth of Ge based devices or the successive integration of III-V semiconductors on Si.
Jetp Letters | 2015
W. Scandale; Gianluigi Arduini; Mark Butcher; F. Cerutti; M. Garattini; S. Gilardoni; Anton Lechner; R. Losito; A. Masi; A. Mereghetti; E. Metral; Daniele Mirarchi; S. Montesano; Stefano Redaelli; Roberto Rossi; P. Schoofs; G. Smirnov; E. Bagli; L. Bandiera; S. Baricordi; P. Dalpiaz; G. Germogli; V. Guidi; A. Mazzolari; D. Vincenzi; G. Claps; S. Dabagov; D. Hampai; F. Murtas; G. Cavoto
Bent silicon crystals in channeling mode are already used for beam extraction and collimation in particle accelerators. Volume reflection of beam particles is more efficient than beam channeling; however, the mean deflection angle is rather small. An experiment on the deflection of a 400 GeV/c proton beam and a 150 GeV/c π− beam at CERN using a multi-strip silicon deflector in reflection mode is described. The mean deflection angle of beam particles has been considerably increased due to sequential volume reflections realized in the deflector. This gives possibility for a successful usage of the multi-strip deflectors for beam collimation in high-energy accelerators.
3RD INTERNATIONAL CONFERENCE ON THEORETICAL AND APPLIED PHYSICS 2013 (ICTAP 2013) | 2014
Gabriele Calabrese; S. Baricordi; Paolo Bernardoni; Samuele Fin; V. Guidi; D. Vincenzi
A comparison between the crystalline quality of Ge grown on bulk Si and on a low porosity porous Si (pSi) buffer layer using low energy plasma enhanced chemical vapor deposition is reported. Omega/2Theta coupled scans around the Ge and Si (004) diffraction peaks show a reduction of the Ge full-width at half maximum (FWHM) of 22.4% in presence of the pSi buffer layer, indicating it is effective in improving the epilayer crystalline quality. At the same time atomic force microscopy analysis shows an increase in root means square roughness for Ge grown on pSi from 38.5 nm to 48.0 nm, as a consequence of the larger surface roughness of pSi compared to bulk Si. The effect of 20 minutes vacuum annealing at 580°C is also investigated. The annealing leads to a FWHM reduction of 23% for Ge grown on Si and of 36.5% for Ge on pSi, resulting in a FWHM of 101 arcsec in the latter case. At the same time, the RMS roughness is reduced of 8.8% and of 46.5% for Ge grown on bulk Si and on pSi, respectively. The biggest impr...
conference of the industrial electronics society | 2014
D. Vincenzi; S. Baricordi; Silvia Calabrese; Maura Musio; Alfonso Damiano
In the present paper a novel configuration of high concentrator photovoltaic (HCPV) systems based on Cassegrain optics has been presented. The proposed system has been designed in order to be suitable for the implementation of both multi-junction and spectrum splitting configurations. The Cassegrain optic design, the components and material choices for the development of HCPV receivers have been described. Subsequently, the proposed HCPV system has been implemented considering a multi-junction and dichroic photovoltaic solar cells configurations. Finally, the outdoor characterization of the two receiver prototypes has been carried out in order to determine their energy conversion performances. The obtained outcomes are then compared and discussed in order to highlight the worth, and the effectiveness of the proposed HCPV configurations.